6-Methoxy-6-methylheptanoic acid | 428871-94-7

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 脂肪酰基
• 英文名称: 6-Methoxy-6-methylheptanoic acid
• CAS: 428871-94-7
• 化学式: C₉H₁₈O₃
• 分子量: 174.24
• InChiKey: KVVRUZZVKYLVLT-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.3
• 重原子数：
  12
• 可旋转键数：
  6
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.89
• 拓扑面积：
  46.5
• 氢给体数：
  1
• 氢受体数：
  3

文献信息

• COMPOSITION CONTAINING VINYL-GROUP-CONTAINING COMPOUND
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20160046552A1

  公开（公告）日：2016-02-18

  A composition containing a novel vinyl-group-containing compound. This composition contains a vinyl-group-containing compound represented by general formula (1). In the formula: W 1 and W 2 represent a group represented by general formula (2) (where a ring (Z) is an aromatic hydrocarbon ring, X is a single bond or —S—, R 1 is a single bond or a C1-4 alkylene group, R 2 is a specific substituent group such as a monovalent hydrocarbon, and m is an integer equal to 0 or higher), a group represented by general formula (4) (where the ring (Z), X, R 1 , R 2 , and m are as previously stated), a hydroxyl group, or a (meth)acryloyloxy group; rings (Y 1 , Y 2 ) are aromatic hydrocarbon rings; R represents a single bond or a specific divalent group; R 3a and R 3b represent a cyano group, a halogen atom, or a monovalent hydrocarbon group; and n1 and n2 are integers of 0-4.

  这个组合物包含一种含有新颖乙烯基团的化合物。该组合物包含一个由通式（1）表示的含有乙烯基团的化合物。在该式中：W1和W2代表由通式（2）表示的一个基团（其中环（Z）是芳香烃环，X是一个单键或—S—，R1是一个单键或C1-4烷基基团，R2是特定的取代基团，如一价碳氢化合物，m是大于或等于0的整数），一个由通式（4）表示的基团（其中环（Z）、X、R1、R2和m如前述），一个羟基，或一个（甲基）丙烯酰氧基团；环（Y1、Y2）是芳香烃环；R代表一个单键或一个特定的二价基团；R3a和R3b代表氰基、卤素原子或一价碳氢基团；n1和n2是0-4的整数。
• VINYL-GROUP-CONTAINING FLUORENE COMPOUND
  申请人：DAICEL CORPORATION

  公开号：US20160046551A1

  公开（公告）日：2016-02-18

  A novel vinyl-group-containing fluorene compound and a method for producing the same, a polymerizable monomer and cross-linking agent including this compound, a leaving-group-containing fluorene compound, a monovinyl-group-containing fluorene compound, and methods for producing the same. This vinyl-group-containing fluorene compound is represented by formula (1). In the formula, W 1 and W 2 represent a group represented by formula (2), a group represented by formula (4), a hydroxyl group, or a (meth)acryloyloxy group, R 3a and R 3b represent a cyano group, a halogen atom, or a monovalent hydrocarbon, and n1 and n2 are integers of 0-4. In formulas (2) and (4), a ring (Z) is an aromatic hydrocarbon ring, X is a single bond or a group represented by —S—, R 1 is a single bond or a C1-4 alkylene group, R 2 is a specific substituent group such as a monovalent hydrocarbon, and m is an integer of 0 or greater.

  一种含有乙烯基的萘化合物及其制备方法，包括该化合物的可聚合单体和交联剂，含有离去基的萘化合物，含有单乙烯基的萘化合物，以及其制备方法。该含有乙烯基的萘化合物由式（1）表示。在该式中，W1和W2代表由式（2）表示的基团，由式（4）表示的基团，羟基，或（甲基）丙烯氧基，R3a和R3b代表氰基，卤素原子，或一价碳氢化合物，n1和n2为0-4的整数。在式（2）和（4）中，环（Z）是芳香烃环，X是单键或由—S—表示的基团，R1是单键或C1-4烷基基团，R2是特定取代基团，如一价碳氢化合物，m为0或更大的整数。
• RESIN COMPOSITION
  申请人：TORAY INDUSTRIES, INC.

