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dimethoxy-5,7 (acetoxymethyl)-4 coumarine | 111507-73-4

中文名称
——
中文别名
——
英文名称
dimethoxy-5,7 (acetoxymethyl)-4 coumarine
英文别名
(5,7-Dimethoxy-2-oxochromen-4-yl)methyl acetate
dimethoxy-5,7 (acetoxymethyl)-4 coumarine化学式
CAS
111507-73-4
化学式
C14H14O6
mdl
——
分子量
278.262
InChiKey
PLNSRHDWXQEKAH-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    1.1
  • 重原子数:
    20
  • 可旋转键数:
    5
  • 环数:
    2.0
  • sp3杂化的碳原子比例:
    0.29
  • 拓扑面积:
    71.1
  • 氢给体数:
    0
  • 氢受体数:
    6

上下游信息

  • 上游原料
    中文名称 英文名称 CAS号 化学式 分子量

反应信息

  • 作为产物:
    描述:
    乙酸酐dimethoxy-5,7 (hydroxymethyl)-4 coumarine三乙胺 作用下, 反应 2.0h, 以98%的产率得到dimethoxy-5,7 (acetoxymethyl)-4 coumarine
    参考文献:
    名称:
    Ramiandrasoa, F.; Kunesch, N.; Kunesch, G., Bulletin de la Societe Chimique de France, 1987, # 1, p. 177 - 180
    摘要:
    DOI:
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文献信息

  • PHOTOCLEAVABLE PROTECTING GROUPS
    申请人:Barone Anthony D.
    公开号:US20090076295A1
    公开(公告)日:2009-03-19
    Novel compounds are provided, which are useful as linking groups in chemical synthesis, preferably in the solid phase synthesis of oligonucleotides and polypeptides. These compounds are generally photolabile and comprise protecting groups which can be removed by photolysis to unmask a reactive group. The protecting group has the general formula Y, wherein Y is a chemical structure as shown in FIG. 1 . Also provided is a method of forming, from component molecules, a plurality of compounds on a support, each compound occupying a separate predefined region of the support, using the protected compounds described above.
  • Photocleavable Protecting Groups
    申请人:Barone Anthony D.
    公开号:US20100324266A1
    公开(公告)日:2010-12-23
    Novel compounds are provided, which are useful as linking groups in chemical synthesis, preferably in the solid phase synthesis of oligonucleotides and polypeptides. These compounds are generally photolabile and comprise protecting groups which can be removed by photolysis to unmask a reactive group. The protecting group has the general formula Y, wherein Y is a chemical structure as shown in FIG. 1 . Also provided is a method of forming, from component molecules, a plurality of compounds on a support, each compound occupying a separate predefined region of the support, using the protected compounds described above.
  • Ramiandrasoa, F.; Kunesch, N.; Kunesch, G., Bulletin de la Societe Chimique de France, 1987, # 1, p. 177 - 180
    作者:Ramiandrasoa, F.、Kunesch, N.、Kunesch, G.、Poisson, J.
    DOI:——
    日期:——
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