1-[1-hydroxy-2,2,2-trifluoro-1-(trifluoromethyl)ethyl]cyclopentyl acrylate | 945461-56-3

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: 1-[1-hydroxy-2,2,2-trifluoro-1-(trifluoromethyl)ethyl]cyclopentyl acrylate
• 英文别名: [1-(1,1,1,3,3,3-Hexafluoro-2-hydroxypropan-2-yl)cyclopentyl] prop-2-enoate
• CAS: 945461-56-3
• 化学式: C₁₁H₁₂F₆O₃
• 分子量: 306.205
• InChiKey: LTZBSHOWSNKPLW-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.2
• 重原子数：
  20
• 可旋转键数：
  4
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.73
• 拓扑面积：
  46.5
• 氢给体数：
  1
• 氢受体数：
  9

文献信息

• Fluoroalcohol preparation method, fluorinated monomer, polymer, resist composition and patterning process
  申请人：Hasegawa Koji

  公开号：US20070179309A1

  公开（公告）日：2007-08-02

  Fluoroalcohol compounds of formula (4) are prepared by reacting a fluorine compound of formula (1) with reducing agents or organometallic reagents of formulas (2) and (3) wherein R 1 is H or a monovalent C 1 -C 20 hydrocarbon group in which any —CH 2 — moiety may be replaced by —O— or —C(═O)—, R 2 is H or a monovalent C 1 -C 6 hydrocarbon group, R 3 and R 4 are H or a monovalent C 1 -C 8 hydrocarbon group, and M 1 is Li, Na, K, Mg, Zn, Al, B, or Si. From the fluoroalcohol compounds, fluorinated monomers can be produced in a simple and economic way, which are useful in producing polymers for the formulation of radiation-sensitive resist compositions.

  通过将化学式（1）的氟化合物与化学式（2）和（3）的还原剂或有机金属试剂反应制备化学式（4）的氟醇化合物，其中R1是H或一价的碳1-碳20烃基，其中任何一个—CH2—基团可能被—O—或—C(═O)—替代，R2是H或一价的碳1-碳6烃基，R3和R4是H或一价的碳1-碳8烃基，M1是Li、Na、K、Mg、Zn、Al、B或Si。通过这些氟醇化合物，可以简单经济地生产氟化单体，这些单体在制备用于辐射敏感抗蚀剂组合物的聚合物中非常有用。
• FLUOROCARBOXYLIC ACID-CONTAINING MONOMER, FLUOROCARBOXYLIC ACID-CONTAINING POLYMER, RESIST COMPOSITION AND PATTERNING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20210341839A1

  公开（公告）日：2021-11-04

  A fluorocarboxylic acid-containing polymer comprising recurring units having formula (A1), but not acid labile group-containing recurring units is provided. A resist composition comprising the same offers a high sensitivity and is unsusceptible to nano-bridging or pattern collapse independent of whether it is of positive or negative tone.

  提供一种含有氟羧酸的聚合物，其中包含具有式（A1）的重复单元，但不含有酸不稳定的重复单元。包含该聚合物的抗蚀剂组合物具有高灵敏度，并且无论是正向还是负向调色板，都不易出现纳米桥接或图案坍塌。
• Resist polymer, preparing method, resist composition and patterning process
  申请人：Tachibana Seiichiro

  公开号：US20070264592A1

  公开（公告）日：2007-11-15

  A polymer for resist use is prepared by previously charging a reactor with a solution containing a chain transfer agent and holding at a polymerization temperature, and continuously or discontinuously adding dropwise a solution containing monomers and a polymerization initiator to the reactor for radical polymerization. The polymer has a minimized content of a substantially insoluble component. A resist composition using the polymer as a base resin produces a minimized number of defects when processed by photolithography and is useful in forming microscopic patterns.
• RESIST POLYMER, PREPARING METHOD, RESIST COMPOSITION AND PATTERNING PROCESS
  申请人：Tachibana Seiichiro

  公开号：US20110054133A1

  公开（公告）日：2011-03-03

  A polymer for resist use is prepared by previously charging a reactor with a solution containing a chain transfer agent and holding at a polymerization temperature, and continuously or discontinuously adding dropwise a solution containing monomers and a polymerization initiator to the reactor for radical polymerization. The polymer has a minimized content of a substantially insoluble component. A resist composition using the polymer as a base resin produces a minimized number of defects when processed by photolithography and is useful in forming microscopic patterns.
• US7868199B2
  申请人：——

  公开号：US7868199B2

  公开（公告）日：2011-01-11