4,4'-[(9-fluorenylidene)-bis-(4,1-phenyleneoxy)] bis-benzoic acid | 241156-44-5

• 分子结构分类: 有机化合物 - 苯类化合物 - 芴
• 英文名称: 4,4'-[(9-fluorenylidene)-bis-(4,1-phenyleneoxy)] bis-benzoic acid
• 英文别名: 9,9-bis[4-(4-carboxyphenoxy)phenyl]fluorene；9,9'-bis-[(4-hydroxycabonyl-phenyl)-oxyphenyl]-fluorene；4,4'-[(9-fulloreniriden)-bis-(4,1-phenyleneoxy)] bis-benzoic acid；4-[4-[9-[4-(4-Carboxyphenoxy)phenyl]fluoren-9-yl]phenoxy]benzoic acid
• CAS: 241156-44-5
• 化学式: C₃₉H₂₆O₆
• 分子量: 590.632
• InChiKey: QMEURDXVEWKHAV-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  8.8
• 重原子数：
  45
• 可旋转键数：
  8
• 环数：
  7.0
• sp3杂化的碳原子比例：
  0.03
• 拓扑面积：
  93.1
• 氢给体数：
  2
• 氢受体数：
  6

反应信息

• 作为反应物：
  描述：

  4,4'-[(9-fluorenylidene)-bis-(4,1-phenyleneoxy)] bis-benzoic acid 在 氯化亚砜 作用下， 反应 3.0h， 以81%的产率得到9,9'-bis-[4-(4-chlorocarbonyl-phenoxy)-phenyl]fluorene
  参考文献：
  名称：

  [DE] DICARBONSÄUREN FÜR DIELEKTRIKA MIT SPERRWIRKUNG GEGEN KUPFERDIFFUSION
  [EN] DICARBOXYLIC ACIDS FOR DIELECTRICS WITH BARRIER EFFECT AGAINST COPPER DIFFUSION
  [FR] ACIDES DICARBOXYLIQUES DESTINES A DES DIELECTRIQUES PRESENTANT UNE FONCTION DE BARRIERE CONTRE LA DIFFUSION DU CUIVRE

  摘要：

  这段文字的中文翻译如下： 该发明涉及公式（I）中E和n具有要求1中所述含义的新双羧酸。这些双羧酸适用于制造高温稳定的聚合物，如在微电子学中用作介电材料，以防止铜扩散。

  公开号：

  WO2004002934A1
• 作为产物：
  描述：

  4,4'-[(9-fluorenylidene)-bis-(4,1-phenyleneoxy)] bis-methyl benzoate 在 氢氧化钾 、 盐酸 作用下， 以 正丁醇 、 水 为溶剂， 反应 0.5h， 以96%的产率得到4,4'-[(9-fluorenylidene)-bis-(4,1-phenyleneoxy)] bis-benzoic acid
  参考文献：
  名称：

  JP2005/82564

  摘要：

  公开号：

文献信息

• Precursor of a heat resistant resin, heat resistant resin, insulating film and semiconductor device
  申请人：——

  公开号：US20020013443A1

  公开（公告）日：2002-01-31

  A precursor of a polybenzoxazole resin which comprises a crosslinking group in a molecule and has a specific structure, a polybenzoxazole resin obtained from the precursor by the condensation reaction and the crosslinking reaction, an insulating film comprising the polybenzoxazole resin and a semiconductor device comprising an insulating interlayer film in multi-layer wiring or a film for protecting surfaces which comprises the above insulating film. The precursor exhibits excellent processability due to excellent solubility in solvents and, after the ring closure, excellent heat stability in applications. The resin exhibits excellent electric, physical and mechanical properties and is advantageously used for insulating interlayer films of semiconductor devices and the like applications.

