Fluorinated monomers of formula (1) are useful in producing polymers for the formulation of radiation-sensitive resist compositions. R
1
is H or monovalent C
1
-C
20
hydrocarbon group, R
2
is H, F, methyl or trifluoromethyl, R
3
and R
4
are H or a monovalent C
1
-C
8
hydrocarbon group, or R
3
and R
4
may form an aliphatic hydrocarbon ring, and A is a divalent C
1
-C
6
hydrocarbon group.
                            式(1)的
氟化单体在制备用于辐射敏感抗蚀组合物的聚合物方面很有用。 R1是H或一价的C1-C20碳氢基团,R2是H,F,甲基或三
氟甲基,R3和R4是H或一价的C1-C8碳氢基团,或R3和R4可以形成脂肪烃环,A是二价的C1-C6碳氢基团。