Polymerizable silicon-containing compounds of formula (1) wherein R
1
is hydrogen, halogen or monovalent organic group are polymerized into polymers. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity and resolution at a wavelength of less than 300 nm, and high resistance to oxygen plasma etching, and thus lends itself to micropatterning for the fabrication of VLSIs.
1
公式(1)中R1为氢、卤素或一价有机基团的可聚合
硅含量化合物可以聚合成聚合物。以该聚合物为基础
树脂的抗蚀剂组合物对高能辐射敏感,在小于300纳米的波长下具有优异的灵敏度和分辨率,同时具有高抗氧等离子体刻蚀性能,因此适用于微图案制造VLSI。