申请人:Hoffmann-La Roche Inc.
公开号:US04436662A1
公开(公告)日:1984-03-13
The present invention relates to compounds of the formula ##STR1## wherein R.sub.1 and R.sub.3 are selected from the group consisting of hydrogen, lower alkyl, hydroxy, lower alkoxy or acyloxy and R.sub.2 and R.sub.4 are hydrogen or R.sub.1 and R.sub.2 and/or R.sub.3 and R.sub.4 taken together are oxo groups with the proviso that at least one oxo group is present; R is selected from the group consisting of hydrogen, lower alkyl, C.sub.2 to C.sub.7 carboxylic acids and the esters and amides thereof, hydroxy C.sub.2 to C.sub.7 alkyl and amino C.sub.2 to C.sub.7 alkyl or mono- or di-lower alkyl amino C.sub.2 to C.sub.7 alkyl; R.sub.5 is halogen or hydrogen; and R.sub.6 is halogen with the proviso that when R.sub.1 or R.sub.3 is hydroxy, lower alkoxy or acyloxy, then R is lower alkyl or hydrogen and the N-oxides and the pharmaceutically acceptable salts thereof.
本发明涉及以下式的化合物:##STR1##其中R.sub.1和R.sub.3选自氢、低烷基、羟基、低烷氧基或酰氧基的群组,R.sub.2和R.sub.4为氢或R.sub.1和R.sub.2和/或R.sub.3和R.sub.4一起取氧代基,但至少存在一个氧代基;R选自氢、低烷基、C.sub.2到C.sub.7羧酸及其酯和酰胺、羟基C.sub.2到C.sub.7烷基和氨基C.sub.2到C.sub.7烷基或单或双低烷基氨基C.sub.2到C.sub.7烷基;R.sub.5为卤素或氢;R.sub.6为卤素,但当R.sub.1或R.sub.3为羟基、低烷氧基或酰氧基时,R为低烷基或氢,以及其N-氧化物和药学上可接受的盐。