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1,4-Dimethyl-1,6-dihydro-benzoesaeure | 33077-82-6

中文名称
——
中文别名
——
英文名称
1,4-Dimethyl-1,6-dihydro-benzoesaeure
英文别名
1,4-Dimethyl-1,6-dihydro-benzoessaeure;1,4-dimethyl-cyclohexa-2,4-dienecarboxylic acid;1,4-Dimethyl-cyclohexa-2,4-diencarbonsaeure;1,4-Dimethylcyclohexa-2,4-diene-1-carboxylic acid
1,4-Dimethyl-1,6-dihydro-benzoesaeure化学式
CAS
33077-82-6
化学式
C9H12O2
mdl
——
分子量
152.193
InChiKey
SLMUVSVDXGWVBG-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    1.7
  • 重原子数:
    11
  • 可旋转键数:
    1
  • 环数:
    1.0
  • sp3杂化的碳原子比例:
    0.44
  • 拓扑面积:
    37.3
  • 氢给体数:
    1
  • 氢受体数:
    2

反应信息

  • 作为产物:
    描述:
    2-Aethoxy-1.4-dimethyl-cyclohex-3-en-1-carbonsaeure-methylester 在 sodium hydroxide 作用下, 生成 1,4-Dimethyl-1,6-dihydro-benzoesaeure
    参考文献:
    名称:
    Makin,S.M.; Kruptsov,B.K., Journal of general chemistry of the USSR, 1962, vol. 32, p. 2486 - 2491
    摘要:
    DOI:
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文献信息

  • Photosensitive resin composition and photosensitive element using the resin composition
    申请人:Nichigo Morton Co Ltd
    公开号:EP0919870A1
    公开(公告)日:1999-06-02
    A photosensitive resin composition and a photosensitive element using the resin composition with excellent sensitivity and adhesion as well as high resolution and plating resistance. A photosensitive resin composition comprises (A) a polymer carrying carboxyl groups, (B) a compound carrying at least one ethylene-based unsaturated group in the molecule, and (C) a photopolymerization initiator. Component (B) contains at least 60 wt.% of methacrylate (B1), carrying at least one ethylene-based unsaturated group, with respect to the total amount of component (B). The amount of component (C) is in the range of 0.01-20 weight parts per 100 weight parts of components (A) (B), and components (C) contains 2-5 weight parts of lophine dimer (C1) and 0.1-2.0 weight parts of triphenylphosphine (C2) per 100 weight parts of components (A) (B).
    一种光敏树脂组合物和使用该树脂组合物的光敏元件,具有优异的灵敏度和附着力以及高分辨率和耐电镀性。光敏树脂组合物包括:(A) 含有羧基的聚合物;(B) 分子中含有至少一个乙烯基不饱和基团的化合物;(C) 光聚合引发剂。相对于组分(B)的总量,组分(B)含有至少 60 重量百分比的甲基丙烯酸酯(B1),其中至少含有一个乙烯基不饱和基团。组分(C)的用量为每 100 重量份组分(A)(B)0.01-20 重量份,组分(C)含有每 100 重量份组分(A)(B)2-5 重量份的洛芬二聚体(C1)和 0.1-2.0 重量份的三苯基膦(C2)。
  • Homo-Favorskii rearrangement
    作者:Ernest Wenkert、Peter Bakuzis、Ronald J. Baumgarten、Curtis L. Leicht、H. P. Schenk
    DOI:10.1021/ja00742a020
    日期:1971.6
  • OILY MAKEUP COSMETICS
    申请人:Kanebo Cosmetics Inc.
    公开号:EP1614411B1
    公开(公告)日:2011-10-05
  • INK COMPOSITION, INKSET, RECORDING APPARATUS, AND RECORDING METHOD
    申请人:Seiko Epson Corporation
    公开号:US20130201265A1
    公开(公告)日:2013-08-08
    The ink composition of the invention is applied to a region to which a color ink composition has been applied. The ink composition contains a weather resistance enhancer, is substantially free from a colorant, and is applied to a recording medium to form a coating film exhibiting an integrated value of light transmittance of not more than 2000 for each nanometer at wavelengths of 320 nm to 360 nm and an integrated value of light transmittance of not less than 36000 for each nanometer at wavelengths of 380 nm to 780 nm.
  • Green Treatment Process for Cleaning the Exhaust Gas Generated in Air Oxidation of Benzene Homologs
    申请人:Zhang Zhibing
    公开号:US20130205771A1
    公开(公告)日:2013-08-15
    A green treatment process for cleaning exhaust gas generated in the air oxidation of benzene homologs is disclosed. It takes the hot pressurized exhaust gas generated in the benzene homolog air oxidation process as driving power and heating source: firstly, introducing the said exhaust gas into a turbine refrigerator so that it can drive the refrigerator to generate the cooling capacity that will be utilized for condensing the gas phase in the upper part of the flash evaporator and for trapping organics entrained in the exhaust gas; then, leading the exhaust gas with lowered temperature and pressure into corresponding heat exchangers to provide a part of heating source for the flash evaporator and to preheat the reaction raw materials. Furthermore, introducing the condensed exhaust gas into a water absorption scrubber for further removal of trace organics entrained therein.
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