(4’-benzenesulfoxyphenyl)ethene | 22909-68-8

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: (4’-benzenesulfoxyphenyl)ethene
• 英文别名: (4-Ethenylphenyl) benzenesulfonate
• CAS: 22909-68-8
• 化学式: C₁₄H₁₂O₃S
• 分子量: 260.313
• InChiKey: HKOWGBOJQRDFDR-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.8
• 重原子数：
  18
• 可旋转键数：
  4
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  51.8
• 氢给体数：
  0
• 氢受体数：
  3

反应信息

• 作为反应物：
  描述：

  (4’-benzenesulfoxyphenyl)ethene 在 RuCl2(1,3-dimesityl-imidazolidin-2-yl)(PCy3)(=CHPh) 、 sodium tetrahydroborate 、 chloro(1,5-cyclooctadiene)rhodium(I) dimer 、 sodium hydroxide 、 lithium hydroxide 作用下， 以 1,4-二氧六环 、 甲醇 、 aq. phosphate buffer 、 二氯甲烷 、 水 为溶剂， 反应 28.5h， 生成
  参考文献：
  名称：

  Total Synthesis of (−)-Blepharocalyxin D and Analogues

  摘要：

  An efficient strategy for the total synthesis of (-)-blepharocalyxin D and an analogue is described. The key step involves an acid-mediated cascade process in which reaction of methyl 3,3-dimethoxypropanoate with gamma,delta-unsaturated alcohols possessing diastereotopic styrenyl groups gives trans-fused bicyclic lactones with the creation of two rings and four stereocenters in one pot.

  DOI：

  10.1021/ol400736w
• 作为产物：
  描述：

  苯磺酰氯 在 正丁基锂 、 三乙胺 作用下， 以 四氢呋喃 、 正己烷 、 二氯甲烷 为溶剂， 反应 2.0h， 生成 (4’-benzenesulfoxyphenyl)ethene
  参考文献：
  名称：

  Total Synthesis of (−)-Blepharocalyxin D and Analogues

  摘要：

  An efficient strategy for the total synthesis of (-)-blepharocalyxin D and an analogue is described. The key step involves an acid-mediated cascade process in which reaction of methyl 3,3-dimethoxypropanoate with gamma,delta-unsaturated alcohols possessing diastereotopic styrenyl groups gives trans-fused bicyclic lactones with the creation of two rings and four stereocenters in one pot.

  DOI：

  10.1021/ol400736w

文献信息

• Polymerizable Fluorine-Containing Compound
  申请人：ISONO Yoshimi

  公开号：US20110098500A1

  公开（公告）日：2011-04-28

  A polymerizable fluorine-containing compound represented by formula (1), wherein R 1 represents a polymerizable double-bond containing group, R 2 represents an acid-labile protecting group, R 3 represents a fluorine atom or fluorine-containing alkyl group, and W represents a bivalent linking group. This compound can provide a fluorine-containing polymer compound that has a weight-average molecular weight of 1,000-1,000,000 and contains a repeating unit represented by formula (2), wherein R 2 , R 3 and W are defined as above, each of R 4 , R 5 and R 6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, at least two of R 4 , R 5 and R 6 may be combined to form a ring. This polymer compound can provide a resist composition capable of forming a pattern that is transparent to exposure light and superior in rectangularity.

  一种可聚合的含氟化合物，其化学式为（1），其中R1表示可聚合的双键含有基团，R2表示酸敏感保护基团，R3表示氟原子或含氟烷基团，W表示二价连接基团。该化合物可以提供一种含氟聚合物化合物，其重均分子量为1,000-1,000,000，并包含由式（2）表示的重复单元，其中R2、R3和W如上所述，R4、R5和R6中的每一个独立地表示氢原子、氟原子或一价有机基团，至少两个R4、R5和R6可以结合形成一个环。该聚合物化合物可以提供一种抗蚀剂组合物，能够形成透明的曝光光线图案，并具有优异的矩形度。
• Fluorine-Containing Compound, Fluorine-Containing Polymer, Negative-Type Resist Composition, and Patterning Process Using Same
  申请人：ISONO Yoshimi

  公开号：US20120226070A1

  公开（公告）日：2012-09-06

  A fluorine-containing unsaturated carboxylic acid represented by formula (1), wherein R 1 represents a polymerizable double-bond containing group, R 3 represents a fluorine atom or fluorine-containing alkyl group, and W represents a bivalent linking group. This compound can provide a fluorine-containing polymer compound that has a weight-average molecular weight of 1,000-1,000,000 and contains a repeating unit represented by formula (2), wherein R 3 and W are defined as above, each of R 4 , R 5 and R 6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, at least two of R 4 , R 5 and R 6 may be combined to form a ring. This polymer compound can provide a chemically amplified resist composition that is transparent to KrF or ArF excimer laser light and has a high resolution and is capable of forming a pattern having a rectangular section with no swelling.

