1,1,1,3,3,3-hexafluoropropan-2-yl 2-ethylhexanoate | 1431387-05-1

• 分子结构分类: 有机化合物 - 脂质和类脂质分子 - 脂肪酰基
• 英文名称: 1,1,1,3,3,3-hexafluoropropan-2-yl 2-ethylhexanoate
• CAS: 1431387-05-1
• 化学式: C₁₁H₁₆F₆O₂
• 分子量: 294.237
• InChiKey: MJZLVPYYRJILSW-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  5.2
• 重原子数：
  19
• 可旋转键数：
  7
• 环数：
  0.0
• sp3杂化的碳原子比例：
  0.91
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  8

反应信息

• 作为产物：
  描述：

  2-乙基已基醛 、 六氟异丙醇 在 吡啶 、 N-(2,2,6,6-tetramethyl-1-oxopiperidin-1-ium-4-yl)acetamide tetrafluoroborate 作用下， 以86%的产率得到1,1,1,3,3,3-hexafluoropropan-2-yl 2-ethylhexanoate
  参考文献：
  名称：

  使用可回收的氧铵盐对醛进行氧化酯化

  摘要：

  报道了一种简单，高产，快速的路线，可使用4-乙酰氨基-2,2,6,6-四甲基哌啶-1-氧代四氟硼酸氧铵盐（1a）将多种醛氧化酯化为六氟异丙基（HFIP）酯。。这些酯可以容易地转化成多种其他官能团。可以回收用过的氧化剂（1b）并方便地将其重新氧化，以再生氧铵盐1a。

  DOI：

  10.1021/ol400785d

文献信息

• N‐Heterocyclic Carbene/Carboxylic Acid Co‐Catalysis Enables Oxidative Esterification of Demanding Aldehydes/Enals, at Low Catalyst Loading
  作者：Wacharee Harnying、Panyapon Sudkaow、Animesh Biswas、Albrecht Berkessel

  DOI：10.1002/anie.202104712

  日期：2021.9

  carboxylic acids, such as benzoic acid, boost the activity of N-heterocyclic carbene (NHC) catalysts in the oxidative esterification of aldehydes. A simple and efficient protocol for the transformation of a wide range of sterically hindered α- and β-substituted aliphatic aldehydes/enals, catalyzed by a novel and readily accessible N-Mes-/N-2,4,6-trichlorophenyl 1,2,4-triazolium salt, and benzoic acid as co-catalyst

  我们报告发现简单的羧酸，如苯甲酸，可以提高 N-杂环卡宾 (NHC) 催化剂在醛的氧化酯化中的活性。一种简单有效的转化各种位阻α-和β-取代脂肪醛/烯醛的简单有效方案，由一种新型且易于获得的N-Mes-/N-2,4,6-三氯苯基1,2催化,4-三唑鎓盐和苯甲酸作为助催化剂被开发出来。一系列迄今为止不适合 NHC 催化酯化的 α/β-取代的脂肪族醛/烯醛可以在 0.02-1.0 mol% 的典型催化剂负载下反应。对于苯甲醛，即使是 0.005 mol% 的 NHC 催化剂也证明是足够的：NHC 催化中达到的最低值。
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
  申请人：FUJIFILM Corporation

  公开号：US20200159117A1

  公开（公告）日：2020-05-21

  An actinic ray-sensitive or radiation-sensitive resin composition includes a resin whose solubility in an aqueous alkali solution increases by the action of an acid, a compound that generates an acid upon irradiation with actinic rays or radiation, an ester compound, and a fluorine-containing polymer, in which the ester compound has alkali decomposability and has a molecular weight of 50 or more and less than 1,500.
• PHOTOSENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
  申请人：FUJIFILM Corporation

  公开号：US20200183274A1

  公开（公告）日：2020-06-11

  A photosensitive resin composition includes a resin, a photoacid generator, a solvent, and a low-molecular-weight ester compound, in which low-molecular-weight ester compound has alkali degradability and has a molecular weight of less than 1,500, and a content of the low-molecular-weight ester compound is from 0.1% by mass to 6% by mass with respect to the total solid content of the composition.
• PHOTOSENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
  申请人：FUJIFILM Corporation

  公开号：US20200183279A1

  公开（公告）日：2020-06-11

  A photosensitive resin composition includes a resin having a constitutional unit having an acid-decomposable group, a photoacid generator, a solvent, and a compound represented by Formula D. In Formula D, X D represents an O atom or an S atom, R 1D represents a hydrogen atom, a hydrocarbon group, an acyl group, an acyloxy group, or an alkoxycarbonyl group, R 2D represents a substituent, nD represents an integer from 0 to 4, and two or more of R 2D 's may be bonded to each other to form a ring.