hexanoic acid (3-methylbut-2-enyl) amide | 1000183-70-9

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 脂肪酰基
• 英文名称: hexanoic acid (3-methylbut-2-enyl) amide
• 英文别名: N-(3-methylbut-2-enyl)hexanamide
• CAS: 1000183-70-9
• 化学式: C₁₁H₂₁NO
• 分子量: 183.294
• InChiKey: VSJWCSFQKANROS-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3
• 重原子数：
  13
• 可旋转键数：
  6
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.73
• 拓扑面积：
  29.1
• 氢给体数：
  1
• 氢受体数：
  1

反应信息

• 作为产物：
  描述：

  己酰氯 生成 hexanoic acid (3-methylbut-2-enyl) amide
  参考文献：
  名称：

  METHOD OF PRODUCING A POLYMERIC MATERIAL, POLYMER, MONOMERIC COMPOUND AND METHOD OF PREPARING A MONOMERIC COMPOUND

  摘要：

  一种生产聚合材料的方法，该方法包括以下步骤：将起始材料置于聚合条件下，所述起始材料包括一个亚式(XIII)的基团，其中R16从氢、卤素、硝基、烃基、可选择的官能团取代或夹杂，或R2和R3分别从(CR6R7)或CR8R9、CR6R7CR8R9或CR8R9CR6R7的基团中独立选择，其中n为0、1或2，R6和R7分别从氢或烷基中独立选择，R8或R9中的一个为氢，另一个为电子吸引基团，或者R8和R9一起形成一个电子吸引基团；R4和R5分别从CH或CR1o中独立选择，其中CR1o为电子吸引基团，虚线表示存在或不存在键，X1为一个CX2X3基团，其中它所连接的虚线键不存在，或者为一个CX2基团，其中它所连接的虚线键存在，Y1为一个CY2Y3基团，其中它所连接的虚线键不存在，或者为一个CY2基团，其中它所连接的虚线键存在，X2和X3，如果存在，Y2和Y3分别为C1到C4的烷基。

  公开号：

  US20090156706A1

文献信息

• METHODS OF COATING A LOW SURFACE ENERGY SUBSTRATE
  申请人：Allen Warrick James David

  公开号：US20140370279A1

  公开（公告）日：2014-12-18

  According to the invention there is provided a method of coating a low surface energy substrate including the steps of: a) providing a polymeric precursor which includes a group of sub-formula (I) where R 1 is i) CR a , where R a is hydrogen or alkyl, ii) a group S(0) p R 13 , or SiR 14 where R 13 and R 14 are independently selected from hydrogen or hydrocarbyl, p is 0, 1 or 2 and q is 1 or 2, iii) C(0)N, S(0) 2 N, C(0)ON, CH 2 ON, or CH═CHR C N where R c is an electron withdrawing group, or iv) OC(0)CH, C(0)OCH or S(0)2CH; in which R 12 is selected from hydrogen, halo, nitro, hydrocarbyl, optionally substituted or interposed with functional groups, or formula (II) R 2 and R 3 are independently selected from (CR 7 R 8 )n, or a group CR 9 R 10 , CR 7 R 8 CR 9 R 10 or CR 9 R 10 CR 7 R 8 where n is 0, 1 or 2, R 7 and R 8 are independently selected from hydrogen or alkyl, and either one of R 9 or R 10 is hydrogen and the other is an electron withdrawing group, or R 9 and R 10 together form an electron withdrawing group; R 4 and R 5 are independently selected from CH or CR 11 where CR 11 is an electron withdrawing group, the dotted lines indicate the presence or absence of a bond, X 1 is a group CX 2 X 3 where the dotted line bond to which it is attached is absent and a group CX 2 where the dotted line to which it is attached is present, Y 1 is a group CY 2 Y 3 where the dotted line to which it is attached is absent and a group CY 2 where the dotted line to which it is attached is present, and X 2, X 3 , Y 2 and Y 3 are independently selected from hydrogen, fluorine or other substituents; and b) either (i) coating the low surface energy substrate with the polymeric precursor and polymerising the polymeric precursor to form a polymeric coating, or (ii) polymerising the polymeric precursor and contacting the polymerised polymeric precursor with a low surface energy substrate to form a polymeric coating on the low surface energy substrate.

