申请人:FUJISAWA PHARMACEUTICAL CO., LTD.
公开号:EP0349949A2
公开(公告)日:1990-01-10
A compound of the formula :
wherein R' is halogen, heterocyclic group which may have one or more suitable substituent(s), aryl which may have one or more suitable substituent(s),
-NH-R5 (in which R5 is hydrogen, lower alkanoyl or hydroxy(lower)alkyl),
-S-R6 (in which R6 is lower alkyl, lower alkyl substituted with carboxy and amino, lower alkyl substituted with protected carboxy and protected amino, or pyridyl),
-O-R7 (in which R7 is hydrogen, hydroxy protective group, lower alkyl, lower alkenyl, ar(lower)alkyl, halo-(lower)alkyl, amino(loweralkyl, protected amino(lower)alkyl, or piperazinyl(lower)alkyl which may have lower alkyl),
-CONH-R$ (in which R8 is cyano, carbamoyl(lower)alkyl, carboxy(lower)alkyl, protected carboxy(lower)alkyl, or lower alkyl substituted with carbamoyl and aryl ), or
-Z-R9 [in which R9 is hydrogen or lower alkyl, and Z is
(wherein is hydroxy, lower alkoxy or amino) or
(wherein R11 is carboxy or protected carboxy and R'2 is hydrogen; or R11 is halogen and R'2 is halogen)], R2 is aryl which may have one or more suitable substituent(s),
R3 is hydrogen or halogen,
R4 is hydrogen, halogen or lower alkoxy and
A is lower alkylene,
and a pharmaceutically acceptable salt thereof,
processes for the preparation and pharmaceutical compositions comprising them as an active ingredient
式中的化合物
其中 R'为卤素、杂环基(可有一个或多个合适的取代基)、芳基(可有一个或多个合适的取代基)、
-NH-R5(其中 R5 为氢、低级烷酰基或羟基(低级)烷基)、
-S-R6(其中 R6 为低级烷基、被羧基和氨基取代的低级烷基、被保护羧基和保护氨基取代的低级烷基或吡啶基)、
-O-R7(其中 R7 为氢、羟基保护基、低级烷基、低级烯基、芳基(低级)烷基、卤代(低级)烷基、氨基(低级烷基)、受保护氨基(低级)烷基或可能具有低级烷基的哌嗪基(低级)烷基)、
-CONH-R$(其中 R8 为氰基、氨基甲酰基(低级)烷基、羧基(低级)烷基、受保护的羧基(低级)烷基或被氨基甲酰基和芳基取代的低级烷基),或
-Z-R9[其中 R9 是氢或低级烷基,Z 是
(其中为羟基、低级烷氧基或氨基)或
(其中 R11 为羧基或受保护的羧基,R'2 为氢;或 R11 为卤素,R'2 为卤素)],R2 为芳基,可带有一个或多个合适的取代基、
R3 是氢或卤素、
R4 是氢、卤素或低级烷氧基,以及
A 是低级亚烷基、
及其药学上可接受的盐、
制备工艺和以它们为活性成分的药物组合物