申请人:——
公开号:US20040053158A1
公开(公告)日:2004-03-18
A chemically amplified photoresist composition comprising, (a) a compound which cures upon the action of an acid or a compound whose solubility is increased upon the action of an acid; and (b) as photosensitive acid donor, at least one compound of the formula Ia, Ib, Ic, IIb or IIc wherein R
1
is for example C
1
-Calkyl, C
3
-C
30
cycloalkyl, C
1
-C
5
haloalkyl, C
2
-C
12
alkenyl, C
4
-C
8
cycloalkenyl, C
6
-C
12
bicycloalkenyl, phenyl, naphthyl, anthracyl, phenanthryl, or is a heteroaryl radical; all of which are unsubstituted or substituted; optionally some of the substituents form 5- or 6-membered rings with further substituents on the phenyl, naphthyl, anthracyl, phenanthryl, or heteroaryl ring or with one of the carbon atoms of the phenyl, naphtyl, anthracyl, phenanthryl, or heteroaryl ring; R′
1
is for example C
1
-C
12
alkylene, C
3
-C
30
cycloalkylene, phenylene, naphtylene, diphenylene, or oxydiphenylene, wherein these radicals are unsubstituted or substituted; A and B for example are a direct bond; Ar
1
and Ar
2
independently of each other for example are phenyl, naphtyl, anthracyl, phenanthryl, or heteroaryl, all of which are unsubstituted or are substituted; Ar
3
, Ar
4
and Ar
5
for example have one of the meanings given for Ar
1
and Ar
2
; Y is for example C
3
-C
3
-C
30
cycloalkylene, phenylene, naphthylene, diphenylene, or oxydiphenylene, all of which are unsubstituted or substituted.
一种化学增感光阻剂组合物,包括(a)一种在酸的作用下固化或溶解度在酸的作用下增加的化合物;以及(b)作为光敏酸供体的,至少一种式Ia、Ib、Ic、IIb或IIc的化合物,其中R1例如为C1-C烷基、C3-C30环烷基、C1-C5卤代烷基、C2-C12烯基、C4-C8环烯基、C6-C12双环烯基、苯基、萘基、蒽基、菲基或杂环芳基;所有这些基团都是未取代或取代的;可选地,一些取代基与苯基、萘基、蒽基、菲基或杂环芳基环上的其他取代基或其中一个碳原子形成5-或6-元环;R'1例如为C1-C12烷基、C3-C30环烷基、苯基、萘基、二苯基、或氧二苯基,其中这些基团是未取代或取代的;A和B例如是直接键;Ar1和Ar2独立地例如为苯基、萘基、蒽基、菲基或杂环芳基,所有这些基团都是未取代或取代的;Ar3、Ar4和Ar5例如具有Ar1和Ar2给出的含义之一;Y例如为C3-C30环烷基、苯基、萘基、二苯基或氧二苯基,这些基团都是未取代或取代的。