2-Ethyl-4,4,4-trifluoro-3-hydroxybutanoic acid | 1260903-04-5

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 脂肪酰基
• 英文名称: 2-Ethyl-4,4,4-trifluoro-3-hydroxybutanoic acid
• CAS: 1260903-04-5
• 化学式: C₆H₉F₃O₃
• 分子量: 186.13
• InChiKey: DXEGAQLAECWJMO-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.1
• 重原子数：
  12
• 可旋转键数：
  3
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.83
• 拓扑面积：
  57.5
• 氢给体数：
  2
• 氢受体数：
  6

文献信息

• JPH0240343A
  申请人：——

  公开号：JPH0240343A

  公开（公告）日：1990-02-09
• Double metal cyanide catalysts for the preparation of polyether polyols
  申请人：——

  公开号：US20040092389A1

  公开（公告）日：2004-05-13

  The present invention relates to novel double metal cyanide (DMC) catalysts for the preparation of polyether polyols by a polyaddition reaction between alkylene oxides and starter compounds having active hydrogen atoms, wherein the catalyst contains a) at least one double metal cyanide compound, b) at least one organic complexing ligand and c) at least one fluorine-containing complexing ligand.
• Radiation sensitive resin composition
  申请人：Nishimura Isao

  公开号：US20050171226A1

  公开（公告）日：2005-08-04

  A radiation-sensitive resin composition comprising (A) a resin containing a structural unit of the following formula (I), (B) a resin containing a recurring unit of the following formula (II), and (C) a photoacid generator, wherein R 1 represents a substituted or unsubstituted divalent (alicyclic) hydrocarbon, R 2 represents a lower alkyl group or a monovalent (substituted) alicyclic hydrocarbon group, or any two R 2 s form in combination a divalent (substituted) alicyclic hydrocarbon group, with the remaining R 2 being a lower alkyl group or a monovalent (substituted) alicyclic hydrocarbon group, wherein R 3 represents a hydrogen atom, fluorine atom, or trifluoromethyl group, R 4 represents a (substituted) hydrocarbon group with a valence of (c+1), (substituted) alicyclic hydrocarbon with a valence of (c+1), or (substituted) aromatic group with a valence of (c+1), R 5 represents a hydrogen atom or a monovalent acid-dissociable group, a and b individually represent an integer of 0-3, provided that (a+b)≧1 is satisfied, and c is an integer of 1-3. The radiation-sensitive resin composition has a high transparency at a wavelength of 193 nm or less and is particularly excellent in LER.
• PATTERNING PROCESS AND PATTERN SURFACE COATING COMPOSITION
  申请人：HATAKEYAMA Jun

  公开号：US20090053657A1

  公开（公告）日：2009-02-26

  A pattern is formed by applying a first positive resist composition comprising a polymer comprising recurring units which become alkali soluble under the action of acid onto a substrate to form a first resist coating, heat treating, exposing, heat treating, developing to form a first resist pattern, applying a pattern surface coating composition comprising a hydroxyl-containing crosslinkable polymer onto the first resist pattern and crosslinking, thereby covering the first resist pattern with a crosslinked polymer film, applying a second positive resist composition thereon, heat treating, exposing, heat treating, and developing to form a second resist pattern.
• POLYMER FOR PROTECTIVE LAYER OF RESIST, AND POLYMER COMPOSITION INCLUDING THE SAME
  申请人：YUN Sang-Geun

  公开号：US20110123925A1

  公开（公告）日：2011-05-26

  A polymer includes a first repeating unit represented by the following Chemical Formula 1, and a second repeating unit including at least one repeating unit represented by the following Chemical Formulae 2 to 6.