3-C-Carboxy-2,4-dideoxy-2-undecylpentaric acid | 66157-40-2

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: 3-C-Carboxy-2,4-dideoxy-2-undecylpentaric acid
• 英文别名: 2-hydroxytetradecane-1,2,3-tricarboxylic acid
• CAS: 66157-40-2
• 化学式: C₁₇H₃₀O₇
• 分子量: 346.4
• InChiKey: UVAOEHSAFKLYID-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.8
• 重原子数：
  24
• 可旋转键数：
  15
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.82
• 拓扑面积：
  132
• 氢给体数：
  4
• 氢受体数：
  7

文献信息

• Polishing composition and polishing system
  申请人：FUJIMI INCORPORATED

  公开号：US10988637B2

  公开（公告）日：2021-04-27

  A polishing composition according to the present invention is used to polish an object to be polished including a high dielectric constant layer, in which the polishing composition contains an abrasive grain, water, and organic acid, when a zeta potential of the abrasive grain in the polishing composition is set as X [mV], and a zeta potential of the high dielectric constant layer during polishing using the polishing composition is set as Y [mV], X is positive, and Y−X≤−5 is established.

  根据本发明的一种抛光组合物用于抛光包括高介电常数层的待抛光物体，其中抛光组合物包含磨粒、水和有机酸，当抛光组合物中磨粒的 zeta 电位设为 X [mV]，使用抛光组合物抛光时高介电常数层的 zeta 电位设为 Y [mV]，X 为正，Y-X≤-5 成立。
• Mittel zum Waschen oder Spülen der Haare
  申请人：Henkel Kommanditgesellschaft auf Aktien

  公开号：EP0195895B1

  公开（公告）日：1992-08-19
• POLISHING COMPOSITION AND POLISHING SYSTEM
  申请人：FUJIMI INCORPORATED

  公开号：US20200071568A1

  公开（公告）日：2020-03-05

  A polishing composition according to the present invention is used to polish an object to be polished including a high dielectric constant layer, in which the polishing composition contains an abrasive grain, water, and organic acid, when a zeta potential of the abrasive grain in the polishing composition is set as X [mV], and a zeta potential of the high dielectric constant layer during polishing using the polishing composition is set as Y [mV], X is positive, and Y−X≤−5 is established.