Sulfonyldiazomethane compounds containing a long-chain alkylcyclohexyl group are novel and useful as photoacid generators. Chemical amplification type resist compositions comprising the same are suited for microfabrication because of many advantages including improved resolution, improved focus latitude, minimized line width variation or shape degradation even on long-term PED, minimized debris left after coating, development and peeling, and improved pattern profile after development.
含有长链烷基环己基基团的磺酰基
重氮甲烷化合物是一种新颖且有用的光酸发生剂。由此组成的
化学增强型抗蚀剂具有许多优点,包括提高分辨率、提高焦距容限、即使在长期PED上也能最小化线宽变化或形状退化、涂层、开发和剥离后最小化残留物以及开发后改善图案轮廓。