  公开号：US20190241716A1

  公开（公告）日：2019-08-08

  The present invention provides a resin composition having a high sensitivity and serving to produce a cured film with a low water absorption rate. The resin composition includes: (a) an alkali-soluble resin and (b1) an amido-phenol compound containing a phenolic hydroxyl group in which a monovalent group as represented by the undermentioned general formula (1) is located at the ortho position and/or (b2) an aromatic amido acid compound containing a carboxy group in which a monovalent group as represented by the undermentioned general formula (2) is located at the ortho position: wherein in general formula (1), X is a monovalent organic group having an alkyl group that contains 2 to 20 carbon atoms and bonds directly to the carbonyl carbon in general formula (1) or a monovalent organic group that has —(YO) n —; and in general formula (2), U is a monovalent organic group that has an alkyl group containing 2 to 20 carbon atoms and bonding directly to the amide nitrogen in general formula (2) or a monovalent organic group that has —(YO) n —; wherein Y is an alkylene group containing 1 to 10 carbon atoms and n is an integer of 1 to 20.

  本发明提供了一种树脂组合物，具有高灵敏度，并用于生产具有低吸水率的固化膜。该树脂组合物包括：(a)可溶于碱的树脂和(b1)含有酚羟基的酰胺酚化合物，其中酚羟基化合物中的单价基在邻位上，和/或(b2)含有羧基的芳香酰胺酸化合物，其中羧基化合物中的单价基在邻位上，其通式如下所示：在通式(1)中，X是一个单价有机基，具有含有2到20个碳原子的烷基，并直接连接到通式(1)中的羰基碳，或具有—(YO)n—的单价有机基；在通式(2)中，U是一个单价有机基，具有含有2到20个碳原子的烷基，并直接连接到通式(2)中的酰胺氮，或具有—(YO)n—的单价有机基；其中Y是含有1到10个碳原子的烷基，n是1到20的整数。
• Radiation-sensitive resin composition
  申请人：——

  公开号：US20030170561A1

  公开（公告）日：2003-09-11

  A radiation-sensitive resin composition comprising (A) an acid-dissociable group-containing polysiloxane and (B) a photoacid generator containing trifluoromethane sulfonic acid or a compound which generates an acid of the following formula (I), 1 wherein Rf individually represents a fluorine atom or a trifluoromethyl group, and Ra represents a hydrogen atom, a fluorine atom, a linear or branched alkyl group having 1-20 carbon atoms, or a linear or branched fluoroalkyl group having 1-20 carbon atoms, a substituted or unsubstituted monovalent cyclic hydrocarbon group having 3-20 carbon atoms, or a substituted or unsubstituted monovalent cyclic fluoro-hydrocarbon group having 3-20 carbon atoms. The radiation-sensitive resin composition of the present invention exhibits superior resolution, while maintaining high transparency to radiations and high dry etching resistance. The resin composition thus can greatly contribute to the lithography process that will become more and more minute in the future.

  一种辐射敏感的树脂组合物，包括（A）含有酸可解离基团的聚硅氧烷和（B）含有三氟甲烷磺酸或生成以下式（I）酸的化合物的光酸发生剂，其中Rf分别表示氟原子或三氟甲基基团，Ra表示氢原子，氟原子，具有1-20个碳原子的线性或支链烷基，或具有1-20个碳原子的线性或支链氟烷基，具有3-20个碳原子的取代或未取代的单价环烃基或具有3-20个碳原子的取代或未取代的单价环氟烃基。本发明的辐射敏感树脂组合物表现出优异的分辨率，同时保持对辐射的高透明度和高干法刻蚀抵抗力。因此，该树脂组合物可以为未来变得越来越微小的光刻工艺做出巨大贡献。
• Benzimidazole derivatives
  申请人：——

  公开号：US20040044056A1

  公开（公告）日：2004-03-04

  This invention relates to the compounds represented by a general formula [I]: 1 [in which A 1 and A 2 represent optionally fluorine-substituted methine or the like; B represents halogen, cyano, lower alkyl or the like; D represents optionally substituted heterocyclic group or the like; and G represents C 3 -C 20 aliphatic group such as alicyclic group]. These compounds inhibit nociceptin activities due to their high affinity to nociceptin receptor, and are useful as analgesic, antiobestic, corebral function improver, drugs for treatment of alzheimer's disease and dementia, remedies for schizophrenia and neurodegenerative diseases, antidepressant, remedies for diabetes insipidus, polyuria, hypotension and so on.

  本发明涉及由一般式[I]表示的化合物：1[其中，A1和A2表示选择性氟代甲基或类似物；B表示卤素，氰基，低碳烷基或类似物；D表示选择性取代的杂环基团或类似物；G表示C3-C20脂肪族基团，例如脂环族基团]。这些化合物由于对痛觉受体具有高亲和力而抑制了痛觉肽活性，并且可用作镇痛剂，抗肥胖剂，脑功能改善剂，治疗阿尔茨海默病和痴呆症的药物，治疗精神分裂症和神经退行性疾病的药物，抗抑郁剂，治疗尿崩症，多尿症，低血压等的药物。