Semicarbazide derivatives, processes for preparation thereof and pharmaceutical composition comprising the same
申请人:FUJISAWA PHARMACEUTICAL CO., LTD.
公开号:EP0144853A2
公开(公告)日:1985-06-19
New semicarbazide derivatives of the formula:
wherein
R' is hydrogen,
R2 is hydrogen, lower alkyl, ar(lower)alkyl, lower alkenyl or aryl,
R3 is lower alkyl, ar(lower)alkyl, lower alkenyl or aryl, or
R2 and R3 are taken together to form (C2-C6)-alkylidene group optionally substituted with aryl or taken together with the adjacent nitrogen atom to form a saturated or unsaturated, 5- or 6-membered heterocyclic group optionally substituted with aryl; or
R' and R2 are taken together with the adjacent nitrogen atoms to form a saturated or unsaturated, 5- or 6-membered heterocyclic group or 1,2-diazaspiroalkane-1,2-diyl group,
R3 is hydrogen, lower alkyl, ar(lower)alkyl, lower alkeny or aryl;
R4 is aryl which may have substituent(s) selected from lower alkyl, halogen, lower alkoxy, lower alkylamino, halo(lower)alkyl, hydroxy, lower alkanoyl, esterified carboxy and carboxy,
R5 is hydrogen or lower alkyl, and
X is 0 or S, provided that the lower alkyl group for R3 is (C3-C6) alkyl, when R2 is hydrogen or (C1-C2) alkyl and R4 is aryl optionally having substituent(s) selected from groups consisting of halogen, lower alkyl, lower alkoxy and halo(lower)alkyl, and pharmaceutically acceptable salts thereof, and processes for preparation thereof and pharmaceutical composition comprising the same.
These derivatives and salts thereof are useful as antiinflammatory and analgesic agents.
式中的新半咔嗪衍生物:
式中
R'是氢
R2 是氢、低级烷基、低级烯基或芳基、
R3 是低级烷基、芳(低)烷基、低级烯基或芳基,或
R2 和 R3 共同形成可选择被芳基取代的 (C2-C6)- 亚烷基,或与邻近的氮原子共同形成可选择被芳基取代的饱和或不饱和 5 或 6 元杂环基团;或
R' 和 R2 与相邻的氮原子结合形成饱和或不饱和的 5 或 6 元杂环基团或 1,2-二氮杂螺烷-1,2-二基、
R3 是氢、低级烷基、芳(低)烷基、低级烯基或芳基;
R4 是芳基,可具有选自低级烷基、卤素、低级烷氧基、低级烷基氨基、卤代(低级)烷基、羟基、低级烷酰基、酯化羧基和羧基的取代基、
R5 是氢或低级烷基,以及
X是0或S,条件是R3的低级烷基是(C3-C6)烷基,当R2是氢或(C1-C2)烷基和R4是芳基时,可选择具有选自卤素、低级烷基、低级烷氧基和卤代(低级)烷基组成的基团的取代基,及其药学上可接受的盐,以及其制备工艺和由其组成的药物组合物。
这些衍生物及其盐类可用作抗炎和镇痛剂。