4,4,4-Trifluorobutyl 2-methyl-2-propenoate | 100894-77-7

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: 4,4,4-Trifluorobutyl 2-methyl-2-propenoate
• 英文别名: 4,4,4-trifluorobutyl 2-methylprop-2-enoate
• CAS: 100894-77-7
• 化学式: C₈H₁₁F₃O₂
• 分子量: 196.17
• InChiKey: AYLIBFFGMZIILD-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.5
• 重原子数：
  13
• 可旋转键数：
  5
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.62
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  5

文献信息

• Film obtained by laminating coating layer made of fluorine-containing acrylic resin on base film
  申请人：Kaneka Corporation

  公开号：US10294342B2

  公开（公告）日：2019-05-21

  A film includes: a coating layer made of a fluorine-containing acrylic resin; and a base film, on which the coating layer is laminated. The fluorine-containing acrylic resin is obtained by copolymerizing 50 to 99 parts by weight of a monomer represented by a general formula (1) with 50 to 1 parts by weight of a methacrylate-based monomer, and a melt viscosity of the fluorine-containing acrylic resin is less than 300 Pa·s under conditions of a die temperature of 220° C., a shear rate of 122 sec−1, and a capillary die diameter of 1 mm based on JIS K7199. In the general formula (1), R1 is a direct bond or a straight-chain or branched-chain alkylene group containing 1 to 4 carbon atoms, and R2 is methyl.

  一种薄膜包括：由含氟丙烯酸树脂制成的涂层；以及将涂层层压在其上的基膜。含氟丙烯酸树脂是由 50 至 99 份（按重量计）通式（1）代表的单体与 50 至 1 份（按重量计）甲基丙烯酸酯基单体共聚而得，根据 JIS K7199 标准，在模具温度为 220°C、剪切速率为 122 秒-1、毛细管模具直径为 1 毫米的条件下，含氟丙烯酸树脂的熔体粘度小于 300 Pa-s。 在通式（1）中，R1 是直接键或含有 1 至 4 个碳原子的直链或支链亚烷基，R2 是甲基。
• FILM OBTAINED BY LAMINATING COATING LAYER MADE OF FLUORINE-CONTAINING ACRYLIC RESIN ON BASE FILM
  申请人：Kaneka Corporation

  公开号：US20170058088A1

  公开（公告）日：2017-03-02

  A film includes: a coating layer made of a fluorine-containing acrylic resin; and a base film, on which the coating layer is laminated. The fluorine-containing acrylic resin is obtained by copolymerizing 50 to 99 parts by weight of a monomer represented by a general formula (1) with 50 to 1 parts by weight of a methacrylate-based monomer, and a melt viscosity of the fluorine-containing acrylic resin is less than 300 Pa·s under conditions of a die temperature of 220° C., a shear rate of 122 sec −1 , and a capillary die diameter of 1 mm based on JIS K7199. In the general formula (1), R 1 is a direct bond or a straight-chain or branched-chain alkylene group containing 1 to 4 carbon atoms, and R 2 is methyl.
• PHOTORESIST TOPCOAT COMPOSITIONS AND METHODS OF PROCESSING PHOTORESIST COMPOSITIONS
  申请人：Rohm and Haas Electronic Materials LLC

  公开号：US20190203065A1

  公开（公告）日：2019-07-04

  Photoresist topcoat compositions, comprising: a first polymer that is aqueous base soluble and is present in an amount of from 70 to 99 wt % based on total solids of the composition; a second polymer comprising a repeat unit of general formula (IV) and a repeat unit of general formula (V): wherein: R 5 independently represents H, halogen atom, C1-C3 alkyl, or C1-C3 haloalkyl; R 6 represents linear, branched or cyclic C1 to C20 fluoroalkyl; R 7 represents linear, branched or cyclic C1 to C20 fluoroalkyl; L 3 represents a multivalent linking group; and m is an integer of from 1 to 5; wherein the second polymer is free of non-fluorinated side chains; and wherein the second polymer is present in an amount of from 1 to 30 wt % based on total solids of the composition and a solvent. The invention finds particular applicability in the manufacture of semiconductor devices.
• US4547543A
  申请人：——

  公开号：US4547543A

  公开（公告）日：1985-10-15
• US5856379A
  申请人：——

  公开号：US5856379A

  公开（公告）日：1999-01-05