2-{[(Pentyloxy)carbonyl]amino}ethyl 2-methylprop-2-enoate | 89761-49-9

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: 2-{[(Pentyloxy)carbonyl]amino}ethyl 2-methylprop-2-enoate
• 英文别名: 2-(pentoxycarbonylamino)ethyl 2-methylprop-2-enoate
• CAS: 89761-49-9
• 化学式: C₁₂H₂₁NO₄
• 分子量: 243.3
• InChiKey: NCNQNCRGMKRLOK-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.6
• 重原子数：
  17
• 可旋转键数：
  10
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.67
• 拓扑面积：
  64.6
• 氢给体数：
  1
• 氢受体数：
  4

文献信息

• PROTECTIVE FILM-FORMING COMPOSITION HAVING ACETAL STRUCTURE AND AMIDE STRUCTURE
  申请人：NISSAN CHEMICAL CORPORATION

  公开号：US20220026806A1

  公开（公告）日：2022-01-27

  A composition for forming a protective film having excellent resistance to a wet etching solution for semiconductors during a lithographic process in the manufacture of semiconductors; a method of forming a resist pattern using said protective film; and a method for manufacturing a semiconductor device. This composition for forming a protective film against a wet etching solution for semiconductors includes: a compound or polymer which contains at least one among an acetal structure and an amide structure; and a solvent. The polymer is preferably a copolymer of: a compound (a) containing at least one acetal structure in a molecule; and a compound (b) containing at least one amide structure in a molecule.