4-(羟甲基)-2,5-二甲基苯酚 | 10496-93-2

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 中文名称: 4-(羟甲基)-2,5-二甲基苯酚
• 英文名称: 4-Hydroxy-2,5-dimethylbenzenemethanol
• 英文别名: 4-(hydroxymethyl)-2,5-dimethylphenol；4-hydroxymethyl-2,5-dimethylphenol；4-hydroxy-2,5-dimethyl-benzyl alcohol；4-Hydroxy-2.5-dimethyl-1-hydroxymethyl-benzol；(4-Hydroxy-2.5-dimethyl-phenyl)-methanol；4-Hydroxy-2,5-dimethyl-benzylalkohol
• CAS: 10496-93-2
• 化学式: C₉H₁₂O₂
• 分子量: 152.193
• InChiKey: YDUMJRNWSQBETB-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.4
• 重原子数：
  11
• 可旋转键数：
  1
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.33
• 拓扑面积：
  40.5
• 氢给体数：
  2
• 氢受体数：
  2

反应信息

• 作为反应物：
  描述：

  4-(羟甲基)-2,5-二甲基苯酚 在 水 、 sodium hydrogensulfite 作用下， 生成 (4-hydroxy-2,5-dimethyl-phenyl)-methanesulfonic acid
  参考文献：
  名称：

  273.邻羟基苄基磺酸的衍生物

  摘要：

  DOI：

  10.1039/jr9370001348
• 作为产物：
  描述：

  2,5-二甲基苯酚 在 ammonium hydroxide 、 聚合甲醛 、 溶剂黄146 作用下， 以 水 为溶剂， 生成 4-(羟甲基)-2,5-二甲基苯酚
  参考文献：
  名称：

  Positive resist composition and photosensitizers

  摘要：

  一种正相光刻胶组合物，包括以下式（I）所代表的酚化合物的喹喔二唑磺酸酯作为光敏剂：其中Q.sup.1、Q.sup.2、Q.sup.3、Q.sup.4、Q.sup.5、Q.sup.6、Q.sup.7、Q.sup.8、Q.sup.9和Q.sup.10独立地代表氢、具有1-6个碳原子的烷基或苯基，或Q.sup.1和Q.sup.2、Q.sup.3和Q.sup.4、Q.sup.5和Q.sup.6、Q.sup.7和Q.sup.8、或Q.sup.9和Q.sup.10可以与它们连接的碳原子一起形成具有6个或更少碳原子的环烷烃环，R.sup.1、R.sup.2、R.sup.3、R.sup.4、R.sup.5、R.sup.6、R.sup.7、R.sup.8、R.sup.9、R.sup.10、R.sup.11、R.sup.12、R.sup.13、R.sup.14、R.sup.15和R.sup.16独立地代表氢、羟基、具有1-6个碳原子的烷基或苯基；m和n独立地代表0或1的数字；以及一种碱溶性树脂；和式（I）的一种酚化合物的喹喔二唑磺酸酯。

  公开号：

  US05866724A1

文献信息

• Optically active compound and photosensitive resin composition
  申请人：——

  公开号：US20030211421A1

  公开（公告）日：2003-11-13

  A photoactive compound is used in combination with a photosensitizer, represented by the following formula (1): A −[( J ) m −( X-Pro )] n (1) wherein A represents a hydrophobic unit comprising at least one kind of hydrophobic groups selected from a hydrocarbon group and a heterocyclic group, J represents a connecting group, X-Pro represents a hydrophilic group protected by a protective group Pro which is removable by light exposure, m represents 0 or 1, and n represents an integer of not less than 1. The protective group Pro may be removable by light exposure in association with the photosensitizer (especially, a photo acid generator), or may be a hydrophobic protective group. The hydrophilic group may be a hydroxyl group or a carboxyl group. The photoactive compound has high sensitivity to a light source of short wavelength beams, for resist application, therefore, the photoactive compound is advantageously used for forming a pattern with high resolution.

