4-(2-甲基-2-丁基)苯基乙酸酯 | 6487-60-1

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯酚酯
• 中文名称: 4-(2-甲基-2-丁基)苯基乙酸酯
• 中文别名: 4-叔戊基苯酚乙酸酯
• 英文名称: 4-(tert-amyl)phenyl acetate
• 英文别名: acetic acid-(4-tert-pentyl-phenyl ester)；Essigsaeure-(4-tert-pentyl-phenylester)；p-tert-Amylphenyl acetate；[4-(2-methylbutan-2-yl)phenyl] acetate
• CAS: 6487-60-1
• 化学式: C₁₃H₁₈O₂
• mdl: MFCD00027033
• 分子量: 206.285
• InChiKey: SLRPYKPCRFYYCV-UHFFFAOYSA-N

物化性质

• 沸点：
  274.3±19.0 °C(Predicted)
• 密度：
  0.981±0.06 g/cm3(Predicted)
• 保留指数：
  1502

计算性质

• 辛醇/水分配系数(LogP)：
  4
• 重原子数：
  15
• 可旋转键数：
  4
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.461
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为产物：
  描述：

  对叔戊基苯酚 、 乙酸酐 生成 4-(2-甲基-2-丁基)苯基乙酸酯
  参考文献：
  名称：

  Fischer; Gruetzner, Chemische Berichte, 1893, vol. 26, p. 1648

  摘要：

  DOI：

文献信息

• Chemically amplified resist material and resist pattern-forming method
  申请人：JSR CORPORATION

  公开号：US10018911B2

  公开（公告）日：2018-07-10

  A chemically amplified resist material comprises a polymer component that is capable of being made soluble or insoluble in a developer solution by an action of an acid, and a generative component that is capable of generating a radiation-sensitive sensitizer and an acid upon an exposure. The radiation-sensitive acid-and-sensitizer generating agent or the radiation-sensitive acid generating agent included in the generative component comprises the first compound that is radiation-sensitive and second compound that is radiation-sensitive. The first compound includes a first onium cation and a first anion, and the second compound includes a second onium cation and a second anion that is different from the first anion. Each of an energy released upon reduction of the first onium cation to a radical and an energy released upon reduction of the second onium cation to a radical is less than 5.0 eV.

  一种化学放大抗蚀剂材料包括一种在酸的作用下能溶于或不溶于显影液的聚合物成分，以及一种在曝光时能产生辐射敏感敏化剂和酸的生成成分。生成组件中的辐射敏感性酸和敏化剂生成剂或辐射敏感性酸生成剂包括辐射敏感性第一化合物和辐射敏感性第二化合物。第一化合物包括第一鎓阳离子和第一阴离子，第二化合物包括第二鎓阳离子和不同于第一阴离子的第二阴离子。第一鎓阳离子还原成自由基时释放的能量和第二鎓阳离子还原成自由基时释放的能量均小于 5.0 eV。
• Polyisocyanate composition and isocyanate polymer composition
  申请人：Asahi Kasei Kabushiki Kaisha

  公开号：US10301417B2

  公开（公告）日：2019-05-28

  The present invention relates to a polyisocyanate composition comprising, on the basis of the total mass of the polyisocyanate composition, 97 mass % or more of a polyisocyanate; and 2.0 mass ppm to 1.0×104 mass ppm of a compound represented by the formula (1): wherein R1 is an aliphatic group having 6 to 70 carbon atoms, R2 is an aromatic ring, a is an integer of 1 to 5, b is an integer of 0 to 4, and the sum of a and b is 2 to 5.

  本发明涉及一种多异氰酸酯组合物，以该多异氰酸酯组合物的总质量为基准，该组合物包含 97 质量 % 或以上的多异氰酸酯；以及 2.0 质量 ppm 至 1.0×104 质量 ppm 的式 (1) 所代表的化合物： 其中 R1 是具有 6 至 70 个碳原子的脂肪族基团，R2 是芳香环，a 是 1 至 5 的整数，b 是 0 至 4 的整数，a 和 b 之和是 2 至 5。
• Mallavadhani, Uppuluri V.; Sahoo, Laxmidhar; Roy, Subhra, Indian Journal of Chemistry - Section B Organic and Medicinal Chemistry, 2004, vol. 43, # 10, p. 2175 - 2177
  作者：Mallavadhani, Uppuluri V.、Sahoo, Laxmidhar、Roy, Subhra

  DOI：——

  日期：——
• Sen; Kakaji, Journal of the Indian Chemical Society, 1952, vol. 29, p. 950,952
  作者：Sen、Kakaji

  DOI：——

  日期：——
• POLYMER, RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
  申请人：Utsumi Yoshiyuki

  公开号：US20130022911A1

  公开（公告）日：2013-01-24

  A polymer containing an anion part which generates acid upon exposure on at least one terminal of the main chain, and at least one structural unit selected from the group consisting of a structural unit (a0) containing a —SO 2 -containing cyclic group, a structural unit (a3) containing at least one group selected from the group consisting of —OH, —COOH, —CN, —SO 2 NH 2 and —CONH 2 and a structural unit (a5) which generates acid upon exposure.