The invention provides novel cyclic dipeptide enantiomers comprising (R)-histidine or a derivative thereof as one of the amino acid residues. These compounds are useful a catalysts for production of (S) -α-cyanomethyl alcohols from aldehydes.
Photoresist composition and process for producing photoresist pattern
申请人:SUMITOMO CHEMICAL COMPANY, LIMITED
公开号:US11327399B2
公开(公告)日:2022-05-10
A photoresist composition comprising
a resin which comprises a structural unit represented by the formula (I):
and a salt represented by the formula (B1):