The treatment of aryl iodides with tris(trimethylsilyl)silane in the presence of Pd(P(tBu)3)2 and the Hünig base leads to the formation of hypersilylated aromatic products in good to excellent yields without cleavage of weak Si–Si bonds under mild conditions.
在Pd(P(tBu)3)2和Hünig碱的存在下,芳基
碘化物与三(三甲基
硅基)
硅烷反应,在温和条件下形成了超
硅烷化芳香产物,产率良好至优秀,且未发生弱Si-Si键的断裂。