The present invention provides a polymerizable compound having an alicyclic structure and a polymerizable group and represented by the general formula (1) or (19). The polymerizable compound exhibits high adhesion to substrates, reduced swelling during development, a reduced amount of water absorption during exposure in water, and high dry-etching resistance. Also provided are a polymer of such a polymerizable compound, a process for producing the same and a photoresist composition containing the polymer.
本发明提供了一种具有脂环结构和聚合基的可聚合化合物,其通式表示为(1)或(19)。该可聚合化合物具有高黏附性,开发过程中膨胀减少,在
水中曝光时吸
水量减少,并具有高干法刻蚀抗性。还提供了这种可聚合化合物的聚合物、其生产方法以及包含该聚合物的光阻组合物。