Bis-(4-hydroxy-3-allyl-phenyl)-aether | 105329-34-8

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: Bis-(4-hydroxy-3-allyl-phenyl)-aether
• 英文别名: 2,2'-Diallyl-4,4'-oxy-di-phenol；4,4'-Oxybis[2-(prop-2-en-1-yl)phenol]；4-(4-hydroxy-3-prop-2-enylphenoxy)-2-prop-2-enylphenol
• CAS: 105329-34-8
• 化学式: C₁₈H₁₈O₃
• 分子量: 282.339
• InChiKey: QEILNQWHQJSWST-UHFFFAOYSA-N

物化性质

• 沸点：
  434.9±45.0 °C(Predicted)
• 密度：
  1.149±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  4.8
• 重原子数：
  21
• 可旋转键数：
  6
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.11
• 拓扑面积：
  49.7
• 氢给体数：
  2
• 氢受体数：
  3

反应信息

• 作为反应物：
  描述：

  四氢吡咯 、 聚合甲醛 、 Bis-(4-hydroxy-3-allyl-phenyl)-aether 在 盐酸 作用下， 以 乙醇 为溶剂， 反应 2.0h， 生成 4,4'-oxybis(2-allyl-6-(pyrrolidin-1-ylmethyl)phenol) hydrochloride
  参考文献：
  名称：

  Hung; Werbel, European Journal of Medicinal Chemistry, 1983, vol. 18, # 1, p. 61 - 66

  摘要：

  DOI：
• 作为产物：
  描述：

  4,4'-二羟基二苯醚 在 potassium carbonate 、 丙酮 作用下， 250.0 ℃ 、2.67 kPa 条件下， 生成 Bis-(4-hydroxy-3-allyl-phenyl)-aether
  参考文献：
  名称：

  氨基烷基苯酚作为抗疟药；简单取代的α-氨基甲酚。

  摘要：

  DOI：

  10.1021/ja01214a008

文献信息

• COMPOUND, RESIN, COMPOSITION AND PATTERN FORMATION METHOD
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20210070727A1

  公开（公告）日：2021-03-11

  The present invention provides a compound represented by following formula (0):

  本发明提供了以下式（0）表示的化合物。
• COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD AND CIRCUIT PATTERN FORMATION METHOD
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20210070685A1

  公开（公告）日：2021-03-11

  The present invention provides a compound having a specific structure represented by the following formula (0), a resin having a constituent unit derived from the compound, various compositions containing the compound and/or the resin, and various methods using the compositions.

  本发明提供一种具有以下式（0）所代表的特定结构的化合物，具有从该化合物衍生的组分单元的树脂，含有该化合物和/或树脂的各种组合物，以及使用这些组合物的各种方法。
• FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATION FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, AND METHOD FOR FORMING PATTERN
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20210165327A1

  公开（公告）日：2021-06-03

  An object of the present invention is to provide a film forming material for lithography that is applicable to a wet process, and is useful for forming a photoresist underlayer film excellent in heat resistance, etching resistance, embedding properties to a supporting material having difference in level, and film flatness; and the like. The problem described above can be solved by the following film forming material for lithography. A film forming material for lithography comprising: a compound having a group of formula (0A): (In formula (0A), R A is a hydrogen atom or an alkyl group having 1 to 4 carbon atoms; and R B is an alkyl group having 1 to 4 carbon atoms.); and a compound having a group of formula (0B):

  本发明的目的是提供一种适用于湿法的光刻膜材料，用于形成具有良好耐热性、耐蚀性、嵌入性和膜平整度的光刻胶底层膜，以及支撑材料之间高度差异的问题。以上所述的问题可以通过以下的光刻膜材料来解决。一种光刻膜材料，包括：具有公式（0A）组的化合物：（在公式（0A）中，RA是氢原子或具有1至4个碳原子的烷基；RB是具有1至4个碳原子的烷基。）；以及具有公式（0B）组的化合物：
• COMPOSITION FOR FORMING OPTICAL COMPONENT, OPTICAL COMPONENT, COMPOUND, AND RESIN
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20210309595A1

  公开（公告）日：2021-10-07

  Provided is a composition containing a polyphenol compound (B) and a solvent, in which the polyphenol compound (B) is at least one selected from a compound represented by the following formula (1) and a resin having a structure represented by the following formula (2): wherein R Y , R T , X, m, N, r, and L are as described in the description.

  提供的是含有多酚化合物(B)和溶剂的组合物，其中多酚化合物(B)至少选自以下式子(1)所表示的化合物和以下式子(2)所表示的具有结构的树脂之一：其中RY、RT、X、m、N、r和L如说明书中所述。
• COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, CIRCUIT PATTERN FORMATION METHOD AND METHOD FOR PURIFYING RESIN
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20200361843A1

  公开（公告）日：2020-11-19

  A compound represented by the following formula (1). (In the formula (1), A is a group containing a heteroatom; R 1 is a 2n-valent group having 1 to 30 carbon atoms and optionally having a substituent; R 2 to R 5 are each independently a linear, branched or cyclic alkyl group having 1 to 30 carbon atoms and optionally having a substituent, an aryl group having 6 to 30 carbon atoms and optionally having a substituent, an alkenyl group having 2 to 30 carbon atoms and optionally having a substituent, an alkynyl group having 2 to 30 carbon atoms and optionally having a substituent, an alkoxy group having 1 to 30 carbon atoms and optionally having a substituent, a halogen atom, a nitro group, an amino group, a carboxylic acid group, a crosslinkable group, a dissociation group, a thiol group or a hydroxy group, wherein the alkyl group, the aryl group, the alkenyl group and the alkoxy group each optionally contain an ether bond, a ketone bond or an ester bond and at least one R 4 and/or at least one R 5 is a hydroxy group and/or a thiol group; m 2 and m 3 are each independently an integer of 0 to 8; m 4 and m 5 are each independently an integer of 0 to 9; n is an integer of 1 to 4; and p 2 to p 5 are each independently an integer of 0 to 2.)

  以下是由以下式子（1）表示的化合物。（在式子（1）中，A是含有杂原子的基团；R1是具有1到30个碳原子并可选地具有取代基的2n价基团；R2至R5分别是线性，支链或环状烷基，具有1到30个碳原子并可选地具有取代基，具有6到30个碳原子并可选地具有取代基的芳基，具有2到30个碳原子并可选地具有取代基的烯基，具有2到30个碳原子并可选地具有取代基的炔基，具有1到30个碳原子并可选地具有取代基的烷氧基，卤素原子，硝基，氨基，羧酸基，交联基，解离基，硫醇基或羟基，其中烷基，芳基，烯基和烷氧基各自可选地包含醚键，酮键或酯键，并且至少有一个R4和/或至少有一个R5是羟基和/或硫醇基；m2和m3分别是0到8的整数；m4和m5分别是0到9的整数；n是1到4的整数；p2到p5分别是0到2的整数。）