(±)-bicyclo[2.2.1]hept-5-ene-trans-2,3-dicarboxylic acid

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: (±)-bicyclo[2.2.1]hept-5-ene-trans-2,3-dicarboxylic acid
• 英文别名: rac-trans-bicyclo[2.2.1]hept-5-ene-2,3-dicarboxylic acid；trans-norborn-5-ene-2,3-dicarboxylic acid；Norborna-5-ene-2beta,3alpha-dicarboxylic acid；(2R,3R)-bicyclo[2.2.1]hept-5-ene-2,3-dicarboxylic acid
• 化学式: C₉H₁₀O₄
• 分子量: 182.176
• InChiKey: NIDNOXCRFUCAKQ-TVVDDFTJSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.3
• 重原子数：
  13
• 可旋转键数：
  2
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.56
• 拓扑面积：
  74.6
• 氢给体数：
  2
• 氢受体数：
  4

反应信息

• 作为反应物：
  描述：

  (±)-bicyclo[2.2.1]hept-5-ene-trans-2,3-dicarboxylic acid 生成 (+)-hexahydro-6β-iodo-2-oxo-3αR,5α-methano-2H-3aβ,6aβ-cyclopenta[b]furan-7S-carboxylic acid
  参考文献：
  名称：

  HAMANAKA, NOBUYUKI;SEKO, TAKUYA;MIYAZAKI, TOHRU;NAKA, MASAO;FURUTA, KYOJI+, TETRAHEDRON LETT., 30,(1989) N8, C. 2399-2402

  摘要：

  DOI：
• 作为产物：
  描述：

  5-降冰片烯-2,3-二羧酸 生成 (±)-bicyclo[2.2.1]hept-5-ene-trans-2,3-dicarboxylic acid
  参考文献：
  名称：

  OKAMOTO, YOSHIO;ABURATANI, RYO;KAIDA, YURIKO;HATADA, KOICHI, CHEM. LETT.,(1988) N 7, 1125-1128

  摘要：

  DOI：

文献信息

• 3-(5-AMINO-1-OXOISOINDOLIN-2-YL)PIPERIDINE-2,6-DIONE DERIVATIVES AND USES THEREOF
  申请人：Novartis AG

  公开号：US20200016143A1

  公开（公告）日：2020-01-16

  The present disclosure provides a compound of Formula (I′): or a pharmaceutically acceptable salt, hydrate, solvate, prodrug, stereoisomer, or tautomer thereof, wherein R a , R b , R x , R 1 , R 2 , X 2 , and q are as defined herein, and methods of making and using same.

  本公开提供一种化合物Formula (I′)：或其药用盐、水合物、溶剂合物、前药、立体异构体或互变异构体，其中Ra、Rb、Rx、R1、R2、X2和q如本文所定义，并提供制备和使用该化合物的方法。
• Resolution of (±)-Bicyclo[2.2.1]hept-5-ene-trans-2,3-dicarboxylic Acid: Crystal Structure of Its Cinchoninium Salt
  作者：Lissette Jiménez、Teresa González、Alexander Briceño、Giuseppe Agrifoglio、Jesús Pastrán、Romano Dorta

  DOI：10.1007/s10870-016-0640-4

  日期：2016.4

  Single crystals of (+)-cinchoninium (+)-bicyclo[2.2.1]hept-5-ene-trans-2-carboxyl-3-carboxylate (S,S)-2 were obtained upon resolution of racemic (±)-bicyclo[2.2.1]hept-5-ene-trans-2,3-dicarboxylic acid rac-1 with (+)-cinchonine. An X ray diffraction analysis established the most important secondary interactions between the ions that are deemed responsible for the diastereomeric separation process.

