NEWMAN M. S.; KANAKARAJAN K., J. ORG. CHEM., 1980, 45, NO 17, 3523-3524
作者:NEWMAN M. S.、 KANAKARAJAN K.
DOI:——
日期:——
MAIER G.; JUNG W. A., TETRAHEDRON, 1980, 21, NO 40, 3875-3878
作者:MAIER G.、 JUNG W. A.
DOI:——
日期:——
POJER, P. M., CHEM. AND IND., 1986, N 5, 177-178
作者:POJER, P. M.
DOI:——
日期:——
Base precursor for heat-developable photosensitive material
申请人:Fuji Photo Film Co., Ltd.
公开号:US04560763A1
公开(公告)日:1985-12-24
A base precursor for heat-developable photosensitive material is disclosed. The precursor is comprised of a compound represented by general formula (I) or (II): (R--C.tbd.C--CO.sub.2 H).sub.x.B (I) R--C.tbd.C--CO.sub.2 H).sub.2.B.sub.y (II) The substituents within the general formulae are defined within the specification. The use of this novel base precursor makes it possible to obtain a material which is very stable at normal temperatures and which smoothly decomposes under heating at 80.degree. C. or higher in order to release a basic constituent.