Bicyclo[2.2.1]hept-5-ene-2-carboxylic acid, 1-ethylcyclohexyl ester | 279243-72-0

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: Bicyclo[2.2.1]hept-5-ene-2-carboxylic acid, 1-ethylcyclohexyl ester
• 英文别名: (1-ethylcyclohexyl) bicyclo[2.2.1]hept-5-ene-2-carboxylate
• CAS: 279243-72-0
• 化学式: C₁₆H₂₄O₂
• 分子量: 248.36
• InChiKey: ZCEVKNIQXPNZBG-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4
• 重原子数：
  18
• 可旋转键数：
  4
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.81
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

文献信息

• GENERATION OF ENDO- AND/OR EXO-NORBORNENECARBOXALDEHYDE AS AN INTERMEDIATE TO FUNCTIONALIZED NORBORNENES
  申请人：Bell Andrew

  公开号：US20090118539A1

  公开（公告）日：2009-05-07

  Embodiments in accordance with the present invention provide for forming essentially pure diastereomers of 5/6-substituted norbornene-type monomers. Further, embodiments in accordance with the present invention encompass polymerizing such diastereomers to form addition or ROMP polymers where a desired exo-/endo-ratio of the diastereomers is provided to the polymerization, such ratio designed to provide a desired ratio of endo-/exo-structured repeating units for a resulting polymer to have desired physical or chemical properties.

  根据本发明的实施例，提供形成基本纯的5/6-取代去氢莰烯型单体的异构体。此外，根据本发明的实施例涵盖聚合这种异构体以形成加成或ROMP聚合物，其中所提供给聚合反应的异构体的期望外/内比例设计为提供所得聚合物具有期望的物理或化学性质的外/内结构重复单元的期望比例。
• Method for producing carboxylic acid tertiary alkyl ester
  申请人：——

  公开号：US20020055649A1

  公开（公告）日：2002-05-09

  A carboxylic acid tertiary alkyl ester (Chemical formula 1) of high purity is obtained at a high yield ratio, by continually adding an esterification agent possessing a monovalent acid group, which agent is ester-interchangeable with a tertiary alcohol, to a mixed fluid of a carboxylic acid and a tertiary alcohol: R 1 (COOR 2 ) n (1)

  通过持续添加具有单价酸基的酯化剂，该酯化剂可与三级醇交换酯基，到羧酸和三级醇的混合液中，可以高产率地得到高纯度的羧酸三级烷基酯（化学式1）。结果为R1（COOR2）n（1）。
• Radiation-sensitive resin composition
  申请人：——

  公开号：US20030219680A1

  公开（公告）日：2003-11-27

  A radiation-sensitive resin composition suitable as a chemically-amplified resist is provided. The composition comprised (A) a resin insoluble or scarcely soluble in alkali, but becoming alkali soluble by the action of an acid, and (B) a photoacid generator. The resin comprises a recurring unit of the following formula (I), 1 wherein R 1 is typically a hydrogen atom and the —C (R 5 ) 3 structure is a 2-methyl-2-tricyclodecanyl group, 2-ethyl-2-tricyclodecanyl group, 2-methyl-2-adamantyl group, 2-ethyl-2-adamantyl group, 1-methylcyclopentyl group, 1-ethylcyclopentyl group, 1-methylcyclohexyl group, or 1-ethylcyclohexyl group.

  提供一种适用于化学放大光刻胶的辐射敏感树脂组合物。该组合物包含(A)一种碱不溶或难溶的树脂，但在酸的作用下变得碱溶，以及(B)一种光酸发生剂。该树脂包含以下式(I)的重复单元，其中R1通常是氢原子，而—C(R5)3结构是2-甲基-2-三环己基基团、2-乙基-2-三环己基基团、2-甲基-2-金刚烷基团、2-乙基-2-金刚烷基团、1-甲基环戊基团、1-乙基环戊基团、1-甲基环己基团或1-乙基环己基团。
• SILANE COMPOUND, POLYSILOXANE AND RADIATION-SENSITIVE RESIN COMPOSITION
  申请人：JSR Corporation

  公开号：EP1679314A1

  公开（公告）日：2006-07-12

  A novel polysiloxane suitable as a resin component of a chemically-amplified resist exhibiting particularly excellent I-D bias, depth of focus (DOF), and the like, a novel silane compound useful as a raw material for synthesizing the polysiloxane, and a radiation-sensitive resin composition comprising the polysiloxane are provided. The silane compound is shown by the following formula (I), and the polysiloxane has a structural unit shown by the following formula (1), wherein R is an alkyl group, R1 and R2 individually represent a fluorine atom, lower alkyl group, or lower fluoroalkyl group, n is 0 or 1, k is 1 or 2, and i is an integer of 0 to 10. The radiation-sensitive resin composition comprises the polysiloxane and a photoacid generator.

  本发明提供了一种适用于作为化学放大抗蚀剂的树脂成分的新型聚硅氧烷，该抗蚀剂具有特别优异的 I-D 偏压和焦深（DOF）等性能；一种可用作合成该聚硅氧烷的原料的新型硅烷化合物；以及一种包含该聚硅氧烷的辐射敏感树脂组合物。 硅烷化合物如下式（I）所示、 而聚硅氧烷具有下式（1）所示的结构单元、 其中 R 是烷基，R1 和 R2 分别代表氟原子、低级烷基或低级氟烷基，n 是 0 或 1，k 是 1 或 2，i 是 0 至 10 的整数。 辐射敏感树脂组合物包括聚硅氧烷和光酸发生器。
• RESIN MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD FOR PRODUCING RESIST UNDERLAYER FILM, AND LAYERED PRODUCT
  申请人：Mitsui Chemicals, Inc.

  公开号：EP3693793A1

  公开（公告）日：2020-08-12

  Provided is a resin material for forming an underlayer film which is used to form a resist underlayer film used in a multi-layer resist process, the resin material including a cyclic olefin polymer (I), in which a temperature at an intersection between a storage modulus (G') curve and a loss modulus (G") curve in a solid viscoelasticity of the resin material for forming an underlayer film which is as measured under conditions of a measurement temperature range of 30°C to 300°C, a heating rate of 3°C/min, and a frequency of 1 Hz in a nitrogen atmosphere in a shear mode using a rheometer is higher than or equal to 40°C and lower than or equal to 200°.

  本发明提供了一种用于形成底层膜的树脂材料，该底层膜可用于形成多层光刻胶工艺中使用的光刻胶底层膜，该树脂材料包括环烯烃聚合物 (I)、其中，用于形成底层膜的树脂材料的固体粘弹性中的存储模量（G'）曲线和损失模量（G"）曲线的交点温度高于或等于 40°C，且低于或等于 200°C；该固体粘弹性是在测量温度范围为 30°C 至 300°C、加热速率为 3°C/min 和频率为 1 Hz 的条件下，在氮气环境中使用流变仪以剪切模式测得的。