  (+)-cinchoninium (+)-bicyclo[2.2.1]hept-5-ene-trans-2-carboxyl-3-carboxylate (S,S)-2 的单晶是在外消旋 (±)-分辨率下获得的双环[2.2.1]hept-5-ene-trans-2,3-二羧酸rac-1与(+)-辛可宁。X 射线衍射分析确定了被认为负责非对映体分离过程的离子之间最重要的次级相互作用。从 (S,S)-2 中分离出对映体纯的 (+)-双环[2.2.1]hept-5-ene-trans-2,3-二羧酸 (S,S)-1，产率为 72%。图形摘要(+)-cinchoninium (+)-bicyclo[2.2.1]hept-5-ene-trans-2-carboxyl-3-carboxylate (S,S)-2 的 X 射线衍射分析建立了最重要的次级相互作用被认为负责非对映体分离过程的离子。
• Pyrene-Based Fluorescent Nitric Oxide Cheletropic Traps (FNOCTs) for the Detection of Nitric Oxide in Cell Cultures and Tissues
  作者：Peter M. Düppe、Peter M. Talbierski、Frank S. Hornig、Ursula Rauen、Hans-Gert Korth、Timo Wille、Roland Boese、Thorsten Omlor、Herbert de Groot、Reiner Sustmann

  DOI：10.1002/chem.201000029

  日期：——

  The synthesis and the structural and spectroscopic characterization of nonfluorescent, pyrene‐based cyclic o‐quinodimethanes are reported. These compounds react efficiently with nitric oxide (NO) in a formal cheletropic manner, by which the fluorescent aromatic pyrene system is regenerated. The NO trapping capabilities and kinetics of the fluorescent nitric oxide cheletropic traps (FNOCTs) are assessed

  报道了非荧光，基于pyr的环状邻喹啉甲烷的合成以及结构和光谱表征。这些化合物以正式的亲油性方式与一氧化氮（NO）有效反应，从而再生了荧光芳香pyr系统。通过使用NO溶液和从N-二氮杂二烯二醇盐（NONOates）释放的NO，通过ESR，UV / Vis和荧光光谱法评估了THF和缓冲水溶液中的一氧化氮正离子捕获阱（FNOCT）的NO捕获能力和动力学。原型生物学应用包括从培养的大鼠肺泡巨噬细胞和猪主动脉内皮中产生NO的定量，这证明了纳摩尔浓度范围内NO检测的灵敏度。
• RESIST UNDERLAYER FILM-FORMING COMPOSITION, PRODUCTION METHOD OF SEMICONDUCTOR DEVICE USING THE SAME, AND ADDITIVE FOR RESIST UNDERLAYER FILM-FORMING COMPOSITION
  申请人：Nakajima Makoto

  公开号：US20100210765A1

  公开（公告）日：2010-08-19

  There is provided a composition for forming a resist underlayer film that the adhesion with a resist applied on the resist underlayer film is enhanced and the collapse of a resist pattern is suppressed. A resist underlayer film-forming composition for lithography comprising: a polymer having silicon atoms in the backbone; a compound of a polycyclic structure; and an organic solvent, wherein the compound of a polycyclic structure has at least two carboxyl groups as substituents; the two carboxyl groups are individually bonded to two carbon atoms adjacent to each other forming the polycyclic structure; and the two carboxyl groups both have an endo configuration or an exo configuration, or have a cis configuration.

  提供了一种用于形成抗蚀底层膜的组合物，其增强了与施加在抗蚀底层膜上的抗蚀剂的粘附性并抑制了抗蚀图案的崩溃。一种用于光刻的抗蚀底层膜形成组合物，包括：具有硅原子的聚合物骨架；多环结构的化合物；和有机溶剂，其中，多环结构的化合物具有至少两个羧基作为取代基；这两个羧基分别与相邻的两个碳原子形成多环结构的键合；这两个羧基都具有内向构型或外向构型，或具有顺式构型。
• Sangwan, Naresh K.; Schneider, Hans-Joerg, Journal of the Chemical Society. Perkin transactions II, 1989, p. 1223 - 1228
  作者：Sangwan, Naresh K.、Schneider, Hans-Joerg

  DOI：——

  日期：——