  根据本发明提供了一种涂覆低表面能基材料的方法，包括以下步骤：a）提供一个聚合物前体，其中包括一个亚公式（I）的基团，其中R1是i）CRa，其中Ra是氢或烷基，ii）一个S（0）pR13基团，或SiR14，其中R13和R14独立选择自氢或烃基，p为0、1或2，q为1或2，iii）C（0）N，S（0）2N，C（0）ON，CH2ON或CH═CHRCN，其中Rc是一个电子提取基团，或iv）OC（0）CH，C（0）OCH或S（0）2CH；其中R12选择自氢、卤素、硝基、烃基（可选择性地取代或插入功能基团）或公式（II）R2和R3独立选择自（CR7R8）n，或一个CR9R10基团，CR7R8CR9R10或CR9R10CR7R8基团，其中n为0、1或2，R7和R8独立选择自氢或烷基，R9或R10之一为氢，另一个为电子提取基团，或R9和R10一起形成电子提取基团；R4和R5独立选择自CH或CR11，其中CR11是电子提取基团，虚线表示有或无化学键，X1是一个CX2X3基团，其中它所附着的虚线键不存在，以及一个CX2基团，其中它所附着的虚线存在，Y1是一个CY2Y3基团，其中它所附着的虚线键不存在，以及一个CY2基团，其中它所附着的虚线存在，X2、X3、Y2和Y3独立选择自氢、氟或其他取代基团；和b）或者（i）用聚合物前体涂覆低表面能基材料并聚合聚合物前体形成聚合物涂层，或者（ii）聚合聚合物前体并将聚合后的聚合物前体与低表面能基材料接触以形成低表面能基材料上的聚合物涂层。
• US7750062B2
  申请人：——

  公开号：US7750062B2

  公开（公告）日：2010-07-06
• [EN] METHOD OF PRODUCING A POLYMERIC MATERIAL, POLYMER, MONOMERIC COMPOUND AND METHOD OF PREPARING A MONOMERIC COMPOUND<br/>[FR] MATIÈRES POLYMÉRIQUES ET PROCÉDÉS SERVANT À FABRIQUER CELLES-CI
  申请人：NOVEL POLYMER SOLUTIONS LTD

