申请人:FUJIREBIO INC.
公开号:EP0492178A2
公开(公告)日:1992-07-01
A naphthoic acid derivative represented by the following general formula or a salt thereof:
wherein Ri, R2 and R3 are each independently a hydrogen atom, a halogen atom, a hydroxyl group, a lower alkyl group, a lower alkoxy group, a lower alkanoyloxy group, a hydroxy-lower alkyl group, a lower alkoxy-lower alkyl group, a lower alkanoyloxy-lower alkyl group or an aralkyloxy group;
R4 is a hydrogen atom or a lower alkyl group;
R5 is a substituted or unsubstituted aryl group or a substituted or unsubstituted heteroaromatic group;
X is a group
a cycloalkylene group, a bivalent nitrogen-containing heterocyclic group, or a group
-R8- NH- or -NH-R8, where R6 and R7 are each a hydrogen atom or a lower alkyl group and R8 is a cycloalkylene group, or R6 and R7, together with R4, may form an alkylene group of 1-3 carbon atoms;
Y is -S(O)p-, -(CH2)n- or -0-;
Z is a substituted or unsubstituted alkylene group or a single bond;
ℓ is an integer of 0-4;
m is an integer of 0-8;
n is 0 or 1;
p is an integer of 0-2; and
g is 0 or 1.
The compound is useful as an antiallergic agent.
由以下通式代表的萘酸衍生物或其盐:
其中 Ri、R2 和 R3 各自独立地为氢原子、卤素原子、羟基、低级烷基、低级烷氧基、低级烷酰氧基、羟基-低级烷基、低级烷氧基-低级烷基、低级烷酰氧基-低级烷基或芳氧基;
R4 是氢原子或低级烷基;
R5 是取代或未取代的芳基或取代或未取代的杂芳基;
X 是一个基团
环亚烷基、二价含氮杂环基团或基团
-R8-NH-或-NH-R8,其中 R6 和 R7 各为氢原子或低级烷基,R8 为环亚烷基,或 R6 和 R7 与 R4 可组成 1-3 个碳原子的亚烷基;
Y 是-S(O)p-、-(CH2)n- 或-0-;
Z 是取代或未取代的亚烷基或单键;
ℓ 是 0-4 的整数;
m 是 0-8 的整数
n 是 0 或 1;
p 是 0-2 的整数;以及
g 为 0 或 1。
该化合物可用作抗过敏剂。