  一种光活性化合物与光敏剂结合使用，由以下公式（1）表示： A −[( J ) m −( X-Pro )] n (1) 其中，A代表至少包括一种从烃基和杂环基中选择的疏水基的疏水单元，J代表连接基团，X-Pro代表由光照可去除的保护基团Pro保护的亲水基团，m代表0或1，n代表不少于1的整数。 保护基团Pro可以与光敏剂（特别是光酸发生剂）一起通过光照可去除，也可以是疏水保护基团。亲水基团可以是羟基或羧基。光活性化合物对短波长光源具有很高的敏感性，用于光刻应用，因此，该光活性化合物有利于形成具有高分辨率的图案。
• Ethers and thioethers of kojic acid and preparation thereof
  申请人：RHONE POULENC SA

  公开号：US02865930A1

  公开（公告）日：1958-12-23

  The invention comprises compounds of the formula <;FORM:0781413/IV (a)/1>; where R is alkyl, X is O or NH, Y is O or S, and Ar is aryl, which may have one or more alkyl, alkoxy, hydroxyalkyl, nitro or halogen substituents; the alkyl and alkoxy groups have not more than 4 carbon atoms. The compounds are prepared (1) by the action of H-Y-Ar on the appropriate pyrones or pyridones having a -CH2Z substituent where Z is a reactive ester group such as halide, sulphuric or sulphonic ester, preferably in a solvent at 50-100 DEG C. in the presence of a basic condensing agent, or (2) by the alkylation of the corresponding 5-hydroxy compounds. In addition the pyridones may be made from the pyrones by heating with ammonia. Examples show the preparation by method (1) of 2-aryloxymethyl-5 - methoxy - 4 - pyrones where aryl group is phenyl, b -naphthyl, and the following substituted phenyl groups:-chloro (3 isomers), 2:4-dichloro, 2:4:6-trichloro, pentachloro, methyl (3 isomers), dimethyl (6 isomers), 2:4:6-trimethyl, 2-methyl-4- and -6-chloro, 3-methyl-4-chloro, 4-methyl-2-chloro, 2-methyl-4:6-dichloro, 4 - methyl - 2:6 - dichloro, 2:4 - dimethyl-6-chloro, 3:5-dimethyl-4-chloro, 4-isopropyl, 4-cyclohexyl, 2- and 4-nitro, 2-methylol, 2:4 - dichloro - 6 - methylol, 2 - chloro - 4:6 - dimethylol, 4 - chloro - 2:6 - dimethylol, 4 - methyl - 2 - methylol, 4 - methyl - 2:6 - dimethylol, 2:5 - dimethyl - 4 - methylol, 3:4 - dimethyl - 6 - methylol, 3 - methoxy, and 2 - methoxy-4-, -5- and -6-methyl; also 2-(21-methylolphenoxymethyl) - 5 - ethoxy - 4 - pyrone and 2-(41-chlorophenylthiomethyl) - 5 - methoxy-4-pyrone. I further examples 2-(41 chlorophenoxymethyl) - 5 - methoxy - 4 - pyridone (hydrochloride described) and 2-(21-methyl - 61 - chlorophenoxymethyl) - 5 - methoxy-4-pyridone are made from the corresponding pyrones and ammonia. It is also stated that Ar may also be ethylphenyl, ethoxyphenyl or hydroxy-ethyl-phenyl.ALSO:Compositions for use as plant growth regulants contain as active ingredient a compound of the formula: <;FORM:0781413/I/1>; where R is alkyl, X is O or NH, Y is O or S and Ar is aryl which may have one or more alkyl, alkoxy, hydroxyalkyl, nitro or halogen substituents; the alkyl and alkoxy groups have not more than 4 carbon atoms. The compositions may be in the form of powders, sprays, aerosols, emulsions or solutions in organic or aqueous organic solvents. There may also be present wetting agents, synergists and other plant growth regulants. In an example 2-(21 : 41-dichlorophenoxymethyl)-5-methoxy-4-pyrone is dissolved in dimethylformamide and diluted with water to give a solution which enhances root formation when plant stems are soaked with it. Many other suitable compounds are mentioned.ALSO:Compositions for use as systemic fungicides or herbicides contain as essential ingredient a compound of the formula <;FORM:0781413/VI/1>; where R is alkyl, X is O or NH, Y is O or S and Ar is aryl which may have one or more alkyl, alkoxy, hydroxyalkyl, nitro or halogen substituents; the alkyl and alkoxy groups have not more than 4 carbon atoms. The compositions may be in the form of powders, sprays, aerosols, emulsions or solutions in organic or aqueous organic solvents. There may also be present wetting agents, synergists, and other plant-growth regulants or fungicides. In examples, fungicides are made of (1) 2-(21-methyl - 41 - chlorophenoxymethyl) - 5 - methoxy-4-pyrone dispersed in water with the aid of a wetting agent; and (2) 2-(31:51-dimethylphenoxy - methyl) - 5 - methoxy - 4 - pyrone and talc similarly dispersed; herbicides are made from (3) 2-(2-(21:41-dichlorophenoxymethyl) - 5 - methoxy - 4 - pyrone; and (4) 2-(41 - chlorophenoxymethyl) - 5 - methoxy - 4-pyrone, in each case dissolved in toluene and acetone and dispersed in water with the aid of a wetting agent. Many other suitable compounds are mentioned.

