3-mercapto-2-(1-mercaptoethyl)-butanoic acid | 921-24-4

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 脂肪酰基
• 英文名称: 3-mercapto-2-(1-mercaptoethyl)-butanoic acid
• 英文别名: 3-Sulfanyl-2-(1-sulfanylethyl)butanoic acid
• CAS: 921-24-4
• 化学式: C₆H₁₂O₂S₂
• 分子量: 180.292
• InChiKey: OUFUIGNGYJXVKA-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.2
• 重原子数：
  10
• 可旋转键数：
  3
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.83
• 拓扑面积：
  39.3
• 氢给体数：
  3
• 氢受体数：
  4

文献信息

• Composition to permanently reshape the hair containing at least one carboxydithiol
  申请人：Blaise Christian

  公开号：US20050208007A1

  公开（公告）日：2005-09-22

  The present invention relates to an aqueous reducing composition, for the first step of a process to permanently reshape the hair, comprising, in a cosmetically acceptable medium, one or more carboxydithiols as reducing agents.

  本发明涉及一种水性还原组合物，用于永久改变头发形状的第一步骤，包括在化妆品可接受的介质中，一个或多个羧基二硫醇作为还原剂。
• Composition de deformation permanente des cheveux contenant au moins un carboxydithiol
  申请人：L'OREAL

  公开号：EP1570835A1

  公开（公告）日：2005-09-07

  L'invention concerne une composition aqueuse réductrice, pour le premier temps d'une opération de déformation permanente des cheveux, contenant, dans un milieu cosmétiquement acceptable, en tant qu'agent réducteur, un ou plusieurs carboxydithiols.

  本发明涉及一种水性还原组合物，用于头发永久定型操作的第一阶段，在化妆品可接受的介质中，作为还原剂，含有一种或多种羧基二硫醇。
• SOLUTION AND METHOD FOR REMOVAL OF GROUP III-V ELEMENT OXIDE, SOLUTION FOR TREATMENT OF GROUP III-V ELEMENT COMPOUND, SOLUTION FOR PREVENTING OXIDATION OF GROUP III-V ELEMENT, SOLUTION FOR TREATMENT OF SEMICONDUCTOR SUBSTRATE, AND METHOD FOR PRODUCTION OF SEMICONDUCTOR SUBSTRATE PRODUCT
  申请人：Fujifilm Corporation

  公开号：EP3258485A1

  公开（公告）日：2017-12-20

  Provided are a removal liquid for removing an oxide of a Group III-V element, an oxidation prevention liquid for preventing the oxidation of an oxide of a Group III-V element or a treatment liquid for treating an oxide of a Group III-V element, each liquid including an acid and a mercapto compound; and a method using each of the same liquids. Further provided are a treatment liquid for treating a semiconductor substrate, including an acid and a mercapto compound, and a method for producing a semiconductor substrate product using the same.

  本发明提供了一种用于去除 III-V 族元素氧化物的去除液、一种用于防止 III-V 族元素氧化物氧化的防氧化液或一种用于处理 III-V 族元素氧化物的处理液，每种液体都包括一种酸和一种巯基化合物；以及一种使用上述每种液体的方法。此外，还提供了一种用于处理半导体衬底的处理液，包括一种酸和一种巯基化合物，以及一种使用该处理液生产半导体衬底产品的方法。
• Composition de déformation permanente des cheveux contenant au moins un carboxydithiol
  申请人：L'Oréal

  公开号：EP1570835B1

  公开（公告）日：2010-10-20
• REMOVAL LIQUID AND METHOD FOR REMOVING OXIDE OF GROUP III-V ELEMENT, TREATMENT LIQUID FOR TREATING COMPOUND OF GROUP III-V ELEMENT, OXIDATION PREVENTION LIQUID FOR PREVENTING OXIDATION OF GROUP III-V ELEMENT, TREATMENT LIQUID FOR TREATING SEMICONDUCTOR SUBSTRATE, AND METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE PRODUCT
  申请人：FUJIFILM Corporation

  公开号：US20170309492A1

  公开（公告）日：2017-10-26

  Provided are a removal liquid for removing an oxide of a Group III-V element, an oxidation prevention liquid for preventing the oxidation of an oxide of a Group III-V element or a treatment liquid for treating an oxide of a Group III-V element, each liquid including an acid and a mercapto compound; and a method using each of the same liquids. Further provided are a treatment liquid for treating a semiconductor substrate, including an acid and a mercapto compound, and a method for producing a semiconductor substrate product using the same.