COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING ORIGINAL PLATE FOR LASER ENGRAVING AND PRODUCTION METHOD THEREFOR, PRODUCTION METHOD FOR RELIEF PRINTING PLATE, AND RELIEF PRINTING PLATE
申请人:FUJIFILM Corporation
公开号:EP2738009A1
公开(公告)日:2014-06-04
To provide a composition for laser engraving that can give a relief printing plate having excellent ink laydown and that has excellent rinsing properties after laser engraving.
A composition for laser engraving, the composition that comprises (Component A) an acrylate oligomer; (Component B) a thermopolymerization initiator; and (Component C) at least one of the compounds represented by Formula (1) to Formula (7); the composition not comprising or comprising at more than 0 mass% but less than 2 mass% relative to the total mass of the composition (Component D) a resin having a weight-average molecular weight of at least 10,000, wherein R1 to R18 independently denote a hydrogen atom, an alkyl group, a substituted alkyl group, an aryl group, a substituted aryl group, a heterocyclic group, or a substituted heterocyclic group, L2 denotes a divalent organic group, L3 denotes a trivalent organic group, and L4 denotes a tetravalent organic group.
R1-CO2R2 ( 1 )
R3O2C-L2-CO2R4 ( 2 )
R12-CONHR13 ( 5 )
R14-SO2NHR15 ( 6 )
提供一种用于激光雕刻的组合物,该组合物能使浮雕印版具有优异的油墨铺展性,并且在激光雕刻后具有优异的漂洗性能。
一种用于激光雕刻的组合物,该组合物包含(组分 A)丙烯酸酯低聚物;(组分 B)热聚合引发剂;以及(组分 C)至少一种由式(1)至式(7)表示的化合物;该组合物不包含或包含相对于组合物总质量大于 0 质量%但小于 2 质量%的树脂 (组分 D),其重量-平均分子量至少为 10,000,其中 R1 至 R18 独立地表示氢原子、烷基、取代的烷基、芳基、取代的芳基、杂环基团或取代的杂环基团,L2 表示二价有机基团,L3 表示三价有机基团,L4 表示四价有机基团。
R1-CO2R2 ( 1 )
R3O2C-L2-CO2R4 ( 2 )
R12-conhr13 ( 5 )
R14-SO2NHR15 ( 6 )