2-tert-butyl-2,4,4-trimethyl-valeric acid methyl ester | 100528-72-1

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 脂肪酰基
• 英文名称: 2-tert-butyl-2,4,4-trimethyl-valeric acid methyl ester
• 英文别名: 2-tert-Butyl-2,4,4-trimethyl-valeriansaeure-methylester；Methyl 2-tert-butyl-2,4,4-trimethylpentanoate；methyl 2-tert-butyl-2,4,4-trimethylpentanoate
• CAS: 100528-72-1
• 化学式: C₁₃H₂₆O₂
• 分子量: 214.348
• InChiKey: ISAIGPWMKLHSEV-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.3
• 重原子数：
  15
• 可旋转键数：
  5
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.92
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为产物：
  描述：

  甲醇 、 2-tert-butyl-2,4,4-trimethyl-valeryl chloride 生成 2-tert-butyl-2,4,4-trimethyl-valeric acid methyl ester
  参考文献：
  名称：

  Whitmore; Forster, Journal of the American Chemical Society, 1942, vol. 64, p. 2967

  摘要：

  DOI：

文献信息

• [EN] COLORANT MULTIMER, COLORED CURABLE COMPOSITION, COLOR FILTER AND METHOD FOR PRODUCING THE SAME, AND SOLID-STATE IMAGE SENSOR, IMAGE DISPLAY DEVICE, LIQUID CRYSTAL DISPLAY DEVICE AND ORGANIC EL DISPLAY WITH THE COLOR FILTER<br/>[FR] MULTIMÈRE COLORANT, COMPOSITION DURCISSABLE COLORÉE, FILTRE COLORÉ ET PROCÉDÉ DE FABRICATION DE CEUX-CI, ET DÉTECTEUR D'IMAGES À L'ÉTAT SOLIDE, DISPOSITIF D'AFFICHAGE D'IMAGES, DISPOSITIF D'AFFICHAGE À CRISTAUX LIQUIDES ET DISPOSITIF D'AFFICHAGE ÉLEC
  申请人：FUJIFILM CORP

  公开号：WO2011040628A1

  公开（公告）日：2011-04-07

  A colorant multimer includes, as a partial structure of a colorant moiety, a dipyrromethene metal complex compound or tautomer thereof obtained from: (i) a dipyrromethene compound represented by the following Formula (M); and (ii) a metal or a metal compound: wherein in Formula (M), R4, R5, R6, R7, R8, R9, and R10 each independently represent a hydrogen atom or a monovalent substituent.

  一种着色剂多聚体包括作为着色剂部分结构的二吡咯甲烷金属配合物化合物或其互变异构体，所述化合物由以下公式（M）表示的二吡咯甲烷化合物和金属或金属化合物得到：其中在公式（M）中，R4、R5、R6、R7、R8、R9和R10分别独立地表示氢原子或一价取代基。
• N-ACYL-B-LACTAM DERIVATIVE, MACROMOLECULAR COMPOUND, AND PHOTORESIST COMPOSITION
  申请人：Fukumoto Takashi

  公开号：US20120148954A1

  公开（公告）日：2012-06-14

  Disclosed are an N-acyl-β-lactam derivative represented by the following general formula, from which a photoresist composition capable of controlling an acid diffusion length to be short is obtained; a polymer obtained by polymerizing the N-acyl-β-lactam derivative represented by the following general formula as one of starting materials; and a photoresist composition containing the polymer. In the formula, R 1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group; W represents an alkylene group or a cycloalkylene group; n represents 0 or 1; and each of R 2 , R 3 , R 4 , and R 5 independently represents a hydrogen atom, an alkyl group, a cyclic hydrocarbon group, or an acyloxy group, provided that 1) R 2 and R 3 , or R 4 and R 5 , may be connected to each other to form a substituted or unsubstituted ring which may have an oxygen atom at an arbitrary position, 2) R 3 and R 4 may be connected to each other to form a substituted or unsubstituted ring which may have an oxygen atom at an arbitrary position, and 3) all of R 2 , R 3 , R 4 , and R 5 are not a hydrogen atom at the same time.

