5-(1-adamantyl)oxycarbonylbicyclo[2.2.1 ]hept-2-ene | 290809-09-5

• 分子结构分类: 有机化合物 - 有机酸及其衍生物 - 羧酸及其衍生物
• 英文名称: 5-(1-adamantyl)oxycarbonylbicyclo[2.2.1 ]hept-2-ene
• 英文别名: 1-Adamantyl bicyclo[2.2.1]hept-5-ene-2-carboxylate
• CAS: 290809-09-5
• 化学式: C₁₈H₂₄O₂
• 分子量: 272.387
• InChiKey: KXIHFOBNQWLVER-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.2
• 重原子数：
  20
• 可旋转键数：
  3
• 环数：
  6.0
• sp3杂化的碳原子比例：
  0.83
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

文献信息

• Alkyl-substituted tetracyclododecenecarboxylic acid esters, (meth)acrylic acid addition products thereof, and methods for producing the same
  申请人：——

  公开号：US20030073864A1

  公开（公告）日：2003-04-17

  The present invention provides alkyl-substituted tetracyclododecenecarboxylic acid esters presented by the general formula (I): 1 wherein R 1 is an alkyl group having 1 to 4 carbon atoms and R 2 is a hydrocarbon group having 1 to 12 carbon atoms. Further, the represent invention provides (meth)acrylic acid addition products of alkyl-substituted tetracyclododecenecarboxylic acid esters represented by the general formula (II): 2 wherein R 1 is an alkyl group having 1 to 4 carbon atoms, R 2 is a hydrocarbon group having 1 to 12 carbon atoms, and R 3 is a hydrogen atom or a methyl group.

  本发明提供了一种由通式（I）表示的烷基取代四环十二烯羧酸酯，其中R1是具有1至4个碳原子的烷基基团，R2是具有1至12个碳原子的碳氢基团。此外，本发明提供了由通式（II）表示的烷基取代四环十二烯羧酸酯的（甲基）丙烯酸加成物，其中R1是具有1至4个碳原子的烷基基团，R2是具有1至12个碳原子的碳氢基团，R3是氢原子或甲基基团。
• Method for producing carboxylic acid tertiary alkyl ester
  申请人：——

  公开号：US20020055649A1

  公开（公告）日：2002-05-09

  A carboxylic acid tertiary alkyl ester (Chemical formula 1) of high purity is obtained at a high yield ratio, by continually adding an esterification agent possessing a monovalent acid group, which agent is ester-interchangeable with a tertiary alcohol, to a mixed fluid of a carboxylic acid and a tertiary alcohol: R 1 (COOR 2 ) n (1)

  通过持续添加具有单价酸基的酯化剂，该酯化剂可与三级醇交换酯基，到羧酸和三级醇的混合液中，可以高产率地得到高纯度的羧酸三级烷基酯（化学式1）。结果为R1（COOR2）n（1）。
• Radiation-sensitive resin composition
  申请人：——

  公开号：US20030219680A1

  公开（公告）日：2003-11-27

  A radiation-sensitive resin composition suitable as a chemically-amplified resist is provided. The composition comprised (A) a resin insoluble or scarcely soluble in alkali, but becoming alkali soluble by the action of an acid, and (B) a photoacid generator. The resin comprises a recurring unit of the following formula (I), 1 wherein R 1 is typically a hydrogen atom and the —C (R 5 ) 3 structure is a 2-methyl-2-tricyclodecanyl group, 2-ethyl-2-tricyclodecanyl group, 2-methyl-2-adamantyl group, 2-ethyl-2-adamantyl group, 1-methylcyclopentyl group, 1-ethylcyclopentyl group, 1-methylcyclohexyl group, or 1-ethylcyclohexyl group.

  提供一种适用于化学放大光刻胶的辐射敏感树脂组合物。该组合物包含(A)一种碱不溶或难溶的树脂，但在酸的作用下变得碱溶，以及(B)一种光酸发生剂。该树脂包含以下式(I)的重复单元，其中R1通常是氢原子，而—C(R5)3结构是2-甲基-2-三环己基基团、2-乙基-2-三环己基基团、2-甲基-2-金刚烷基团、2-乙基-2-金刚烷基团、1-甲基环戊基团、1-乙基环戊基团、1-甲基环己基团或1-乙基环己基团。
• RESIN MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD FOR PRODUCING RESIST UNDERLAYER FILM, AND LAYERED PRODUCT
  申请人：Mitsui Chemicals, Inc.

  公开号：EP3693793A1

  公开（公告）日：2020-08-12

  Provided is a resin material for forming an underlayer film which is used to form a resist underlayer film used in a multi-layer resist process, the resin material including a cyclic olefin polymer (I), in which a temperature at an intersection between a storage modulus (G') curve and a loss modulus (G") curve in a solid viscoelasticity of the resin material for forming an underlayer film which is as measured under conditions of a measurement temperature range of 30°C to 300°C, a heating rate of 3°C/min, and a frequency of 1 Hz in a nitrogen atmosphere in a shear mode using a rheometer is higher than or equal to 40°C and lower than or equal to 200°.

  本发明提供了一种用于形成底层膜的树脂材料，该底层膜可用于形成多层光刻胶工艺中使用的光刻胶底层膜，该树脂材料包括环烯烃聚合物 (I)、其中，用于形成底层膜的树脂材料的固体粘弹性中的存储模量（G'）曲线和损失模量（G"）曲线的交点温度高于或等于 40°C，且低于或等于 200°C；该固体粘弹性是在测量温度范围为 30°C 至 300°C、加热速率为 3°C/min 和频率为 1 Hz 的条件下，在氮气环境中使用流变仪以剪切模式测得的。
• METHOD FOR PURIFYING POLYMER AND POLYMER
  申请人：Sunaga Tadahiro

  公开号：US20120208976A1

  公开（公告）日：2012-08-16

  Disclosed is a method for purifying a polymer in which a solution containing a cyclic olefin polymer having at least a repeating structural unit [A] represented by the general formula (1) and a metal component is brought into contact with an organic compound having a basic functional group and an acidic functional group, and then the resulting solution is brought into contact with a basic adsorbent to remove the metal component contained in the solution.