  一种聚苯并咪唑树脂的前体，其分子中包含交联基团并具有特定的结构，通过缩合反应和交联反应获得的聚苯并咪唑树脂，包括聚苯并咪唑树脂的绝缘膜以及包括上述绝缘膜的多层布线中的绝缘中间层膜或用于保护表面的膜的半导体器件。由于前体在溶剂中具有优异的溶解性，因此表现出优异的加工性能，并且在环闭后具有优异的热稳定性能，树脂表现出优异的电学、物理和机械性能，可优点地用于半导体器件的绝缘中间层膜等应用。
• Material for an insulating film, coating varnish for an insulating film, and insulating film and semiconductor device using the same
  申请人：——

  公开号：US20040002572A1

  公开（公告）日：2004-01-01

  A material for an insulating film which comprises a copolymer obtained by reacting a polyamide having a specific structure and a reactive oligomer as a component forming the film; a coating varnish for an insulating film which comprises this material and an organic solvent; an insulating film which comprises a layer of a resin comprising as a main structure a polybenzoxazole which is obtained by treating the above material or the above coating varnish by heating so that condensation reaction and crosslinking reaction take place and has fine pores; and a semiconductor device which comprises an insulating interlayer film for multi-layer wiring comprising the insulating film and/or a surface protective film comprising the insulating film. Excellent electrical, thermal and mechanical properties are exhibited and a low permittivity can be achieved.

  一种绝缘薄膜材料，包括由特定结构的聚酰胺和反应性低聚物作为成膜组分所反应得到的共聚物；一种用于绝缘薄膜的涂覆清漆，包括该材料和有机溶剂；一种绝缘薄膜，包括一层树脂，其主要结构为通过热处理上述材料或上述涂覆清漆得到的聚苯并咪唑，发生缩聚反应和交联反应并具有细小孔隙；以及一种半导体器件，包括用于多层布线的绝缘中间层膜，包括上述绝缘薄膜和/或表面保护膜，包括上述绝缘薄膜。具有优异的电性能、热性能和机械性能，并且可以实现低介电常数。
• RESIN COMPOSITION, VARNISH, RESIN FILM AND SEMICONDUCTOR DEVICE USING THE SAME
  申请人：Fujita Kazuyoshi

  公开号：US20090118431A1

  公开（公告）日：2009-05-07

  A main object of the present invention is to provide a resin composition having high heat resistance and a low dielectric constant, a varnish thereof, a resin film thereof and a semiconductor device using the same. In the present invention, the object is achieved by a resin composition comprising a compound having a structure represented by formula (1) and a crosslinking agent: wherein in formula (1), R 0 is a single bond or has a structure represented by formula (2); R 1 to R 8 are respectively any of hydrogen, a group having an alicyclic structure, an organic group having 1 to 10 carbon atoms other than the group having an alicyclic structure, a hydroxyl group and a carboxyl group; and “X” is any of —O—, —NHCO—, —CONH—, —COO— and —OCO—; further, wherein in formula (2), “Ar” is an aromatic group; “Y” is any of a single bond —O—, —S—, —OCO— and —COO—; “q” is an integer of 1 or more; R 9 is hydrogen or an organic group having 1 or more carbon atoms and may be identical with or different from each other when “q” is an integer of 2 or more; at least one of R 1 to R 8 is the group having an alicyclic structure when R 0 is a single bond; at least one of R 1 to R 9 is the group having an alicyclic structure when R 0 has the structure represented by formula (2); and “*” and “**” represent a position to be bonded to a different chemical structure.

  本发明的主要目的是提供一种具有高耐热性和低介电常数的树脂组合物，其清漆，树脂膜以及使用该组合物的半导体器件。在本发明中，通过包括具有以下结构的化合物和交联剂的树脂组合物来实现该目标：其中在公式（1）中，R0是单键或具有以下结构的化合物（2）；R1到R8分别为氢、具有脂环结构的基团、具有1到10个碳原子的有机基团（不包括具有脂环结构的基团）、羟基和羧基中的任意一种；“X”是以下任意一种：—O—、—NHCO—、—CONH—、—COO—和—OCO—；此外，在公式（2）中，“Ar”是芳香族基团；“Y”是以下任意一种：单键—O—、—S—、—OCO—和—COO—；“q”是1或更多的整数；当“q”是2或更多的整数时，R9是氢或具有1个或更多碳原子的有机基团，并且可以相同或不同；当R0是单键时，R1到R8中至少有一个是具有脂环结构的基团；当R0具有以下结构的化合物（2）时，R1到R9中至少有一个是具有脂环结构的基团；“*”和“**”表示要与不同化学结构结合的位置。
• Benzoxazole Resin Precursor, Polybenzoxazole Resin, Resin Film And Semiconductor Device
  申请人：Enoki Takashi