  本公开了一种N-酰基-β-内酰胺衍生物，其由以下通用式表示，从中可以获得一种能够控制酸扩散长度较短的光刻胶组合物；一种由将以下通用式表示的N-酰基-β-内酰胺衍生物聚合而成的聚合物作为起始材料之一；以及含有该聚合物的光刻胶组合物。在该式中，R1代表氢原子、甲基或三氟甲基基团；W代表烷基基团或环烷基基团；n代表0或1；而R2、R3、R4和R5中的每一个独立地代表氢原子、烷基基团、环烃基团或酰氧基团，前提是1）R2和R3，或R4和R5，可以连接在一起形成一个取代或未取代的环，该环在任意位置可能有一个氧原子，2）R3和R4可以连接在一起形成一个取代或未取代的环，该环在任意位置可能有一个氧原子，3）R2、R3、R4和R5中的所有基团不同时为氢原子。
• PHOTOSENSITIVE COMPOSITION, COMPOUND FOR USE IN THE PHOTOSENSITIVE COMPOSITION AND PATTERN FORMING METHOD USING THE PHOTOSENSITIVE COMPOSITION
  申请人：KODAMA Kunihiko

  公开号：US20080138742A1

  公开（公告）日：2008-06-12

  The invention is related to an arylsulfonium salt compound having a polycyclic hydrocarbon structure in a cation moiety.

  本发明涉及一种在阳离子部分具有多环碳氢结构的芳基磺酸盐化合物。
• PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, ELECTRONIC DEVICE AND COMPOUND
  申请人：FUJIFILM CORPORATION

  公开号：US20160070167A1

  公开（公告）日：2016-03-10

  There is provided a pattern forming method comprising (i) a step of forming a film containing an actinic ray-sensitive or radiation-sensitive resin composition containing (A) a compound represented by the specific formula, (B) a compound different from the compound (A) and capable of generating an acid upon irradiation with an actinic ray or radiation, and (P) a resin that does not react with the acid generated from the compound (A) and is capable of decreasing the solubility for an organic solvent-containing developer by the action of the acid generated from the compound (B), (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern; the actinic ray-sensitive or radiation-sensitive resin composition above; a resist film using the composition.

  提供了一种图案形成方法，包括（i）形成一种薄膜，其中包含一种感光树脂组成物，该组成物包含（A）一种特定化学式代表的化合物，（B）一种不同于化合物（A）的化合物，在接受光辐射后能够产生酸，并且（P）一种树脂，该树脂不会与从化合物（A）产生的酸发生反应，并且能够通过来自化合物（B）产生的酸的作用降低有机溶剂含有的显影剂的溶解度，（ii）曝光薄膜，（iii）使用有机溶剂含有的显影剂对曝光后的薄膜进行显影，形成负图案；上述感光树脂组成物；使用该组成物的抗蚀膜。
• Polymerizable Fluorine-Containing Compound
  申请人：ISONO Yoshimi

  公开号：US20110098500A1

  公开（公告）日：2011-04-28

  A polymerizable fluorine-containing compound represented by formula (1), wherein R 1 represents a polymerizable double-bond containing group, R 2 represents an acid-labile protecting group, R 3 represents a fluorine atom or fluorine-containing alkyl group, and W represents a bivalent linking group. This compound can provide a fluorine-containing polymer compound that has a weight-average molecular weight of 1,000-1,000,000 and contains a repeating unit represented by formula (2), wherein R 2 , R 3 and W are defined as above, each of R 4 , R 5 and R 6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, at least two of R 4 , R 5 and R 6 may be combined to form a ring. This polymer compound can provide a resist composition capable of forming a pattern that is transparent to exposure light and superior in rectangularity.

  一种可聚合的含氟化合物，其化学式为（1），其中R1表示可聚合的双键含有基团，R2表示酸敏感保护基团，R3表示氟原子或含氟烷基团，W表示二价连接基团。该化合物可以提供一种含氟聚合物化合物，其重均分子量为1,000-1,000,000，并包含由式（2）表示的重复单元，其中R2、R3和W如上所述，R4、R5和R6中的每一个独立地表示氢原子、氟原子或一价有机基团，至少两个R4、R5和R6可以结合形成一个环。该聚合物化合物可以提供一种抗蚀剂组合物，能够形成透明的曝光光线图案，并具有优异的矩形度。