7-methoxycarbonyl-2-oxo-4-oxahexahydro-3,5-methano-2H-cyclopenta[b]furan-6-yl 4-(methacryloyloxy)butyrate | 1187393-06-1

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: 7-methoxycarbonyl-2-oxo-4-oxahexahydro-3,5-methano-2H-cyclopenta[b]furan-6-yl 4-(methacryloyloxy)butyrate
• 英文别名: Methyl 2-[4-(2-methylprop-2-enoyloxy)butanoyloxy]-5-oxo-4,8-dioxatricyclo[4.2.1.03,7]nonane-9-carboxylate
• CAS: 1187393-06-1
• 化学式: C₁₇H₂₀O₉
• 分子量: 368.34
• InChiKey: WXWIMGVPPDHNRB-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.4
• 重原子数：
  26
• 可旋转键数：
  10
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.65
• 拓扑面积：
  114
• 氢给体数：
  0
• 氢受体数：
  9

文献信息

• LACTONE-CONTAINING COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
  申请人：HASEGAWA Koji

  公开号：US20090233242A1

  公开（公告）日：2009-09-17

  Lactone-containing compounds having formula (1) are novel wherein R 1 is H, F, methyl or trifluoromethyl, R 2 and R 3 are H or monovalent hydrocarbon groups, or R 2 and R 3 may together form an aliphatic hydrocarbon ring, R 4 is H or CO 2 R 5 , R 5 is a monovalent hydrocarbon group, W is CH 2 , O or S, and k 1 is 3, 4 or 5. They are useful as monomers to produce polymers which are transparent to radiation ≦500 nm. Radiation-sensitive resist compositions comprising the polymers as base resin exhibit excellent properties including resolution, LER, pattern density dependency and exposure margin.

  含有式（1）的内酯化合物是新颖的，其中R1为H、F、甲基或三氟甲基，R2和R3为H或一价碳氢基团，或R2和R3可以共同形成脂肪烃环，R4为H或CO2R5，R5为一价碳氢基团，W为CH2、O或S，k1为3、4或5。它们可用作单体以生产对辐射≦500纳米透明的聚合物。包含这些聚合物作为基础树脂的辐射敏感抗蚀组合物表现出优异的性能，包括分辨率、LER、图案密度依赖性和曝光余量。
• ACRYLIC ESTER DERIVATIVE, HIGH-MOLECULAR COMPOUND AND PHOTORESIST COMPOSITION
  申请人：Nakayama Osamu

  公开号：US20130164675A1

  公开（公告）日：2013-06-27

  The invention provides a novel acrylic ester derivative which can form a structural unit of a polymer to be incorporated into a photoresist composition; a polymer produced through polymerization of a raw material containing the acrylic ester derivative; and a photoresist composition which contains the polymer and which, as compared with the case of conventional ones, realizes formation of a high-resolution resist pattern having improved LWR. Specifically, the present invention provides, for example, an acrylic ester derivative represented by the following formula (1): wherein R 1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group; each of R 2 , R 3 , R 5 , R 7 , R 8 , and R 10 represents a hydrogen atom, an alkyl group, a cycloalkyl group, or an alkoxy group; each of R 4 and R 6 represents a hydrogen atom, an alkyl group, a cycloalkyl group, or an alkoxy group, or R 4 and R 6 are linked together to form an alkylene group, —O—, or —S—; R 9 represents a hydrogen atom, an alkyl group, a cycloalkyl group, an alkoxy group, or —COOR 11 ; R 11 represents an alkyl group; X represents —O— or >N—R 12 ; R 12 represents a hydrogen atom or an alkyl group; Y represents >C═O or >S(═O) n ; n is an integer of 0 to 2; and the wavy lines represent that either R 8 or R 9 may be in an endo or exo position.

  本发明提供了一种新型的丙烯酸酯衍生物，可形成聚合物的结构单元，用于纳入到光刻胶组合物中；一种通过含有丙烯酸酯衍生物的原料聚合而成的聚合物；以及一种包含该聚合物的光刻胶组合物，与传统光刻胶相比，实现了形成具有改善LWR的高分辨率抗蚀图案。具体而言，本发明提供了例如下式（1）所表示的丙烯酸酯衍生物：其中，R1表示氢原子，甲基或三氟甲基；R2、R3、R5、R7、R8和R10中的每一个表示氢原子，烷基，环烷基或烷氧基；R4和R6中的每一个表示氢原子，烷基，环烷基或烷氧基，或者R4和R6连接在一起形成烷基，-O-或-S-；R9表示氢原子，烷基，环烷基，烷氧基或-COOR11；R11表示烷基；X表示-O-或>N-R12；R12表示氢原子或烷基；Y表示>C═O或>S(═O)n；n为0到2的整数；波浪线表示R8或R9中的任意一个可以处于内部或外部位置。
• Lactone-containing compound, polymer, resist composition, and patterning process
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：EP2100887B1

  公开（公告）日：2013-07-03
• US7833694B2
  申请人：——

  公开号：US7833694B2

  公开（公告）日：2010-11-16
• US9152042B2
  申请人：——

  公开号：US9152042B2

  公开（公告）日：2015-10-06