4,4'-(1,4-亚苯基二羰基)二-1,2-苯二羧酸 | 23602-85-9

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 中文名称: 4,4'-(1,4-亚苯基二羰基)二-1,2-苯二羧酸
• 英文名称: 1,4-bis-(3,4-dimethyl carboxybenzoyl)benzene
• 英文别名: 4,4'-(p-Phenylendicarbonyl)-diphthalsaeure；1,4-Bis-(3,4-dicarboxybenzoyl)-benzol；4-[4-(3,4-Dicarboxybenzoyl)benzoyl]phthalic acid
• CAS: 23602-85-9
• 化学式: C₂₄H₁₄O₁₀
• 分子量: 462.369
• InChiKey: FOMRNNDDNMWZFO-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  2.7
• 重原子数：
  34
• 可旋转键数：
  8
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.0
• 拓扑面积：
  183
• 氢给体数：
  4
• 氢受体数：
  10

安全信息

• 海关编码：
  2917399090

反应信息

• 作为反应物：
  描述：

  4,4'-(1,4-亚苯基二羰基)二-1,2-苯二羧酸 在 氯化亚砜 、 zinc(II) chloride 作用下， 以 二氯甲烷 为溶剂， 以93.5%的产率得到4,4'-terephthaloyl-diphthalic anhydride
  参考文献：
  名称：

  一种聚合级4,4’-对苯二甲酰二邻苯二甲酸酐 的制法及其产品和用途

  摘要：

  本发明公开了如下式所示的一种聚合级双酮二酐4,4’-对苯二甲酰二邻苯二甲酸酐（4,4’-terephthaloyl？diphthalic？anhydride,TDPA）及其制备方法。以邻二甲苯和对苯二甲酰氯（TPC）为起始原料，经付-克酰基化反应，氧化，脱水环化三步反应及提纯处理制备聚合级TDPA，总收率84%，可用作高分子量双酮酐型聚酰亚胺的单体。4,4’-对苯二甲酰二邻苯二甲酸酐(TDPA)。

  公开号：

  CN103408521B
• 作为产物：
  描述：

  1,4-对二氯苄 在 硝酸 、 zinc(II) chloride 作用下， 180.0 ℃ 、2.03 MPa 条件下， 生成 4,4'-(1,4-亚苯基二羰基)二-1,2-苯二羧酸
  参考文献：
  名称：

  Mironov,G.S. et al., Journal of Organic Chemistry USSR (English Translation), 1970, vol. 6, p. 1466 - 1468

  摘要：

  DOI：

文献信息

• COMPOSITION CONTAINING VINYL-GROUP-CONTAINING COMPOUND
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20160046552A1

  公开（公告）日：2016-02-18

  A composition containing a novel vinyl-group-containing compound. This composition contains a vinyl-group-containing compound represented by general formula (1). In the formula: W 1 and W 2 represent a group represented by general formula (2) (where a ring (Z) is an aromatic hydrocarbon ring, X is a single bond or —S—, R 1 is a single bond or a C1-4 alkylene group, R 2 is a specific substituent group such as a monovalent hydrocarbon, and m is an integer equal to 0 or higher), a group represented by general formula (4) (where the ring (Z), X, R 1 , R 2 , and m are as previously stated), a hydroxyl group, or a (meth)acryloyloxy group; rings (Y 1 , Y 2 ) are aromatic hydrocarbon rings; R represents a single bond or a specific divalent group; R 3a and R 3b represent a cyano group, a halogen atom, or a monovalent hydrocarbon group; and n1 and n2 are integers of 0-4.

  这个组合物包含一种含有新颖乙烯基团的化合物。该组合物包含一个由通式（1）表示的含有乙烯基团的化合物。在该式中：W1和W2代表由通式（2）表示的一个基团（其中环（Z）是芳香烃环，X是一个单键或—S—，R1是一个单键或C1-4烷基基团，R2是特定的取代基团，如一价碳氢化合物，m是大于或等于0的整数），一个由通式（4）表示的基团（其中环（Z）、X、R1、R2和m如前述），一个羟基，或一个（甲基）丙烯酰氧基团；环（Y1、Y2）是芳香烃环；R代表一个单键或一个特定的二价基团；R3a和R3b代表氰基、卤素原子或一价碳氢基团；n1和n2是0-4的整数。
• [EN] MODULUS MODIFIERS AND FILMS THEREOF<br/>[FR] MODIFICATEURS DE MODULE ET FILMS ASSOCIÉS
  申请人：ZYMERGEN INC

  公开号：WO2022006145A1

  公开（公告）日：2022-01-06

  The present disclosure relates to compositions derived from bioreachable molecules, such as amino acids and/or steroids. In particular, the composition can be a monomer, a polymer, or a copolymer derived from an amino acid dimer. Such compositions can optionally include a functionalized steroid.

