The present invention discloses a compound having the following formula (I),
1
wherein R
1
is H, haloalkyl group or C
1
-C
4
alkyl group; R
2
is hydroxyl group, C
1
-C
8
alkoxy group or C
1
-C
8
thioalkyl group; G is (CH
2
)
n
, O or S, wherein n is 0, 1, 2, 3 or 4; Rc is a lactone group; and m is 1, 2 or 3. This compound is a monomer and suitable for synthesis to form polymers with good hydrophilicity, adhesion and dry-etch resistance. Particularly, this compound can form photosensitive polymers or copolymers by reacting with suitable photosensitive monomers.
本发明揭示了一种具有以下公式(I)的化合物,其中R1为H、卤代烷基或C1-C4烷基;R2为羟基、C1-C8烷氧基或C1-C8
硫代烷基;G为(
CH2)n、O或S,其中n为0、1、2、3或4;Rc为内酯基;m为1、2或3。该化合物是一种单体,适合合成具有良好亲
水性、附着力和干法刻蚀抗性的聚合物。特别地,该化合物可以通过与适当的光敏单体反应形成光敏聚合物或共聚物。