  化学式（1）所表示的含氟不饱和羧酸，其中R1代表可聚合的双键含基团，R3代表氟原子或含氟烷基团，W代表二价连接基团。该化合物可提供一种分子量为1,000-1,000,000且含有化学式（2）所表示的重复单元的含氟聚合物化合物，其中R3和W如上所定义，R4、R5和R6中的每一个独立地代表氢原子、氟原子或一价有机基团，R4、R5和R6中至少有两个可以结合形成环。该聚合物化合物可提供一种化学增强型光刻胶组合物，该组合物对KrF或ArF准分子激光光线透明，具有高分辨率，并能够形成具有矩形截面且无膨胀的图案。
• Fluorine-Containing Compound, Fluorine-Containing Polymer, Postive-Type Resist Composition, And Patterning Process Using Same
  申请人：ISONO Yoshimi

  公开号：US20080311507A1

  公开（公告）日：2008-12-18

  Disclosed is a fluorine-containing compound represented by formula (1), wherein R 1 represents a polymerizable double-bond containing group, R 2 represents an acid-labile protecting group, R 3 represents a fluorine atom or fluorine-containing alkyl group, and W represents a bivalent linking group. This compound can provide a fluorine-containing polymer compound that has a weight-average molecular weight of 1,000-1,000,000 and contains a repeating unit represented by formula (2), wherein R 2 , R 3 and W are defined as above, each of R 4 , R 5 and R 6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, at least two of R 4 , R 5 and R 6 may be combined to form a ring. This polymer compound can provide a resist composition capable of forming a pattern that is transparent to exposure light and superior in rectangularity.

  本发明涉及一种含氟化合物，其化学式为（1），其中R1代表可聚合的双键含基团，R2代表酸易保护基，R3代表氟原子或含氟烷基团，W代表双价连结基团。该化合物可提供一种含氟聚合物化合物，其重均分子量为1,000-1,000,000，并含有由式（2）所表示的重复单元，其中R2、R3和W如上所定义，R4、R5和R6中的每一个独立地代表氢原子、氟原子或一价有机基团，其中至少两个R4、R5和R6可以组成环。该聚合物化合物可提供一种抗蚀剂组合物，能够形成对曝光光线透明且在矩形度方面优越的图案。
• Positive-Type Resist Composition
  申请人：ISONO Yoshimi

  公开号：US20090061353A1

  公开（公告）日：2009-03-05

  Disclosed is a fluorine-containing polymer compound containing first and second repeating units respectively represented by formulas (a-1) and (a-2), wherein R 3 represents a fluorine atom or fluorine-containing alkyl group, each of W and W 1 independently represents a bivalent linking group, R 2 represents an acid-labile protecting group, each of R 4 , R 5 and R 6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, and at least two of R 4 , R 5 , R 6 and W or W 1 may be combined to form a cyclic structure in formula (a-1) or (a-2). This polymer compound has a weight-average molecular weight of 1,000 to 1,000,000 and can provide a resist composition capable of forming a pattern with no swelling and no pattern falling down.

  本发明涉及一种含氟聚合物化合物，其中包含第一和第二重复单元，分别由式（a-1）和（a-2）表示，其中R3表示氟原子或含氟烷基，W和W1各自表示双价连接基团，R2表示酸敏保护基团，R4、R5和R6各自表示氢原子、氟原子或单价有机基团，且式（a-1）或（a-2）中至少两个R4、R5、R6和W或W1可组成环状结构。该聚合物化合物具有1,000至1,000,000的重均分子量，并可提供一种抗膨胀和无图案脱落的光刻胶组合物。
• Fluorine-Containing Compound, Fluorine-Containing Polymer Compound, Resist Composition and Patterning Method Using Same
  申请人：Mori Kazunori

  公开号：US20110318542A1

  公开（公告）日：2011-12-29

  There is disclosed a fluorine-containing polymer compound comprising a repeating unit (a) of the following general formula (2) and having a weight-average molecular weight of 1000 to 1000000 where R 1 represents a polymerizable double bond-containing group; R 2 represents a fluorine atom or a fluorine-containing alkyl group; R 3 represents a hydrogen atom, an acid labile group, a cross-linking site or the other monovalent organic group; and W 1 represents a linking moiety. When the fluorine-containing polymer compound is used in a resist compound for pattern formation by high energy radiation of 300 nm or less wavelength or electron beam radiation, it is possible to form a resist pattern with a good rectangular profile.

  本发明公开了一种含氟聚合物化合物，其包括下述通式（2）的重复单元（a），并且具有1000至1000000的重均分子量，其中R1表示聚合双键含有基团；R2表示氟原子或含氟烷基；R3表示氢原子、酸敏基团、交联位点或其他一价有机基团；W1表示连接基。当将该含氟聚合物化合物用于300纳米或更短波长的高能辐射或电子束辐射的图案形成的光阻化合物中时，可以形成具有良好矩形轮廓的光阻图案。