An adhesive composition for biomaterial use, which comprises as a main component a compound represented by the formula
wherein A is H, F or CH3, B is fluoroalkyl group having 1 to 20 carbon atoms.
There is provided a process for preparing a laminate, comprising the step of adhering a layer of an olefin polymer and a layer of a fluororesin to each other by fusion with the aid of an adhesive polymer, the adhesive polymer being a polymerization product A prepared by copolymerizing a radical-polymerizable olefin polymer B, which is obtained by reacting an olefin polymer (a) having at least one functional group in one molecule thereof with a radical-polymerizable monomer (b) having a functional group which can react with the functional group contained in the olefin polymer (a), with a monomer (c) which comprises as essential components alkyl acrylate, alkyl methacrylate and/or a fluorine-containing unsaturated monomer and is copolymerizable with the radical-polymerizable olefin polymer B, the polymerization product A comprising from 10 to 90 wt.% of the monomer (c).
本发明提供了一种制备层压板的工艺,包括借助粘合剂聚合物将一层烯烃聚合物和一层荧光素熔融粘合在一起的步骤,粘合剂聚合物是通过共聚可自由基聚合的烯烃聚合物 B 而制备的聚合产物 A、烯烃聚合物(a),其一个分子中至少含有一个官能团;可自由基聚合的单体(b),其官能团可与烯烃聚合物(a)中含有的官能团反应;单体(c),其基本成分包括丙烯酸烷基酯、甲基丙烯酸烷基酯和/或含氟不饱和单体,可与可自由基聚合的烯烃聚合物 B 共聚;聚合产物 A 包括 10 至 90 wt.%的单体(c)。
Resin composition for primer use and primer composition employing the same
申请人:MITSUBISHI CHEMICAL CORPORATION
公开号:EP0460393B1
公开(公告)日:1995-11-02
JPS60184513A
申请人:——
公开号:JPS60184513A
公开(公告)日:1985-09-20
BLOCK COPOLYMER AND ASSOCIATED PHOTORESIST COMPOSITION AND METHOD OF FORMING AN ELECTRONIC DEVICE
申请人:The University of Queensland
公开号:US20170037178A1
公开(公告)日:2017-02-09
A block copolymer useful in electron beam and extreme ultraviolet photolithography includes a first block with units derived from a base-solubility-enhancing monomer and an out-of-band absorbing monomer, and a second block having a low surface energy. Repeat units derived from the out-of-ban absorbing monomer allow the copolymer to absorb significantly in the wavelength range 150 to 400 nanometers. When incorporated into a photoresist composition with a photoresist random polymer, the block copolymer self-segregates to form a top layer that effectively screens out-of-band radiation.