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Prop-2-en-1-amine;prop-2-enoic acid | 51093-03-9

中文名称
——
中文别名
——
英文名称
Prop-2-en-1-amine;prop-2-enoic acid
英文别名
——
Prop-2-en-1-amine;prop-2-enoic acid化学式
CAS
51093-03-9
化学式
C6H11NO2
mdl
——
分子量
129.16
InChiKey
VVZLMVQGOQOHOU-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    0.39
  • 重原子数:
    9
  • 可旋转键数:
    2
  • 环数:
    0.0
  • sp3杂化的碳原子比例:
    0.17
  • 拓扑面积:
    63.3
  • 氢给体数:
    2
  • 氢受体数:
    3

文献信息

  • Polymers of self- and hydroxyl reactive formaldehyde-free cyclic hemiamidal and hemiamide ketal crosslinking monomers
    申请人:AIR PRODUCTS AND CHEMICALS, INC.
    公开号:EP0211432A2
    公开(公告)日:1987-02-25
    A compound represented by the following formula: wherein R is a C3-C21 olefinically unsaturated organic radical having functionality which renders the nitrogen atom electron deficient, the olefinic unsaturation functionality being polymerizable, R' is hydrogen or a C1-C4 alkyl radical, or R and R' together with the nitrogen atom can form an olefinically unsaturated 5 to 7-member ring which has functionality that renders the nitrogen atom electron deficient and the olefinic unsaturation functionality is polymerizable, R2 and R3 are hydrogen, a C1-C4 alkyl or acyl radical, or R2 and R3 together are a C2-C4 alkylene group, R4 is hydrogen or a C1-C4 alkyl, acyl, ester, amide or acid group, and n is an integer from 1 to 10, provided n is not 1 when R is (meth)acryloyl, R2 and R3 are methyl and R' and R4 are hydrogen. Under acidic conditions the above compounds in which R' is hydrogen afford cyclic hemiamidals and hemiamide ketals of the following formula: The dialkyl acetal and ketal compounds and the cyclic hemiamidal and hemiamide ketal compounds can be homopolymerized or polymerized with other copolymerizable monomers.
    下式所代表的化合物: 其中 R 是 C3-C21 烯烃不饱和有机基,具有使氮原子缺电子的官能度,烯烃不饱和官能度可聚合、 R' 是氢或 C1-C4 烷基,或 R 和 R'与氮原子一起可形成烯烃不饱和 5 至 7 元环,该环具有使氮原子缺电子的官能度,且烯烃不饱和官能度可聚合、 R2 和 R3 是氢、C1-C4 烷基或酰基,或 R2 和 R3 合在一起是一个 C2-C4 烯基、 R4 是氢或 C1-C4 烷基、酰基、酯基、酰胺基或酸基,以及 n 是 1 到 10 的整数,但当 R 是(甲基)丙烯酰基、R2 和 R3 是甲基、R'和 R4 是氢时,n 不是 1。 在酸性条件下,R'为氢的上述化合物可生成下式的环半酰胺和半酰胺酮: 二烷基缩醛和缩酮化合物以及环半酰胺和半酰胺缩酮化合物可以均聚或与其他可共聚单体聚合。
  • Self- and hydroxyl reactive formaldehyde-free cyclic hemiamidal and hemiamide ketal crosslinking monomers and their derived polymers
    申请人:AIR PRODUCTS AND CHEMICALS, INC.
    公开号:EP0215245A1
    公开(公告)日:1987-03-25
    A compound represented by the following formula: wherein R is a C3-C24 olefinically unsaturated organic radical having functionality which renders the nitrogen atom electron deficient, the olefinic unsaturation functionality being polymerizable, R1 is hydrogen or a C1-C4 alkyl radical, or R and R1 together with the nitrogen atom can form an olefinically unsaturated 5 to 7-member ring which has functionality that renders the nitrogen atom electron deficient and the olefinic unsaturation functionality is polymerizable, R2 and R3 are hydrogen, a C1-C4 alkyl or acyl radical, or R2 and R3 together are a C2-C4 alkylene group, R4 is hydrogen or a C1-C4 alkyl, acyl, ester, amide or acid group, and n is an integer from 1 to 10, provided n is not 1 when R is (meth)acryloyl, R2 and R3 are methyl and R1 and R4 are hydrogen. Under acidic conditions the above compounds having R1 = hydrogen afford cyclic hemiamidals and hemiamide ketals of the following formula
    下式所代表的化合物: 其中 R 是 C3-C24 烯烃不饱和有机基,具有使氮原子缺电子的官能团,烯烃不饱和官能团可聚合、 R1 是氢或 C1-C4 烷基,或 R 和 R1 与氮原子一起可形成烯烃不饱和的 5 至 7 元环,该环具有使氮原子缺电子的官能度,且烯烃不饱和官能度可聚合、 R2 和 R3 是氢、C1-C4 烷基或酰基,或 R2 和 R3 合在一起是一个 C2-C4 烯基、 R4 是氢或 C1-C4 烷基、酰基、酯基、酰胺基或酸基,以及 n 是 1-10 之间的整数,条件是当 R 是(甲基)丙烯酰基、R2 和 R3 是甲基、R1 和 R4 是氢时,n 不是 1。 在酸性条件下,R1=氢的上述化合物可生成下式的环半酰胺和半酰胺酮
  • Polymers of self- and diol reactive formaldehyde-free crosslinking monomers
    申请人:AIR PRODUCTS AND CHEMICALS, INC.
    公开号:EP0218827A2
    公开(公告)日:1987-04-22