  该发明包括以下公式的化合物：其中R为烷基，X为O或NH，Y为O或S，Ar为芳基，可能具有一个或多个烷基、烷氧基、羟基烷基、硝基或卤素取代基；烷基和烷氧基基团的碳原子数不超过4。这些化合物通过以下方法制备：（1）在适当的吡喃酮或吡啶酮上作用H-Y-Ar，其中吡喃酮或吡啶酮具有一个-CH2Z取代基，其中Z是反应性酯基，如卤化物、硫酸酯或磺酸酯，最好在50-100摄氏度的溶剂中，在碱性缩合剂的存在下进行，或者（2）通过对应的5-羟基化合物的烷基化制备。此外，吡啶酮可以通过与氨加热制备。示例表明，通过方法（1）制备了2-芳氧基甲基-5-甲氧基-4-吡喃，其中芳基为苯基、β-萘基，以及以下取代苯基：氯（3个异构体）、2,4-二氯、2,4,6-三氯、五氯、甲基（3个异构体）、二甲基（6个异构体）、2,4,6-三甲基、2-甲基-4-和-6-氯、3-甲基-4-氯、4-甲基-2-氯、2-甲基-4,6-二氯、4-甲基-2,6-二氯、2,4-二甲基-6-氯、3,5-二甲基-4-氯、4-异丙基、4-环己基、2-和4-硝基、2-甲基醇、2,4-二氯-6-甲基醇、2-氯-4,6-二甲基醇、4-氯-2,6-二甲基醇、4-甲基-2-甲基醇、4-甲基-2,6-二甲基醇、2,5-二甲基-4-甲基醇、3,4-二甲基-6-甲基醇、3-甲氧基、2-甲氧基-4-, -5-和-6-甲基；还有2-(21-甲基醇苯氧基甲基)-5-乙氧基-4-吡喃和2-(41-氯苯硫醚基甲基)-5-甲氧基-4-吡喃。另外还有一些其他化合物的例子。
• 4-oxy-substituted phenoxyalkyl carboxylic acid, ester, and alcohol
  申请人：Warner-Lambert Co.

  公开号：US05166398A1

  公开（公告）日：1992-11-24

  Novel 4-oxy substituted phenoxyalkyl carboxylic acid, ester and alcohol derivatives are described, as well as methods for the preparation and pharmaceutical composition of same, which are useful in preventing the intestinal absorption of cholesterol and thus are useful in the treatment of hypercholesterolemia and atherosclerosis.

