申请人:Chiba Takashi
公开号:US20090221777A1
公开(公告)日:2009-09-03
Disclosed is a photosensitive resin composition comprising (A) a polyimide resin, (B) a photo-acid generator, and (C) a crosslinking agent having an alkoxyalkylated amino group.
公开了一种光敏树脂组合物,包括(A)聚酰亚胺树脂,(B)光酸发生剂,以及(C)具有烷氧基烷基化氨基基团的交联剂。