  本公开涉及从生物可达分子（如氨基酸和/或类固醇）衍生的组合物。具体来说，该组合物可以是从氨基酸二聚体衍生的单体、聚合物或共聚物。这种组合物可以选择性地包括一个功能化的类固醇。
• BASE GENERATOR, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, AND PATTERN FORMING METHOD AND ARTICLE USING THE PHOTOSENSITIVE RESIN COMPOSITION
  申请人：Katayama Mami

  公开号：US20110086311A1

  公开（公告）日：2011-04-14

  A photosensitive resin composition which is excellent in resolution, low in cost, and usable in a wide range of structures of polymer precursors each of which is reacted into a final product by a basic substance or by heating in the presence of a basic substance. The photosensitive resin composition includes a base generator which has a specific structure and generates a base by exposure to electromagnetic radiation and heating, and a polymer precursor which is reacted into a final product by the base generator and by a basic substance or by heating in the presence of a basic substance.

  一种光敏树脂组合物，具有分辨率优良、成本低廉和可用于一系列聚合物前体结构的特点，其中每种聚合物前体都可以通过碱性物质或在碱性物质的存在下加热反应成为最终产物。该光敏树脂组合物包括一种具有特定结构并通过电磁辐射和加热产生碱性物质的基发生剂，以及一种聚合物前体，该聚合物前体通过基发生剂和碱性物质或在碱性物质的存在下加热反应成为最终产物。
• Polyimides and polyamic acids
  申请人：——

  公开号：US20020182536A1

  公开（公告）日：2002-12-05

  A polyimide having a repeating unit of the general formula (I) and a polyamic acid having a repeating unit of the formula (IV): 1 (wherein, R 1 and R 2 represent H or a C1 to C20 alkyl group, and Z represents a condensed polycyclic aromatic group or an group of the following formulae: 2 Herein, X represents —CO— or —C(═N 2 )—, Y represents a direct bond, —CH 2 —, —O—, —SO 2 —, —S—, —CO— or —C(═N 2 )—, and W represents a direct bond, —CH 2 —, —C(CH 3 ) 2 —, —C(CF 3 ) 2 —, —S—, —SO—, —SO 2 — or —O—. b, m and n are 0 or 1; r is a C1 to 4 alkyl group, halogen group or phenyl group; a is 0 or 1 to 3.).

  具有通式(I)重复单元的聚酰亚胺和具有通式(IV)重复单元的聚酰胺酸：1（其中，R1和R2代表H或C1至C20烷基，Z代表缩聚的多环芳族基或以下式的基团：2，其中，X代表—CO—或—C(═N2)—，Y代表直接键，—CH2—，—O—，—SO2—，—S—，—CO—或—C(═N2)—，W代表直接键，—CH2—，—C(CH3)2—，—C(CF3)2—，—S—，—SO—，—SO2或—O—。b，m和n为0或1；r为C1至4烷基，卤素基或苯基；a为0或1至3。）
• BASE GENERATOR, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD USING THE PHOTOSENSITIVE RESIN COMPOSITION AND PRODUCTS COMPRISING THE SAME
  申请人：Katayama Mami

  公开号：US20120070781A1

  公开（公告）日：2012-03-22

  An object of the present invention is to provide a base generator which has sensitivity and is applicable to a wide range of applications, and a photosensitive resin composition which is applicable to a wide range of applications due to the structure of a polymer precursor in which reaction into a final product is promoted by a basic substance or by heating in the presence of a basic substance. The base generator generates a base by exposure to electromagnetic radiation and heating. The photosensitive resin composition comprises a polymer precursor in which reaction into a final product is promoted by the base generator and a basic substance or by heating in the presence of a basic substance.

  本发明的目的是提供一种具有灵敏度并适用于广泛应用的基础发生器，以及一种光敏树脂组合物，由于聚合物前体的结构在碱性物质的促进下或在碱性物质存在下加热反应成最终产物，因此适用于广泛的应用范围。基础发生器通过电磁辐射和加热生成碱性物质。光敏树脂组合物包括聚合物前体，其在基础发生器和碱性物质的促进下或在碱性物质存在下加热反应成最终产物。