An electrodepositing solution for low-potential electrodeposition is disclosed which is used in an electrodeposition method and a photoelectrodeposition method and which can improve the film formability under the application of a low voltage, suppress the elution of metal ions and stably form by deposition an electrodeposition film having a uniform thickness, a uniform color density and a smooth surface. The electrodepositing solution permits an electrodeposition film of an electrodeposition material to be formed by deposition on a conductive material upon application of a voltage between the conductive material and a counter electrode. The electrodeposition material contains an electropositive polymer material which contains, as at least one component thereof, a copolymer consisting of a hydrophobic monomer, a hydrophilic monomer and a plastic monomer.
本发明公开了一种用于低电位电沉积的电沉积溶液,该溶液可用于电沉积方法和光电沉积方法,在施加低电压时可提高成膜性,抑制
金属离子的洗脱,并通过沉积稳定地形成具有均匀厚度、均匀色密度和光滑表面的电沉积膜。电沉积溶液允许在导电材料和反电极之间施加电压时,在导电材料上沉积形成电沉积材料的电沉积膜。电沉积材料包含一种电阳性聚合物材料,作为其中至少一种成分,该材料包含一种由疏
水单体、亲
水单体和塑料单体组成的共聚物。