1,2,2-trimethyl-cyclopropanecarboxylic acid | 102548-13-0

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: 1,2,2-trimethyl-cyclopropanecarboxylic acid
• 英文别名: 1,2,2-Trimethyl-cyclopropancarbonsaeure；Trimethylcyclopropane carboxylic acid；1,2,2-Trimethylcyclopropane-1-carboxylic acid
• CAS: 102548-13-0
• 化学式: C₇H₁₂O₂
• mdl: MFCD19228550
• 分子量: 128.171
• InChiKey: CCIGAUXGHSUZMV-UHFFFAOYSA-N

物化性质

• 沸点：
  70-72 °C(Press: 1 Torr)
• 密度：
  1.047±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  1.4
• 重原子数：
  9
• 可旋转键数：
  1
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.857
• 拓扑面积：
  37.3
• 氢给体数：
  1
• 氢受体数：
  2

反应信息

• 作为产物：
  描述：

  alkaline earth salt of/the/ methylsulfuric acid 生成 1,2,2-trimethyl-cyclopropanecarboxylic acid
  参考文献：
  名称：

  Syntheses and Spectra of 1-Acetyl-, 1-Benzoyl-, 1-Carbethoxy- and 1-Cyano-1 and/or 2-Methylcyclopropanes. Conjugative and Steric Effects¹

  摘要：

  DOI：

  10.1021/ja01516a037

文献信息

• [EN] CYCLOPROPANECARBOXYLATE AND PEST CONTROLLING COMPOSITION CONTAINING THE SAME<br/>[FR] CYCLOPROPANECARBOXYLATE ET INSECTICIDE LE COMPRENANT
  申请人：SUMITOMO CHEMICAL CO

  公开号：WO2009075379A1

  公开（公告）日：2009-06-18

  There is provided a novel cyclopropanecarboxylate compound represented by the formula (1): wherein R1 represents a C2-C4 alkynyl group or a (C1-C4 alkoxy)methyl group, having an excellent pest controlling effect.

  提供一种新型环丙烷羧酸酯化合物，其化学式为（1）：其中R1表示C2-C4炔基或（C1-C4烷氧基）甲基基团，具有优良的杀虫效果。
• Indazole and Pyrazolopyridine Compounds As CCR1 Receptor Antagonists
  申请人：Cook Brian Nicholas

  公开号：US20120270870A1

  公开（公告）日：2012-10-25

  Diclosed are CCR1 receptor antagonists of the formula (I) wherein Ar 1 , Ar 2 , R 1 , X and G are disclosed herein. Also disclosed are compositions, methods of making and using compounds of the formula (I).

  本发明公开了式(I)的CCR1受体拮抗剂，其中Ar1、Ar2、R1、X和G在此公开。还公开了式(I)化合物的组合物、制备方法和使用方法。
• Substituted benzyl esters, intermediates therefor, processes for their preparation and the use of the esters as pesticides
  申请人：NATIONAL RESEARCH DEVELOPMENT CORPORATION

  公开号：EP0103957A2

  公开（公告）日：1984-03-28

  Pesticidal compounds have the formula: wherein D represents hydrogen or a cyano group or an ethynyl group R8 represents alkyl A represents an alkyl group or a halogeno or trifluoromethyl group n is 0 or an integer of 1-4, b is 0 or 1 and RCOO is the residue of an acid RCOOH whose a-cyano-3-phenoxybenzyl ester has pesticidal properties. They are prepared by esterification methods.

  杀虫剂化合物具有以下式子 其中 D 代表氢、氰基或乙炔基 R8 代表烷基 A 代表烷基或卤代或三氟甲基 n 为 0 或 1-4 的整数，b 为 0 或 1，且 RCOO 是酸 RCOOH 的残余物，其 a-氰基-3-苯氧基苄酯具有杀虫特性。它们是通过酯化方法制备的。
• Improvements relating to pesticides
  申请人：BRITISH TECHNOLOGY GROUP LIMITED

  公开号：EP0155819A2

  公开（公告）日：1985-09-25

  A compound of formula I in which formula: Ra represents hydrogen or a C1-C6 alkyl group, and Rc represents a C1-C6 alkyl group; Rb represents a phenyl group, optionally substituted by a C1-C6 alkyl group or halogen, a group of formula -CH=CRdR. in which Rd and R., which may be identical or different represent hydrogen or C1-C6 alkyl groups or a group of formula -CH=NORf in which Rf represents hydrogen or a C1-C6 alkyl group and RCOO represents a residue of an acid RCO2H, which acid, or an ester-forming derivative of which acid, on reaction with a-cyano-3-phenoxybenzyl alcohol or an ester forming derivative thereof, give rise to an a-cyano-3-phenoxybenzyl ester having pesticidal properties.

  一种式 I 的化合物 式中 Ra代表氢或C1-C6烷基，Rc代表C1-C6烷基； Rb代表任选被C1-C6烷基或卤素取代的苯基、式-CH=CRdR.的基团（其中Rd和R.可以相同或不同，代表氢或C1-C6烷基）或式-CH=NORf的基团（其中Rf代表氢或C1-C6烷基），以及 RCOO 代表酸 RCO2H 的残基，该酸或其酯形成衍生物与 a-氰基-3-苯氧基苄醇或其酯形成衍生物反应后，生成具有杀虫特性的 a-氰基-3-苯氧基苄酯。
• THIN FILM FORMATION COMPOSITION FOR LITHOGRAPHY WHICH CONTAINS TITANIUM AND SILICON
  申请人：Nissan Chemical Industries, Ltd.

  公开号：EP2735904A1

  公开（公告）日：2014-05-28

  There is provided a thin film forming composition for forming resist underlayer film and the like which are used in the production of a semiconductor device, and a resist upper layer film which efficiently absorbs undesirable UV light with a thin film existing as an upper layer of the EUV resist before the undesirable UV light reaches the EUV resist layer in EUV lithography, an underlayer film (hardmask) for an EUV resist, a reverse material, and an underlayer film for a resist for solvent development. A thin film forming composition that is used together with a resist in a lithography process, comprising a mixture of a titanium compound (A) selected from a group consisting of a compound of Formula (1):         R0aTi(R1)(4-a)     Formula (1) a titanium chelate compound, and a hydrolyzable titanium dimer, and a silicon compound (B) of Formula (2):         R2a'R3bSi(R4)4-(a'+b)     Formula (2) a hydrolysis product of the mixture, or a hydrolysis-condensation product of the mixture, wherein the number of moles of a Ti atom is 50% to 90% relative to the number of total moles in terms of a Ti atom and a Si atom in the composition.

  本发明提供了一种薄膜形成组合物，用于形成半导体器件生产中使用的抗蚀剂下层膜等，以及一种抗蚀剂上层膜，该抗蚀剂上层膜在极紫外光刻中，在不希望的紫外光到达极紫外光抗蚀剂层之前，作为极紫外光抗蚀剂的上层薄膜存在，可有效吸收不希望的紫外光；一种极紫外光抗蚀剂下层膜（硬掩膜），一种反向材料，以及一种用于溶剂显影的抗蚀剂下层膜。一种在光刻工艺中与抗蚀剂一起使用的薄膜成型组合物，包括选自由式（1）化合物组成的组中的钛化合物（A）的混合物： R0aTi(R1)(4-a) 式(1) 一种钛螯合物和一种可水解的钛二聚物，以及一种式（2）的硅化合物（B）： R2a'R3bSi(R4)4-(a'+b) 式(2) 混合物的水解产物，或混合物的水解缩合产物，其中钛原子的摩尔数相对于组合物中钛原子和硅原子的总摩尔数为 50%至 90%。