Novel carbazole derivative and chemically amplified radiation-sensitive resin composition
申请人:JSR Corporation
公开号:EP1238972A1
公开(公告)日:2002-09-11
A carbazole derivative of the following formula (1),
wherein R1 and R2 individually represent a hydrogen atom or a monovalent organic group, or R1 and R2 form, together with the carbon atom to which R1 and R2 bond, a divalent organic group having a 3-8 member carbocyclic structure or a 3-8 member heterocyclic structure, and R3 represents a hydrogen atom or a monovalent organic group. The carbazole derivative is suitable as an additive for increasing sensitivity of a chemically amplified resist. A chemically amplified radiation-sensitive resin composition, useful as a chemically amplified resist, comprising the carbazole derivative is also disclosed.
下式(1)的咔唑衍生物、
其中 R1 和 R2 分别代表氢原子或一价有机基团,或 R1 和 R2 与 R1 和 R2 键合的碳原子一起构成具有 3-8 个碳环结构或 3-8 个杂环结构的二价有机基团,R3 代表氢原子或一价有机基团。咔唑衍生物可作为一种添加剂,用于提高化学放大抗蚀剂的灵敏度。此外,还公开了一种化学放大辐射敏感树脂组合物,可用作化学放大抗蚀剂,其中包含咔唑衍生物。