11-Difluoromethylperfluoroundecane-1-sulfonic acid | 134615-58-0

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 有机磺酸及其衍生物
• 英文名称: 11-Difluoromethylperfluoroundecane-1-sulfonic acid
• 英文别名: 1,1,2,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,11,11,12,12-tetracosafluorododecane-1-sulfonic acid
• CAS: 134615-58-0
• 化学式: C₁₂H₂F₂₄O₃S
• 分子量: 682.17
• InChiKey: ZTLUJKGMHJNIKQ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  7.4
• 重原子数：
  40
• 可旋转键数：
  12
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  62.8
• 氢给体数：
  1
• 氢受体数：
  27

文献信息

• METHOD FOR FORMING MULTILAYER RESIST
  申请人：DAIKIN INDUSTRIES, LTD.

  公开号：EP1686425A1

  公开（公告）日：2006-08-02

  There is formed a laminated resist which exhibits sufficient reflection reducing effect in a photolithography process using light of vacuum ultraviolet region and also has sufficient developing characteristics in a developing process. The method of forming the laminated photoresist comprises (I) a step for forming the photoresist layer (L1) on a substrate and (II) a step for forming the antireflection layer (L2) on the photoresist layer (L1) by applying the coating composition containing the fluorine-containing polymer (A) having hydrophilic group Y. The fluorine-containing polymer (A) contains a structural unit derived from a fluorine-containing ethylenic monomer having hydrophilic group Y and is characterized in that (i) the hydrophilic group Y contains an acidic OH group having a pKa value of not more than 11, (ii) a fluorine content is not less than 50 % by mass, and (iii) the number of moles of the hydrophilic group Y in 100 g of the fluorine-containing polymer (A) is not less than 0.14.

  形成了一种层状光刻胶，它在使用真空紫外区光的光刻工艺中显示出足够的减反射效果，并且在显影工艺中具有足够的显影特性。形成层状光刻胶的方法包括：(I) 在基底上形成光刻胶层 (L1) 的步骤；(II) 在光刻胶层 (L1) 上形成抗反射层 (L2) 的步骤，该步骤通过涂敷含有亲水基团 Y 的含氟聚合物 (A) 的涂层组合物来实现。含氟聚合物(A)含有由具有亲水基团 Y 的含氟乙烯单体衍生的结构单元，其特征在于：(i) 亲水基团 Y 含有 pKa 值不大于 11 的酸性 OH 基团；(ii) 氟含量不小于 50%（按质量计）；(iii) 100 克含氟聚合物(A)中亲水基团 Y 的摩尔数不小于 0.14。
• Electrochemical gas sensor and electrolyte for an electrochemical gas sensor
  申请人：Dräger Safety AG & Co. KGaA

  公开号：US10732144B2

  公开（公告）日：2020-08-04

  An electrochemical gas sensor (10) includes a housing (20) and with at least one electrode (21, 22). The housing (20) has a gas inlet (23). An at least strongly acidic, liquid electrolyte (30) is present in the gas sensor (10). The electrolyte (30) partly wets the electrode (21, 22). Provisions are made in such a gas sensor (10) for the electrolyte (30) to contain an additive that contains at least one surfactant. An electrolyte (30) is also provided for a gas sensor (10), which electrolyte (30) contains at least one surfactant as an additive.

  电化学气体传感器 (10) 包括一个外壳 (20) 和至少一个电极 (21, 22)。外壳（20）有一个气体入口（23）。气体传感器（10）中至少有一种强酸性液态电解质（30）。电解液（30）部分润湿电极（21、22）。在这种气体传感器（10）中，电解液（30）含有至少一种表面活性剂的添加剂。还为气体传感器（10）提供了一种电解液（30），该电解液（30）含有至少一种表面活性剂作为添加剂。
• ELEKTROCHEMISCHER GASSENSOR UND ELEKTROLYT FÜR EINEN ELEKTROCHEMISCHEN GASSENSOR
  申请人：Dräger Safety AG & Co. KGaA

  公开号：EP3259583A1

  公开（公告）日：2017-12-27
• Method of forming laminated resist
  申请人：Araki Takayuki

  公开号：US20070196763A1

  公开（公告）日：2007-08-23

  There is formed a laminated resist which exhibits sufficient reflection reducing effect in a photolithography process using light of vacuum ultraviolet region and also has sufficient developing characteristics in a developing process. The method of forming the laminated photoresist comprises (I) a step for forming the photoresist layer (L 1 ) on a substrate and (II) a step for forming the antireflection layer (L 2 ) on the photoresist layer (L 1 ) by applying the coating composition containing the fluorine-containing polymer (A) having hydrophilic group Y. The fluorine-containing polymer (A) contains a structural unit derived from a fluorine-containing ethylenic monomer having hydrophilic group Y and is characterized in that (i) the hydrophilic group Y contains an acidic OH group having a pKa value of not more than 11, (ii) a fluorine content is not less than 50% by mass, and (iii) the number of moles of the hydrophilic group Y in 100 g of the fluorine-containing polymer (A) is not less than 0.14.
• Composition For Forming Antireflection Film, Layered Product, And Method Of Forming Resist Pattern
  申请人：Yoshimura Nakaatsu

  公开号：US20080124524A1

  公开（公告）日：2008-05-29

  An antireflection film-forming composition which has excellent applicability, is significantly inhibited from generating ultrafine microbubbles, gives an antireflection film capable of sufficiently reducing the standing-wave effect, and has excellent solubility in water and an alkaline developing solution. The antireflection film-forming composition contains: (A) a copolymer (salt) of a sulfonic acid group-containing acrylamide derivative represented by, e.g., 2-(meth)acrylamido-2-methylpropanesulfonic acid and a fluoroalkyl group-containing acrylic acid ester derivative represented by, e.g., 2,2,3,3,3-pentafluoropropyl (meth)acrylate; and (B) a surfactant whose 0.1 wt. % aqueous solution has a surface tension as measured at 25° C. of 45 mN/m or lower.