  公开号：US20080206548A1

  公开（公告）日：2008-08-28

  A benzoxazole resin precursor comprising a first repeating unit which is obtained by the reaction of a bisaminophenol compound and a dicarboxylic acid compound, at least one of which has the diamondoid structure; a benzoxazole resin precursor further comprising a second repeating unit which is obtained by the reaction of a bisaminophenol compound having no diamondoid structure and a dicarboxylic acid compound having no diamondoid structure; a polybenzoxazole resin obtained by the ring-closing reaction with dehydration of the above benzoxazole resin precursor; a resin film constituted with the benzoxazole resin precursor or the polybenzoxazole resin. A polybenzoxazole resin and a resin film having excellent heat resistance and a small permittivity and a semiconductor device using the resin film can be obtained from the benzoxazole resin precursor.

  一种苯并噁唑树脂前体，包括第一重复单元，该单元由双氨基酚化合物和二羧酸化合物反应得到，其中至少一个具有金刚烷结构；一种苯并噁唑树脂前体，进一步包括第二重复单元，该单元由不具有金刚烷结构的双氨基酚化合物和不具有金刚烷结构的二羧酸化合物反应得到；通过上述苯并噁唑树脂前体的环合反应和脱水反应得到的聚苯并噁唑树脂；由苯并噁唑树脂前体或聚苯并噁唑树脂构成的树脂膜。可以从苯并噁唑树脂前体中获得具有优异耐热性和小介电常数的聚苯并噁唑树脂和树脂膜，以及使用树脂膜的半导体器件。
• Resin Composition, Polyimide Resin Composition, Polybenzoxazole Resin Composition, Varnish, Resin Film and Semiconductor Device Using the Same
  申请人：Enoki Takashi

  公开号：US20080255335A1

  公开（公告）日：2008-10-16

  A resin composition having high heat resistance and low dielectric constant after heat treatment, a varnish thereof and a semiconductor device using the same are provided by a resin composition including a compound having a structure represented by the general formula (1): wherein, “Ar” is an aromatic group; “a” is 0 or 1; R 11 is an organic group having one or more carbon atoms and at least one is a group having an alicyclic structure; when “q” is an integer of 2 or more, R 11 s may be the same or different from each other; at least one of R 1 to R 5 and at least one of R 6 to R 10 on respective benzene rings are Ar-binding sites or R 11 -binding sites and the others of R 1 to R 5 and R 6 to R 10 are each hydrogen, a group having an alicyclic structure, an organic group having 1 to 10 carbon atoms, a hydroxyl group or a carboxyl group; when “a” is 0, at least one of R 1 to R 5 and R 6 to R 10 is a group having an alicyclic structure; “q” is an integer of 1 or more; and “X” is any of —O—, —NHCO—, —COHN—, —COO— and —OCO—.

  提供一种高热稳定性和低介电常数的树脂组合物，其在热处理后具有高热稳定性和低介电常数，以及其清漆和半导体器件。该树脂组合物包括具有以下通式（1）所表示结构的化合物：其中，“Ar”为芳香族基；“a”为0或1；R11为具有一个或多个碳原子的有机基，至少有一个是具有脂环结构的基团；当“q”为2或更多的整数时，R11可以相同或不同；R1至R5中的至少一个和R6至R10中的至少一个在各自的苯环上是Ar结合位点或R11结合位点，而R1至R5和R6至R10中的其他部分分别是氢、具有脂环结构的基团、具有1至10个碳原子的有机基、羟基或羧基；当“a”为0时，R1至R5和R6至R10中的至少一个是具有脂环结构的基团；“q”为1或更多的整数；而“X”为—O—、—NHCO—、—COHN—、—COO—和—OCO—中的任意一种。