2,3,3,3-Tetrafluoro-2-(1,1,2-trifluoroallyloxy)propanoic acid | 174082-80-5

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 脂肪酰基
• 英文名称: 2,3,3,3-Tetrafluoro-2-(1,1,2-trifluoroallyloxy)propanoic acid
• 英文别名: 2,3,3,3-tetrafluoro-2-(1,1,2-trifluoroprop-2-enoxy)propanoic acid
• CAS: 174082-80-5
• 化学式: C₆H₃F₇O₃
• 分子量: 256.07
• InChiKey: TUNCLLDBVPOPFB-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.4
• 重原子数：
  16
• 可旋转键数：
  4
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.5
• 拓扑面积：
  46.5
• 氢给体数：
  1
• 氢受体数：
  10

文献信息

• FLUOROOLEFIN, FLUOROPOLYMER, AND THERMOPLASTIC RESIN COMPOSITION CONTAINING THE POLYMER
  申请人：DAIKIN INDUSTRIES, LIMITED

  公开号：EP0728776A1

  公开（公告）日：1996-08-28

  To provide a fluorine-containing olefin represented, for example, by CH2=CFCF2-Rf6-(CH2)k-X2 [wherein, X2 is -CH2OH, Rf6 is a fluorine-substituted fluorine-containing alkyl group having 1 to 40 carbon atoms or -ORf7- (Rf7 is a fluorine-substituted fluorine-containing alkyl group having 1 to 40 carbon atoms or a fluorine-substituted fluorine-containing ether group having 3 to 50 carbon atoms), k is 0 or an integer of 1 to 6]; a fluorine-containing polymer with functional group which is prepared by polymerizing the above-mentioned olefin, has good affinity with various heat-resisting thermoplastic resins and is capable of forming homogeneous dispersion with the thermoplastic resin; and a thermoplastic resin composition comprising the above-mentioned fluorine-containing polymer with functional group and an aromatic polyester or the like as the heat-resisting thermoplastic resin.

  提供一种含氟烯烃，例如由CH2=CFCF2-Rf6-( )k-X2[其中，X2是- OH、 Rf6 是具有 1 至 40 个碳原子的氟取代的含氟烷基或-ORf7-（Rf7 是具有 1 至 40 个碳原子的氟取代的含氟烷基或具有 3 至 50 个碳原子的氟取代的含氟醚基），k 是 0 或 1 至 6 的整数]；通过聚合上述烯烃制备的含氟官能团聚合物，该聚合物与各种耐热热塑性树脂具有良好的亲和性，并能与热塑性树脂形成均匀的分散体；以及由上述含氟官能团聚合物和作为耐热热塑性树脂的芳香族聚酯或类似物组成的热塑性树脂组合物。
• METHOD FOR FORMING MULTILAYER RESIST
  申请人：DAIKIN INDUSTRIES, LTD.

  公开号：EP1686425A1

  公开（公告）日：2006-08-02

  There is formed a laminated resist which exhibits sufficient reflection reducing effect in a photolithography process using light of vacuum ultraviolet region and also has sufficient developing characteristics in a developing process. The method of forming the laminated photoresist comprises (I) a step for forming the photoresist layer (L1) on a substrate and (II) a step for forming the antireflection layer (L2) on the photoresist layer (L1) by applying the coating composition containing the fluorine-containing polymer (A) having hydrophilic group Y. The fluorine-containing polymer (A) contains a structural unit derived from a fluorine-containing ethylenic monomer having hydrophilic group Y and is characterized in that (i) the hydrophilic group Y contains an acidic OH group having a pKa value of not more than 11, (ii) a fluorine content is not less than 50 % by mass, and (iii) the number of moles of the hydrophilic group Y in 100 g of the fluorine-containing polymer (A) is not less than 0.14.

  形成了一种层状光刻胶，它在使用真空紫外区光的光刻工艺中显示出足够的减反射效果，并且在显影工艺中具有足够的显影特性。形成层状光刻胶的方法包括：(I) 在基底上形成光刻胶层 (L1) 的步骤；(II) 在光刻胶层 (L1) 上形成抗反射层 (L2) 的步骤，该步骤通过涂敷含有亲水基团 Y 的含氟聚合物 (A) 的涂层组合物来实现。含氟聚合物(A)含有由具有亲水基团 Y 的含氟乙烯单体衍生的结构单元，其特征在于：(i) 亲水基团 Y 含有 pKa 值不大于 11 的酸性 OH 基团；(ii) 氟含量不小于 50%（按质量计）；(iii) 100 克含氟聚合物(A)中亲水基团 Y 的摩尔数不小于 0.14。
• Method of forming laminated resist
  申请人：Araki Takayuki

  公开号：US20070196763A1

  公开（公告）日：2007-08-23

  There is formed a laminated resist which exhibits sufficient reflection reducing effect in a photolithography process using light of vacuum ultraviolet region and also has sufficient developing characteristics in a developing process. The method of forming the laminated photoresist comprises (I) a step for forming the photoresist layer (L 1 ) on a substrate and (II) a step for forming the antireflection layer (L 2 ) on the photoresist layer (L 1 ) by applying the coating composition containing the fluorine-containing polymer (A) having hydrophilic group Y. The fluorine-containing polymer (A) contains a structural unit derived from a fluorine-containing ethylenic monomer having hydrophilic group Y and is characterized in that (i) the hydrophilic group Y contains an acidic OH group having a pKa value of not more than 11, (ii) a fluorine content is not less than 50% by mass, and (iii) the number of moles of the hydrophilic group Y in 100 g of the fluorine-containing polymer (A) is not less than 0.14.
• RESIST COMPOSITION, PATTERNING PROCESS AND POLYMER
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20140178820A1

  公开（公告）日：2014-06-26

  An additive polymer comprising recurring styrene units having an ester group bonded to a CF 3 —C(OR 2 )—R 3 group (wherein R 2 is H, acyl or acid labile group, R 3 is H, CH 3 or CF 3 ) such as 1,1,1,3,3,3-hexafluoro-2-propanol is added to a polymer capable of increasing alkali solubility under the action of acid to formulate a resist composition. The resist composition can minimize outgassing from a resist film during the EUV lithography and form a resist film having a hydrophilic surface sufficient to prevent formation of blob defects on the film after development.
• AQUEOUS DISPERSION, COATING FILM, AND COATED ARTICLE
  申请人：DAIKIN INDUSTRIES, LTD.

  公开号：US20180118969A1

  公开（公告）日：2018-05-03

  Provided is an aqueous dispersion capable of providing a coating film excellent in solvent resistance, stain resistance, and adhesion to a base material. The invention relates to an aqueous dispersion including a particulate polymer composite; a polyisocyanate compound; and water. The particulate polymer composite includes a fluoropolymer (A) and an acrylic polymer (B). Either or both of the fluoropolymer (A) and the acrylic polymer (B) contain a hydroxyl group and a hydrolyzable silyl group.