申请人:NIPPON TELEGRAPH AND TELEPHONE CORPORATION
公开号:EP0616234A2
公开(公告)日:1994-09-21
A polyimide optical waveguide comprising a core (2) made of polyimide whose refractive index is controlled to a predetermined value by electron beam irradiation, and a cladding (1, 3) set in contact with the core and having a refractive index lower than that of the core.
A polyamic acid solution is spin-coated on a substrate such as of silicon, and is thermally cured to form a polyimide layer. An electron beam is irradiated on the entire surface of the polyimide layer to change the refractive index to a predetermined value. An electron beam-absorbed dose of the polyimide layer depends on the composition of the polyimide, an energy of the electron beam, and the applied amount of the electron beam irradiation. The refractive index changes in accordance therewith approximately.
This polyimide layer irradiated with the electron beam is used as a core layer.
Next, the same polyamic acid solution is spin-coated on the core layer, and is thermally cured. The material is separated from the substrate to obtain a polyimide film of a two-layer structure.
Then, the polyimide film of a two-layer structure is made to reverse and the irradiated polyimide layer is made to the upper surface. The lower surface of the reversed film is adhered by a method such as a thermo-compression bonding on the other silicon substrate.
Next, the core layer is patterned into a desired shape, for example, a rectangular shape, by RIE (reactive ion etching) method.
Finally, the same polyamic acid solution is spin-coated over the patterned core layer, as an upper cladding lacer, and is thermally cured, thereby preparing an embedded channel waveguide.
一种聚酰亚胺光波导,包括一个由聚酰亚胺制成的芯子(2),其折射率可通过电子束辐照控制到预定值;以及一个与芯子接触的包层(1,3),其折射率低于芯子的折射率。
将聚酰胺酸溶液旋涂在硅等基底上,并通过热固化形成聚酰亚胺层。电子束照射聚酰亚胺层的整个表面,使折射率变为预定值。聚酰亚胺层的电子束吸收剂量取决于聚酰亚胺的成分、电子束的能量和电子束辐照的应用量。折射率大致随之变化。
经电子束辐照的聚酰亚胺层被用作核心层。
然后,在芯层上旋涂相同的聚酰胺酸溶液,并进行热固化。材料与基底分离,得到双层结构的聚酰亚胺薄膜。
然后,将双层结构的聚酰亚胺薄膜反转,使辐照聚酰亚胺层位于上表面。反转薄膜的下表面通过热压接合等方法粘附在另一块硅衬底上。
然后,用 RIE(反应离子蚀刻)方法将芯层图案化为所需的形状,例如矩形。
最后,将相同的聚酰胺酸溶液旋涂在图案化的芯层上,作为上覆层,并进行热固化,从而制备出嵌入式通道波导。