Agn-PC-0D62UF | 156938-18-0

• 分子结构分类: 有机化合物 - 苯丙烷和聚酮 - 二芳基庚烷
• 英文名称: Agn-PC-0D62UF
• 英文别名: 4-[[4-hydroxy-3-[(4-hydroxyphenyl)methyl]-2,5-dimethylphenyl]methyl]-2-[(4-hydroxyphenyl)methyl]-3,6-dimethylphenol
• CAS: 156938-18-0
• 化学式: C₃₁H₃₂O₄
• 分子量: 468.6
• InChiKey: LGSIBOURGOBCMN-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  7.7
• 重原子数：
  35
• 可旋转键数：
  6
• 环数：
  4.0
• sp3杂化的碳原子比例：
  0.23
• 拓扑面积：
  80.9
• 氢给体数：
  4
• 氢受体数：
  4

文献信息

• Photosensitive Compound and Photosensitive Composition Including the Same
  申请人：Park Joo Hyeon

  公开号：US20110053084A1

  公开（公告）日：2011-03-03

  Disclosed are a photosensitive compound and a method of manufacturing the same. The photosensitive is composed of a naphthoquinonediazide sulfonic ester compound having at least one naphthoquinonediazide sulfoxy group, and having either at least one carboxy group with 1 to 8 carbon atoms or at least one alkoxy group with 1 to 8 carbon atoms, in one molecule.

  揭示了一种感光化合物及其制造方法。该感光化合物由至少含有一个萘醌二氮化硫酸酯基团的萘醌二氮化硫酸酯化合物组成，并且在一个分子中具有至少一个含有1至8个碳原子的羧基或至少一个含有1至8个碳原子的烷氧基。
• Optically active compound and photosensitive resin composition
  申请人：——

  公开号：US20030211421A1

  公开（公告）日：2003-11-13

  A photoactive compound is used in combination with a photosensitizer, represented by the following formula (1): A −[( J ) m −( X-Pro )] n (1) wherein A represents a hydrophobic unit comprising at least one kind of hydrophobic groups selected from a hydrocarbon group and a heterocyclic group, J represents a connecting group, X-Pro represents a hydrophilic group protected by a protective group Pro which is removable by light exposure, m represents 0 or 1, and n represents an integer of not less than 1. The protective group Pro may be removable by light exposure in association with the photosensitizer (especially, a photo acid generator), or may be a hydrophobic protective group. The hydrophilic group may be a hydroxyl group or a carboxyl group. The photoactive compound has high sensitivity to a light source of short wavelength beams, for resist application, therefore, the photoactive compound is advantageously used for forming a pattern with high resolution.

  一种光活性化合物与光敏剂结合使用，由以下公式（1）表示： A −[( J ) m −( X-Pro )] n (1) 其中，A代表至少包括一种从烃基和杂环基中选择的疏水基的疏水单元，J代表连接基团，X-Pro代表由光照可去除的保护基团Pro保护的亲水基团，m代表0或1，n代表不少于1的整数。 保护基团Pro可以与光敏剂（特别是光酸发生剂）一起通过光照可去除，也可以是疏水保护基团。亲水基团可以是羟基或羧基。光活性化合物对短波长光源具有很高的敏感性，用于光刻应用，因此，该光活性化合物有利于形成具有高分辨率的图案。
• Resist composition
  申请人：——

  公开号：US20030119957A1

  公开（公告）日：2003-06-26

  A resist composition showing excellent close adherence at the interface of a substrate and a resist, improving problems in wet etching, having excellent sensitivity and resolution, and also showing excellent resist performances, and comprising a compound of the general formula (I): 1 wherein, R 1 and R 2 represent each independently a hydrogen atom or an alkyl group, R 3 represents a hydrogen atom, alkyl group, aryl group, aralkyl group, alkenyl group, alkylcarbonyl group, arylcarbonyl group or aralkylcarbonyl group, n represents an integer of 1 to 40, m represents an integer of 1 to 5, and l represents an integer of 1 to 5, is provided.

  提供了一种抗性组合物，该组合物在基底和抗性之间的界面处表现出优异的紧密粘附性，改善了湿法蚀刻的问题，具有优异的敏感度和分辨率，并且展现出优异的抗性能力，包括一般式（I）的化合物： 其中，R1和R2各自独立地代表氢原子或烷基，R3代表氢原子、烷基、芳基、芳基烷基、烯基、烷基羰基、芳基羰基或芳基烷基羰基，n表示1到40的整数，m表示1到5的整数，l表示1到5的整数。
• Colored photosensitive resin composition, and color filter array and solid-state image pickup device using the same
  申请人：Miya Yoshiko

  公开号：US20080237553A1

  公开（公告）日：2008-10-02

  A colored photosensitive resin composition comprising an alkali-soluble resin, a photosensitive compound, a curing agent, a solvent and a colorant represented by the formula (I): The colored photosensitive resin composition can form a color filter array which shows good spectral characteristics.

  一种有色光敏树脂组合物，包括碱溶性树脂、光敏化合物、固化剂、溶剂和由式(I)表示的着色剂。该有色光敏树脂组合物可以形成一个显示良好光谱特性的彩色滤光片阵列。
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, AND ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM AND PATTERN FORMING METHOD USING THE COMPOSITION
  申请人：INASAKI Takeshi

  公开号：US20130029255A1

  公开（公告）日：2013-01-31

  Provided is an actinic ray-sensitive or radiation-sensitive resin composition containing a compound (A) which contains at least one phenolic hydroxyl group and at least one group where a hydrogen atom in a phenolic hydroxyl group is substituted by a group represented by the following General Formula (1). (in the formula, each of R 11 and R 12 independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, or an aralkyl group; X 11 represents an aryl group; M 11 represents a single bond or a divalent linking group; and Q 11 represents an alkyl group, a cycloalkyl group or an aryl group, wherein the number of carbon atoms which are included in the group represented by -M 11 -Q 11 is 3 or more, and at least two of R 11 , R 12 , Q 11 , and X 11 may form a ring by bonding to each other)

  提供的是一种感光树脂组合物，其中包含至少含有一个酚羟基和至少一个氢原子被以下通式（1）所代表的基替换的基团的化合物（A）。（在通式中，R11和R12分别独立地表示氢原子、烷基、环烷基、芳基或芳基烷基；X11表示芳基；M11表示单键或二价连接基团；Q11表示烷基、环烷基或芳基，其中包含在-M11-Q11所代表的基团中的碳原子数为3或更多，并且R11、R12、Q11和X11中至少有两个可以通过相互键合形成环）