申请人:MINNESOTA MINING AND MANUFACTURING COMPANY
公开号:EP0046083A2
公开(公告)日:1982-02-17
Surfactants which are blocked against surfactant action (identified herein as "photolabile blocked surfactants") by a photolabile protective or masking group but which, on exposure to actinic radiation, become unblocked are provided. Coating compositions in which surfactant is formed on irradiation are provided by blending the photolabile blocked surfactant with polymeric film-forming materials.
Compositions containing the photolabile blocked surfactants are useful when employed as protective coatings on various substrates or as the adhesive in a pressure sensitive adhesive tape. Although initially well adhering to a substrate, such compositions may be readily removed from the substrate following exposure of the same to suitable radiation which unblocks the surfactant to permit it to regain its surfactant activity.
本发明提供的表面活性剂(此处称为 "光敏阻滞表面活性剂")被光敏保护基团或掩蔽基团阻滞,但在暴露于光辐射时会解除阻滞。通过将光亲和性受阻表面活性剂与聚合物成膜材料混合,可提供在辐照时形成表面活性剂的涂层组合物。
含有光敏封端表面活性剂的组合物在用作各种基材的保护涂层或压敏胶带的粘合剂时非常有用。虽然最初能很好地粘附在基材上,但当基材暴露在适当的辐射下,表面活性剂就会解除阻塞,从而恢复其表面活性剂的活性,这样,这种组合物就可以很容易地从基材上去除。