2-[[(Perfluorooctyl)sulfonyl]oxy]-1H-benz[de]isoquinoline-1,3(2H)-dione | 639827-02-4

• 分子结构分类: 有机化合物 - 有机杂环化合物
• 英文名称: 2-[[(Perfluorooctyl)sulfonyl]oxy]-1H-benz[de]isoquinoline-1,3(2H)-dione
• 英文别名: (1,3-dioxobenzo[de]isoquinolin-2-yl) 1,1,2,2,3,3,4,4,5,5,6,6,7,7,8,8,8-heptadecafluorooctane-1-sulfonate
• CAS: 639827-02-4
• 化学式: C₂₀H₆F₁₇NO₅S
• 分子量: 695.3
• InChiKey: JVIAEJHTCBUELU-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  7.7
• 重原子数：
  44
• 可旋转键数：
  9
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.4
• 拓扑面积：
  89.1
• 氢给体数：
  0
• 氢受体数：
  22

文献信息

• PATTERN-FORMING METHOD AND RADIATION-SENSITIVE COMPOSITION
  申请人：JSR CORPORATION

  公开号：US20210181627A1

  公开（公告）日：2021-06-17

  A pattern-forming method includes: applying directly or indirectly on a substrate a radiation-sensitive composition containing a complex and an organic solvent to form a film; exposing the film to an ultraviolet ray, a far ultraviolet ray, an extreme ultraviolet ray, or an electron beam; and developing the film exposed, wherein the complex is represented by formula (1). [M m L n Q p ]  (1) In the formula (1), M represents a zinc atom, a cobalt atom, a nickel atom, a hafnium atom, a zirconium atom, a titanium atom, an iron atom, a chromium atom, a manganese atom, or an indium atom; and L represents a ligand derived from a compound represented by formula (2). R 1 —CHR 3 —R 2 (2) In the formula (2), R 1 and R 2 each independently represent —C(═O)—R A , —C(═O)—OR B , or —CN.

  一种图案形成方法包括：在基板上直接或间接地涂覆含有复合物和有机溶剂的辐射敏感组合物以形成膜；将膜暴露于紫外线、远紫外线、极紫外线或电子束；和显影所暴露的膜，其中该复合物由式（1）表示。[MmLnQp] (1)在式（1）中，M代表锌原子、钴原子、镍原子、铪原子、锆原子、钛原子、铁原子、铬原子、锰原子或铟原子；L代表来自由式（2）表示的化合物的配体。R1—CHR3—R2(2)在式（2）中，R1和R2分别独立地表示—C(═O)—RA、—C(═O)—ORB或—CN。
• METHODS FOR FABRICATING HIGH RESOLUTION DNA ARRAY AND ITS APPLICATION IN SEQUENCING
  申请人：Centrillion Technology Holdings Corporation

  公开号：EP3735481A1

  公开（公告）日：2020-11-11
• POSITIVE WORKING PHOTOSENSITIVE MATERIAL
  申请人：Merck Patent GmbH

  公开号：EP3847506A1

  公开（公告）日：2021-07-14
• RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMER, AND COMPOUND
  申请人：JSR CORPORATION

  公开号：US20220229367A1

  公开（公告）日：2022-07-21

  A radiation-sensitive resin composition includes: a first polymer including a structural unit which includes an acid-labile group; a second polymer including a structural unit represented by formula (1); and a radiation-sensitive acid generator. R 1 represents a monovalent organic group having 1 to 20 carbon atoms; R 2 represents a monovalent organic group having 1 to 20 carbon atoms; X represents a divalent organic group having 1 to 20 carbon atoms; and Y represents a divalent hydrocarbon group having 1 to 20 carbon atoms. The divalent organic group represented by X, the monovalent organic group represented by R 2 , or both has a fluorine atom.
• [EN] METHODS FOR FABRICATING HIGH RESOLUTION DNA ARRAY AND ITS APPLICATION IN SEQUENCING<br/>[FR] PROCÉDÉS DE FABRICATION D'UNE PUCE À ADN À HAUTE RÉSOLUTION ET UTILISATION DE CELLE-CI DANS LE SÉQUENÇAGE
  申请人：CENTRILLION TECH INC

  公开号：WO2019136322A1

  公开（公告）日：2019-07-11

  The present disclosure provides methods and processes for forming a pattern of oligonucleotides on a microarray. A method for forming a pattern of oligonucleotides on a microarray may include forming a photoresist layer by applying a photoresist composition onto an underlying layer of a substrate, exposing a dose of light through a patterned mask onto the substrate, and removing protective groups on a section of the plurality of functional groups within at least one exposed region of the substrate, wherein the photoresist composition comprises a photoacid generator, an acid scavenger and a photosensitizer, wherein the underlying layer comprises a plurality of functional groups protected by protective groups; thereby forming a pattern on the substrate, wherein the pattern comprises the at least one exposed region, and wherein the at least one exposed region is no more than 1 micrometer in at least one dimension.