  公开号：WO2008001102A1

  公开（公告）日：2008-01-03

  [EN] This invention relates to a method of producing a polymeric material, said method including the step of subjecting a starting material which includes a group of sub-formula (I): where R¹ is CR^aR^b, where R^b is hydrogen or alkyl and R^b is hydrogen, alkyl or - R³ - R⁵ =Y¹ , or R is an electron withdrawing group, R² and R³ are independently selected from (CR⁶R⁷)n or a group CR⁸R⁹,CR⁶R⁷CR⁸R⁹ or CR⁸R⁹CR⁶R⁷ where n is 0, 1 or 2, R⁶ and R⁷ are independently selected from hydrogen or alkyl, and either one of R⁸ or R⁹ is hydrogen and the other is an electron withdrawing group, or R⁸ or R⁹ together form an electron withdrawing group; and R⁴ and R⁵ are independently selected from CH or CR¹⁰ where CR¹⁰ is an electron withdrawing group, the dotted lines indicate the presence or absence of a bond, X¹ is a group CX²X³ where the dotted line bond to which it is attached is absent and a group CX² where the dotted line bond to which it is attached is present, Y¹ is a group CY²Y³ where the dotted line bond to which it is attached is absent and a group CY² where the dotted line bond to which it is attached is present, and at least one of, and preferably all of, X², X³, Y² and Y³ are substituents other than hydrogen and fluorine; to conditions under which polymerisation of the starting material occurs, with the proviso that if R¹ is a group N⁺HR¹⁶(Z^m-)_1/m, where R¹⁶ is selected from hydrogen, hydrocarbyl or - R³ - R⁵ =Y¹ only, and Z is an anion of charge m; then either (i) the polymerisation is a homopolymerisation or a copolymerisation in which the anion Z does not form a repeat unit in a resulting polymeric chain, or (ii) the starting material only includes one group of formula - R² - R⁴ =X¹
  [FR] Cette invention concerne un procédé de production d'une matière polymérique, ledit procédé comprenant l'étape consistant à soumettre une matière de départ qui comprend un groupe de sous-formule (I) : [où R¹ est CR^aR^b (où R^a est un hydrogène, un alkyle et R^b est un hydrogène un alkyle ou -R³-R⁵=Y¹) ou bien R¹ est un groupe attracteur d'électrons; R² et R³ sont chacun indépendamment sélectionnés parmi (CR⁶R⁷)_n ou un groupe CR⁸R⁹,CR⁶R⁷CR⁸R⁹ ou CR⁸R⁹CR⁶R⁷ (où n est 0, 1 ou 2, R⁶ et R⁷ sont chacun indépendamment sélectionnés parmi un hydrogène ou un alkyle et l'un ou l'autre de R⁸ ou R⁹ est un hydrogène et l'autre est un groupe attracteur d'électrons ou bien R⁸ et R⁹ forment ensemble un groupe attracteur d'électrons); et R⁴ et R⁵ sont chacun indépendamment sélectionnés parmi CH ou CR¹⁰ (où CR¹⁰ est un groupe attracteur d'électrons); les lignes pointillées indiquent la présence ou l'absence d'une liaison; X¹ est un groupe CX²X³ dans les cas où la liaison en ligne pointillée à laquelle il est attaché est absente et un groupe CX² dans les cas où la liaison en ligne pointillée à laquelle il est attaché est présente; Y¹ est un groupe CY²Y³ dans les cas où la liaison en ligne pointillée à laquelle il est attaché est absente et un groupe CY² dans les cas où la liaison en ligne pointillée à laquelle il est attaché est présente; et au moins l'un, de préférence la totalité, de X², X³, Y² et Y³ sont des substituants autres qu'un hydrogène et un fluor] à des conditions dans lesquelles a lieu la polymérisation de la matière de départ, à condition que, si R¹ est un groupe N⁺HR¹⁶(Z^m-)_1/m (où R¹⁶ est sélectionné parmi un hydrogène, un hydrocarbyle ou -R³-R⁵=Y¹ seulement et Z est un anion de charge m), alors soit (i) la polymérisation est une homopolymérisation ou une copolymérisation dans laquelle l'anion Z ne forme pas de motif récurrent dans la chaîne polymérique résultante, soit (ii) la matière de départ ne comprend qu'un groupe de formule -R²-R⁴=X¹.
• [EN] METHODS OF COATING A LOW SURFACE ENERGY SUBSTRATE<br/>[FR] PROCÉDÉS DE REVÊTEMENT DE SUBSTRAT À FAIBLE ÉNERGIE DE SURFACE
  申请人：NOVEL POLYMER SOLUTIONS LTD

  公开号：WO2012017233A1

  公开（公告）日：2012-02-09

  According to the invention there is provided a method of coating a low surface energy substrate including the steps of: a) providing a polymeric precursor which includes a group of sub- formula (I) where R1 is i) CRa, where Ra is hydrogen or alkyl, ii) a group S(0)pR13, or SiR14 where R13 and R14 are independently selected from hydrogen or hydrocarbyl, p is 0, 1 or 2 and q is 1 or 2, iii) C(0)N, S(0)2N, C(0)ON, CH2ON, or CH=CHRCN where Rc is an electron withdrawing group, or iv) OC(0)CH, C(0)OCH or S(0)2CH; in which R12 is selected from hydrogen, halo, nitro, hydrocarbyl, optionally substituted or interposed with functional groups, or formula (II) R2 and R3 are independently selected from (CR7R8)n, or a group CR9R10, CR7R8CR9R10 or CR9R10CR7R8 where n is 0, 1 or 2, R7 and R8 are independently selected from hydrogen or alkyl, and either one of R9 or R10 is hydrogen and the other is an electron withdrawing group, or R9 and R10 together form an electron withdrawing group; R4 and R5 are independently selected from CH or CR11 where CR11 is an electron withdrawing group, the dotted lines indicate the presence or absence of a bond, X1 is a group CX2X3 where the dotted line bond to which it is attached is absent and a group CX2 where the dotted line to which it is attached is present, Y1 is a group CY2Y3 where the dotted line to which it is attached is absent and a group CY2 where the dotted line to which it is attached is present, and X2,X3,Y2 and Y3 are independently selected from hydrogen, fluorine or other substituents; and b) either (i) coating the low surface energy substrate with the polymeric precursor and polymerising the polymeric precursor to form a polymeric coating, or (ii) polymerising the polymeric precursor and contacting the polymerised polymeric precursor with a low surface energy substrate to form a polymeric coating on the low surface energy substrate.