    A compound represented by the following formula: wherein R is a C3-C24 olefinically unsaturated organic radical having functionality which renders the nitrogen atom electron deficient, the olefinic unsaturation functionality being polymerizable. R' is hydrogen or a C,-C4 alkyl radical, or R and R' together with the nitrogen atom can form an olefinically unsaturated 5 7-member ring which has functionality that renders the nitrogen atom electron deficient and the olefinic unsaturation functionality is polymerizable, R2 and R3 are hydrogen, a C1-C4 alkyl or acyl radical, or R2 and R3 together are a C2-C4 alkylene group, R4 is hydrogen or a C,-C4 alkyl, acyl, ester, amide or acid group. and n is an integer from 1 to 10, provided n is not 1 when R is (meth)acryloyl, R2 and R3 are methyl and R' and R4 are hydrogen. Under acidic conditions the above compounds in which R' is hydrogen afford cyclic hemiamidals and hemiamide ketals of the following formula: The dialkyl acetal and ketal compounds and the cyclic hemiamidal and hemiamide ketal compounds can be homopolymerized or polymerized with other copolymerizable monomers.
    下式所代表的化合物: 其中 R 是 C3-C24 烯烃不饱和有机基,具有使氮原子缺电子的官能团,烯烃不饱和官能团可聚合。 R' 是氢或 C,-C4 烷基,或 R 和 R'与氮原子一起可形成一个烯烃不饱和 5-7 元环,该环具有使氮原子缺电子的官能度,且烯烃不饱和官能度可聚合、 R2 和 R3 是氢、C1-C4 烷基或酰基,或 R2 和 R3 合在一起是 C2-C4 烯基、 R4 是氢或 C,-C4烷基、酰基、酯基、酰胺基或酸基。 n 是 1 到 10 的整数,但当 R 是(甲基)丙烯酰基,R2 和 R3 是甲基,R'和 R4 是氢时,n 不是 1。 在酸性条件下,R'为氢的上述化合物可生成下式的环半酰胺和半酰胺酮: 二烷基缩醛和缩酮化合物以及环半酰胺和半酰胺缩酮化合物可以均聚或与其他可共聚单体聚合。
  • POLYMER ADSORBENT
    申请人:Nippon Filcon Co., Ltd.
    公开号:EP2808080A1
    公开(公告)日:2014-12-03
    Problem To provide a method for easily producing an adsorbing material used for the removal and recovery of metals and ions in a solution, which is highly durable and has various adsorptive functional groups and forms applicable for various purposes. Means for Resolution A polymer adsorbent for metals and ions, which is highly durable and has various adsorptive functional groups and forms applicable for various purposes, is produced by a) preparing a reactive polymer having a large number of halogenated alkyl groups or glycidyl groups in the molecule, b) preparing a base material polymer insoluble in water and alcohols, c) dissolving the reactive polymer and the base material polymer in an organic solvent to give a mixed solution, d) removing the organic solvent to give a solid carrier in a desired form, and e) allowing a halogenated alkyl group or a glycidyl group in the solid carrier to react with an amine compound having a functional group capable of adsorbing metals and ions, thereby introducing an adsorptive functional group.
    问题 提供一种易于生产用于去除和回收溶液中的金属和离子的吸附材料的方法,这种材料非常耐用,具有各种吸附功能基团和形式,适用于各种用途。 解决方法 a) 制备分子中含有大量卤代烷基或缩水甘油基的活性聚合物;b) 制备不溶于水和醇的基础材料聚合物、c) 将反应性聚合物和基础材料聚合物溶解在有机溶剂中,得到混合溶液, d) 去除有机溶剂,得到所需的固体载体, e) 使固体载体中的卤代烷基或缩水甘油基与具有吸附金属和离子的官能团的胺化合物反应,从而引入吸附官能团。
  • LOW DK/DF SOLDER RESISTANT COMPOSITION USE FOR PRINTED CIRCUIT BOARD
    申请人:Nan-Ya Plastics Corporation
    公开号:EP3243854A1
    公开(公告)日:2017-11-15
    The present invention provides a low dielectric constant (Dk) and dissipation factor (Df) of solder resistant mask composition having excellent photo and thermocurability, high developability resolution with an alkaline aqueous solution. It made printed circuit board with excellent adhesion, chemical resistance, solder heat resistance and the dielectric constant below 3.20(1 GHz), the dissipation factor is less than 0.015(1 GHz). The low dielectric constant solder resistant composition contains following components: (A) a photosensitive prepolymer or called oligomer (represented by formula I); (B) a photopolymerizable vinyl monomer; (C) an epoxy compound; (D) a photopolymerization initiator; (E) a filler; (F) a catalyst; (G) an organic solvent;
    本发明提供了一种低介电常数(Dk)和耗散因子(Df)的耐焊掩模组合物,它具有优异的光和热可控性,用碱性水溶液显影分辨率高。它制成的印刷电路板具有优异的附着力、耐化学性、耐焊热性,介电常数低于 3.20(1 GHz),耗散因子小于 0.015(1 GHz)。 低介电常数耐焊剂组合物包含以下成分: (A) 一种光敏预聚物或称为低聚物(由式 I 表示); (B) 可进行光聚合的乙烯基单体; (C) 环氧化合物 (D) 一种光聚合引发剂 (E) 填充剂 (F) 催化剂 (G) 有机溶剂;
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