ferrocenylethyl methacrylate | 34802-12-5

• 分子结构分类: 有机化合物 - 有机杂环化合物
• 英文名称: ferrocenylethyl methacrylate
• 英文别名: Cyclopenta-1,3-diene;2-cyclopenta-1,4-dien-1-ylethyl 2-methylprop-2-enoate;iron(2+)
• CAS: 34802-12-5
• 化学式: C₁₆H₁₈FeO₂
• 分子量: 298.165
• InChiKey: GXIRDIHNMJVMGT-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.47
• 重原子数：
  19
• 可旋转键数：
  5
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.19
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  4

反应信息

• 作为产物：
  描述：

  1-hydroxyethylferrocene 、 甲基丙烯酰氯 在 dimethylphenylamine 作用下， 以 二氯甲烷 为溶剂， 以83%的产率得到ferrocenylethyl methacrylate
  参考文献：
  名称：

  Charge-Transfer-to-Solvent Photochemistry of Electrode-Confined Ferrocene- and Cobaltocene-Based Polymers: Photoelectrochemical Reduction of Halocarbons

  摘要：

  Like the metallocenes themselves, metallocene-based polymers exhibit near-UV (280-370 nm) charge-transfer-to-solvent (CTTS) absorption in the presence of CCl4, CHCl3, CH2Cl2, CBr4, and CHBr3. The photoelectrochemistry of charge transfer complexes of two ferrocene-containing polymers and one cobaltocene-containing polymer has been studied. The polymers are poly(2-ferrocenylethyl methacrylate), poly(3-(octamethylferrocenyl)propyl methacrylate), and poly(1,1'-bis[((3-(triethoxysilyl)propyl)amino)carbonyl]cobaltocene). Photoexcitation of metallocenes and metallocene-based polymers in the presence of many halocarbons yields oxidation of the metallocene and reduction of the halocarbon. When the metallocene-based polymer is confined to the surface of an electrode that is held at a potential negative of the formal potential of the metallocene, near-UV excitation results in sustained cathodic current in electrolyte solutions containing halocarbons. The wavelength, acceptor, and potential dependences are in accord with a sustained current that is due to a metallocene-to-halocarbon CTTS absorption where the photoprocess results in the reduction of the halocarbon at an electrode potential significantly positive of where electrochemical reduction occurs in the dark. The octamethylferrocene-based system shows a more negative potential onset and a longer wavelength offset of photocurrent than the simple ferrocene-based system, consistent with the electron-releasing nature of the methyl substituents. The onset of photocurrent in the cobaltocene-based system occurs at the most negative potential of the three, consistent with the cobaltocene-based system having the most negative formal potential of the metallocenes studied.

  DOI：

  10.1021/j100019a056

文献信息

• Organometallic polymers and use thereof
  申请人：International Business Machines Corporation

  公开号：US06458907B1

  公开（公告）日：2002-10-01

  Compositions comprising a polymer of organometallic polymerizable monomer acid or ester are useful as resists and are sensitive to imaging irradiation while exhibiting enhanced resistance to reactive ion etching.

  由含有有机金属可聚合单体酸或酯的聚合物组成的复合物可用作抗蚀剂，并对成像辐射敏感，同时表现出增强的反应离子刻蚀抗性。
• US06171757B2
  申请人：——

  公开号：——

  公开（公告）日：——