Tertiary alcohol compounds of formula (1) are novel wherein R
1
and R
2
are C1-10 alkyl groups which may have halogen substituents, or R
1
and R
2
may form an aliphatic hydrocarbon ring, Y and Z are a single bond or a divalent C1-10 organic group, and k=0 or 1. Using the tertiary alcohol compounds as a monomer, polymers are obtained. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation and has excellent sensitivity, resolution, etching resistance and substrate adhesion.
1
公式(1)的
三级醇化合物是新颖的,其中R1和R2是C1-10烷基,可能具有卤素取代基,或者R1和R2可以形成一个脂肪族碳氢环,Y和Z是单键或双价的C1-10有机基团,k = 0或1。使用这些
三级醇化合物作为单体,可以得到聚合物。以该聚合物作为基础
树脂的抗蚀剂组合物对高能辐射敏感,具有极佳的敏感性、分辨率、刻蚀抗性和基底附着性。