  描述了新颖的4-氧代取代苯氧基烷基羧酸、酯和醇衍生物，以及其制备方法和药物组合物，这些物质有助于预防胆固醇在肠道中的吸收，因此对于治疗高胆固醇血症和动脉粥样硬化有用。
• Phenolic Oxidation Using H₂O₂ via in Situ Generated <i>para</i>-Quinone Methides for the Preparation of <i>para</i>-Spiroepoxydienones
  作者：Michael F. McLaughlin、Elisabetta Massolo、Thomas A. Cope、Jeffrey S. Johnson

  DOI：10.1021/acs.orglett.9b02372

  日期：2019.8.16

  Phenols are attractive starting materials for the preparation of highly substituted cyclohexane rings via dearomative processes. Herein we report an efficient preparation of dearomatized 1-oxaspiro[2.5]octa-4,7-dien-6-ones (para-spiroepoxydienones) via the nucleophilic epoxidation of in situ generated para-quinone methides from 4-(hydroxymethyl)phenols using aqueous H2O2. The developed protocol bypasses

  苯酚是用于通过脱芳香方法制备高度取代的环己烷环的有吸引力的起始原料。在此，我们报告了一种有效的制备方法，该方法是通过使用4-（羟甲基）苯酚从原位生成的对-醌甲基化物进行亲核环氧化，来制备脱芳香化的1-oxaspiro [2.5] octa-4,7-dien-6-ones（对-spiroepoxydienones）。含水H 2 O 2。所开发的方案无需化学计量的铋试剂或重氮甲烷，而化学计量的铋试剂或重氮甲烷经常用于对-螺-环氧二烯酮的制备。该p -spiroepoxydienones在众多下游复杂性建设变换进一步阐述。
• Quinonediazine sulfonic acid esters and positive photoresist compositions comprising the same
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：EP0695740A1

  公开（公告）日：1996-02-07

  A compound represented by the general formula (I): wherein one of R¹ and R² represents -OQ⁴ and the other represents hydrogen, alkyl, cycloalkyl, alkenyl, alkoxy or halogen; R³, R⁴ and R⁵ each independently represent hydrogen, alkyl, cycloalkyl, alkenyl, alkoxy or halogen; provided that when R² is -OQ⁴, both of R³ and R⁴ are hydrogen or at least one of R¹ and R⁵ is alkyl, cycloalkyl, alkenyl, alkoxy; R⁶ and R⁷ each independently represent hydrogen, alkyl or alkenyl, or R⁶ and R⁷ form a cycloalkane ring; and Q¹, Q², Q³ and Q⁴ each independently represent hydrogen or an o-quinonediazide sulfonyl group, provided that at least one of Q¹, Q², Q³ and Q⁴ is an o-quinonediazide sulfonyl group; a process for producing the same; a photosensitizer comprising the same; and a positive resist composition comprising the same; and    1,2,3-Trihydroxy-4-(4-hydroxy-2,5-dimethylbenzyl) benzene and a positive resist composition comprising the same.

  通式 (I) 所代表的化合物： 其中 R¹ 和 R² 中的一个代表 -OQ⁴，另一个代表氢、烷基、环烷基、烯基、烷氧基或卤素；R³、R⁴ 和 R⁵ 各自独立地代表氢、烷基、环烷基、烯基、烷氧基或卤素；条件是当 R² 为 -OQ⁴ 时，R³ 和 R⁴ 均为氢或 R¹ 和 R⁵ 中至少有一个为烷基、环烷基、烯基、烷氧基； R⁶ 和 R⁷ 各自独立地代表氢、烷基或烯基，或 R⁶ 和 R⁷ 构成环烷环；以及 Q¹、Q²、Q³ 和 Q⁴ 各自独立地代表氢或邻喹酮噻嗪磺酰基，条件是 Q¹、Q²、Q³ 和 Q⁴ 中至少有一个是邻喹酮噻嗪磺酰基； 生产上述物质的工艺；包含上述物质的光敏剂；以及包含上述物质的正抗蚀剂组合物；以及 1,2,3-三羟基-4-(4-羟基-2,5-二甲基苄基)苯和由其组成的正抗蚀剂组合物。